A plurality of unit pixels in a two dimensional imaging array are arranged in a manner that signal charges along a given row are added to other relevant signal charges of the same row. Signal charges along a given column are added to other relevant signal charges of the same column. Summed charge values are output simultaneously from rows and columns to produce one row and one column of image data. The resulting summed data is temporarily stored in on-chip buffers and then output from the chip during the integration time of the next imaging cycle with no loss in imaging duty cycle.
2.
BULK MATERIAL ANALYZER ASSEMBLY INCLUDING STRUCTURAL BEAMS CONTAINING RADIATION SHIELDING MATERIAL
A bulk material analyzer is variably constructed from an assembly of components. The analyzer is the type that is used to analyze bulk material transported on a conveyor belt through an activation region between at least one radiation source and at least one radiation detector within the bulk material analyzer. The assembly includes a radiation-source box for disposition either above the activation region or below the conveyor belt; a radiation-detector box for disposition on the opposite side of the activation region and the conveyor belt from the radiation-source box; and a set of stackable structural beams predominantly containing radiation shielding material and configured for stacking about the activation region, the radiation-source box and the radiation-detector box to prevent unwanted radiation being generated and transported to the radiation-detector box.
G01N 23/221 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material by activation analysis
G01N 23/222 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material by activation analysis using neutron activation analysis [NAA]
A system and method are disclosed for implementing a power source including a power amplifier that generates a radio-frequency power signal with an adjustable operating frequency. The power amplifier also generates a reference phase signal that is derived from the radio-frequency power signal. An impedance match provides the radio-frequency power signal to a plasma coil that has a variable resonance condition. A phase probe is positioned adjacent to the plasma coil to generate a coil phase signal corresponding to the adjustable operating frequency. A phase-locked loop then generates an RF drive signal that is based upon a phase relationship between the reference phase signal and the coil phase signal. The phase-locked loop provides the RF drive signal to the power amplifier to control the adjustable operating frequency, so that the adjustable operating frequency then tracks the variable resonance condition.
G01N 21/73 - Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
H03L 5/02 - Automatic control of voltage, current, or power of power
H03L 7/06 - Automatic control of frequency or phaseSynchronisation using a reference signal applied to a frequency- or phase-locked loop
H05H 1/30 - Plasma torches using applied electromagnetic fields, e.g. high-frequency or microwave energy
H05H 1/46 - Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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