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Found results for
 patents
1.
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OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
| Application Number |
18571593 |
| Status |
Pending |
| Filing Date |
2022-06-16 |
| First Publication Date |
2024-07-11 |
| Owner |
Heraeus Epurio LLC (USA)
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| Inventor |
- Sharma, Ram B.
- Zhang, Yongqiang
- Jewett, Kyle
- Sakavuyi, Kaumba
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Abstract
A sulfonic acid derivative compound represented by Formula (I):
A sulfonic acid derivative compound represented by Formula (I):
A sulfonic acid derivative compound represented by Formula (I):
wherein R is a substituted or unsubstituted C1-C12 alkyl group; and Z is selected from the group consisting of a substituted or unsubstituted polycyclic C3-C30 cycloalkyl group, a substituted or unsubstituted monocyclic C3-C30 cycloalkyl group, and a substituted or unsubstituted C3-C30 monocyclic heteroalkyl group. Compounds and compositions disclosed herein are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
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2.
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OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
| Application Number |
US2022072986 |
| Publication Number |
2022/272226 |
| Status |
In Force |
| Filing Date |
2022-06-16 |
| Publication Date |
2022-12-29 |
| Owner |
HERAEUS EPURIO LLC (USA)
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| Inventor |
- Sharma, Ram B.
- Zhang, Yongqiang
- Jewett, Kyle
- Sakavuyi, Kaumba
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Abstract
11233033033030 monocyclic heteroalkyl group. Compounds and compositions disclosed herein are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
IPC Classes ?
- C07C 381/00 - Compounds containing carbon and sulfur and having functional groups not covered by groups
- G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
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3.
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Cyclic sulfonate compounds as photoacid generators in resist applications
| Application Number |
16495719 |
| Grant Number |
11292764 |
| Status |
In Force |
| Filing Date |
2019-03-14 |
| First Publication Date |
2021-01-07 |
| Grant Date |
2022-04-05 |
| Owner |
HERAEUS EPURIO LLC (USA)
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| Inventor |
- Zhang, Yongqiang
- Sharma, Ram B.
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Abstract
Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
IPC Classes ?
- C07C 309/10 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing etherified hydroxy groups bound to the carbon skeleton with the oxygen atom of at least one of the etherified hydroxy groups further bound to an acyclic carbon atom
- G03F 7/004 - Photosensitive materials
- C07C 381/12 - Sulfonium compounds
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4.
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Sulfonic acid derivative compounds as photoacid generators in resist applications
| Application Number |
15746895 |
| Grant Number |
10976658 |
| Status |
In Force |
| Filing Date |
2016-08-11 |
| First Publication Date |
2020-03-19 |
| Grant Date |
2021-04-13 |
| Owner |
HERAEUS EPURIO LLC (USA)
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| Inventor |
- Zhang, Yongqiang
- Campo, Darin
- Sharma, Ram B.
- Kunz, Martin
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Abstract
Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
IPC Classes ?
- C07D 221/14 - Aza-phenalenes, e.g. 1,8-naphthalimide
- G03F 7/004 - Photosensitive materials
- G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F 7/16 - Coating processesApparatus therefor
- G03F 7/20 - ExposureApparatus therefor
- G03F 7/32 - Liquid compositions therefor, e.g. developers
- G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
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5.
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Sulfonic acid derivative compounds as photoacid generators in resist applications
| Application Number |
15264966 |
| Grant Number |
09709886 |
| Status |
In Force |
| Filing Date |
2016-09-14 |
| First Publication Date |
2017-01-05 |
| Grant Date |
2017-07-18 |
| Owner |
HERAEUS EPURIO LLC (USA)
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| Inventor |
- Zhang, Yongqiang
- Greene, Daniel
- Sharma, Ram B.
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Abstract
Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
IPC Classes ?
- C07D 221/14 - Aza-phenalenes, e.g. 1,8-naphthalimide
- G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
- G03F 7/30 - Imagewise removal using liquid means
- G03F 7/20 - ExposureApparatus therefor
- G03F 7/004 - Photosensitive materials
- G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- C08K 5/42 - Sulfonic acidsDerivatives thereof
- G03F 7/025 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
- G03F 7/16 - Coating processesApparatus therefor
- G03F 7/32 - Liquid compositions therefor, e.g. developers
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6.
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Sulfonic acid derivative compounds as photoacid generators in resist applications
| Application Number |
14657387 |
| Grant Number |
09477150 |
| Status |
In Force |
| Filing Date |
2015-03-13 |
| First Publication Date |
2016-09-15 |
| Grant Date |
2016-10-25 |
| Owner |
HERAEUS EPURIO LLC (USA)
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| Inventor |
- Zhang, Yongqiang
- Greene, Daniel
- Sharma, Ram B.
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Abstract
Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
IPC Classes ?
- C07D 221/14 - Aza-phenalenes, e.g. 1,8-naphthalimide
- G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- C08K 5/42 - Sulfonic acidsDerivatives thereof
- G03F 7/30 - Imagewise removal using liquid means
- G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
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7.
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Sulfonic acid derivative compounds as photoacid generators in resist applications
| Application Number |
14490056 |
| Grant Number |
09383644 |
| Status |
In Force |
| Filing Date |
2014-09-18 |
| First Publication Date |
2016-03-24 |
| Grant Date |
2016-07-05 |
| Owner |
HERAEUS EPURIO LLC (USA)
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| Inventor |
- Zhang, Yongqiang
- Sharma, Ram B.
- Stuck, Rachael
- Greene, Daniel
- Gupta, Rakesh
- Fogle, Jeffrey D.
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Abstract
Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
IPC Classes ?
- C07C 311/07 - Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atom of at least one of the sulfonamide groups bound to a carbon atom of a ring other than a six-membered aromatic ring
- G03F 7/004 - Photosensitive materials
- G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
- C07D 221/14 - Aza-phenalenes, e.g. 1,8-naphthalimide
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