The invention relates to a gas discharge lamp comprising an elongated lamp pipe filled with a gas, and two electrodes each of which is arranged in, and at the end of, the lamp pipe, said pipe being arranged in a container which receives a liquid coolant that surrounds the lamp pipe on its outer face, and having a length of at least 1000 mm. The gas discharge lamp is designed as a continuous, interference-free light source such that the buoyancy force acting on the lamp pipe in the liquid coolant is set against the weight force of the lamp pipe approximately equally. This therefore allows deflection of the gas discharge lamp to be reduced without increasing the diameter or the wall strength of the lamp pipe.
The invention relates to a method for pretreating a coated or uncoated substrate (6) by subjecting the substrate (6) to a reactive sputtering process. The invention further relates to a method for coating a substrate (6) with a functional layer or with a layer system and to a vacuum treatment system (1), comprising a vacuum chamber (2), in which a sputtering cathode and a retaining device for a substrate (6) arranged opposite the sputtering cathode are arranged, and a gas supply system (14) for supplying working gas and reactive gas to the vacuum chamber (2). In order to operate a method for pretreating a substrate (6) in a manner that is stable over the long term, said method being suitable for all substrate materials and also leaving behind no optically active layer on the substrate (6), the substrate is exposed to a plasma, which is produced by means of a sputtering cathode having a carbon-containing target (10) in an oxygen-containing sputtering atmosphere. The vacuum treatment system according to the invention comprises a gas supply system (14) having a gas inlet for oxygen as the reactive gas and also comprises a sputtering cathode having a carbon-containing target (10).
The invention relates to a method and to a device usable for said method for the reactive magnetron sputtering of a transparent metal oxide layer on a coated or uncoated substrate (21), wherein the target material 2 is sputtered by a pipe magnetron 1 that comprises a magnet system 5 having a central pole shoe 7 of a first polarity and a respective outer pole shoe 9 of opposite polarity on each side of the central pole shoe 7 under supply of a reactive gas to the working gas and is separated as a metal oxide layer on the substrate 21. In order to further improve the visual and electrical layer properties, including in the case of reactive sputtering, the sputtering occurs from a single pipe magnetron, the outer pole shoe 9 of said pipe magnetron having an opening angle α of greater than 60°, preferably greater than 90°, more preferably greater than 110°, when viewed in the cross-section and a substrate-target distance H of ≥ 100 mm, preferably ≥ 120 mm being adjusted.
The invention relates to a device and a method for treating substrates in a batch process. The aim of the invention is to improve the treatment of substrates in a batch process such that a mass production with increased productivity is possible using a compact, functionally simplified device for treating substrates. This is achieved by a device for treating substrates in a batch process. The device comprises at least one processing chamber for coating substrates, at least one lock chamber for transferring the substrates between the lock chamber and the processing chamber, said lock chamber being connectable to the processing chamber via a valve, and a substrate transporting device which extends through the processing chamber and the lock chamber and which can be separated in the operative region of the valve. The substrates are arranged on the substrate transporting device on substrate supports which are arranged in a row and which are connected to one another. The aim of the invention is achieved using a method for treating substrates in a batch process, said method having the following method steps: introducing substrates arranged on substrate supports into a processing chamber from a lock chamber, treating the substrates within the processing chamber, and discharging the substrates out of the processing chamber into a lock chamber, said substrates being introduced, treated, and discharged together on substrate supports which are arranged in a row and which are connected to one another.
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
The invention relates to a flash lamp arrangement comprising at least two rod-shaped flash lamps, each of which has a longitudinal extension, said flash lamps being arranged on a plane relative to one another parallel to a flash lamp array and being mechanically connected to a support. The aim of the invention is to compensate for the forces caused by a current flow in the flash lamps such that the mechanical load on the flash lamps, in particular on the outer flash lamps, is reduced. This is achieved in that elements which generate a magnetic field are arranged parallel to the outer flash lamps of the flash lamp array adjacently to the outer faces of the outer flash lamps such that a magnetic field of each element compensates for at least one respective magnetic field generated by the outer flash lamps.
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
6.
VACUUM SUBSTRATE TREATMENT SYSTEM HAVING AN EMERGENCY COOLING DEVICE
The invention relates to a vacuum substrate treatment system, comprising a system chamber having at least one system component that can be cooled and a cooling device for the system component that can be cooled. Said cooling device comprises a coolant circuit, which is connected to the system component that can be cooled and has at least one first coolant pump that can be driven by a first drive device. The invention is characterised in that the cooling device further comprises an emergency cooling device, which comprises a branch of the coolant circuit extending parallel to the first coolant pump and in which at least one second coolant pump is arranged that can be driven by a second drive device, and the second drive device can be operated with compressed gas.
C23C 14/00 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01J 37/00 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
7.
Surface heating device for a substrate treatment device and substrate treatment device
A surface heating device for a substrate treatment device with increased power density and improved homogeneity of heat radiation includes a jacket tube heater with straight tube sections and bent tube sections in which straight tube sections are arranged parallel to each other in a main plane and straight tube sections are connected to each other by bent tube sections, so that at least part of the bent tube sections are aligned sloped relative to the main plane.
A problem addressed by the invention, namely that of improving known substrate treatment installations such that substrates can be treated by light in said installations, without the need for cost-intensive inspection windows having a large thickness, is solved by means of a substrate treatment installation comprising an installation chamber and a light source for the exposure of substrates to light, the light source being arranged in the interior of the substrate treatment installation and comprising at least one lamp arranged in a housing, which is permeable to light at least in sections and has a vacuum-tight cavity for accommodating a lamp, and also comprising at least one reflector element arranged in spatial proximity to the at least one lamp and having an electrical connection.
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
9.
METHOD AND DEVICE FOR THERMALLY TREATING SUBSTRATES
The invention relates to a method for thermally treating substrates using an RTP process, to an RTP device, and to the use of such a method and such a device to change substrates by applying energy. The aim of the present invention is to find a method and a device by means of which complex thermally induced structures can be simultaneously produced on the substrate in a time-saving manner. Said aim is achieved by a method in which the substrate (6) is thermally treated in a locally defined manner, in that one or more sub-areas of the substrate (6) are exposed to the radiation of a radiation means (2) for a duration on an order of magnitude of one millisecond by a device containing means for the defined local variation of the application of energy to the substrate, and the application of energy to the substrate (6) is limited to sub-areas having a width less than 100 micrometers.
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
10.
REFLECTION LAYER SYSTEM FOR SOLAR APPLICATIONS AND METHOD FOR THE PRODUCTION THEREOF
The invention relates to a reflection layer system RSS and to a method for the production thereof for front-surface mirrors for solar applications, comprising a layer that is highly reflective in the solar spectrum on a substrate S. In order to achieve such a reflection layer system RSS on curved and flat substrates S while keeping the use of material low and obtaining higher TSR values, deposited on the substrate S are a metallic, reflective functional layer F, a metallic reflective layer R, and a transparent, dielectric protective layer as a top layer D, which contains an oxide, nitride or oxynitride of a metal or semiconductor and the thickness of which is 500 nm or more, preferably more than 1 µm.
The invention relates to a reflection layer system for solar applications, and to a method for producing said system. In order to be able to produce such reflection layer systems which enable higher TSR values to be obtained in conjunction with use of less material, said system comprises, on a substrate S, a metallic reflection layer R and a metallic, reflective functional layer F, wherein the metallic reflection layer (R) faces the light incidence side of the reflection layer system, and wherein the metallic reflection layer R and the metallic, reflective functional layer F together have a thickness such that they are jointly optically dense, whereas that is not the case for one or both of the metallic layers R, F as considered per se.
The invention relates to an organic light emitting illuminant that has regions (1, 2, 3) which lie next to each other and have different emission colors. The invention also relates to a coating device (301) for producing the organic light emitting illuminant, comprising a vacuum chamber, a mechanism for linearly conveying a substrate (300), multiple coating sources (302.1-302.5), and covers (303.1-303.5). The aim of the invention is to create OLED structures that have improved light emission intensity, increase the efficiency of coating devices for producing such OLED illuminants, and make the production inexpensive and commercially applicable. Said aim is achieved in that the thicknesses of the hole transport layer (203.1, 203.2, 203.3), emissive layer (204.1, 204.2, 204.3), and electron transport layer (205.1, 205.2, 205.3) differ in the regions lying next to each other and are set in such a way that the light color emitted in the respective region can be extracted in an optimal manner.
H01L 51/52 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED) - Details of devices
13.
METHOD FOR THE PRODUCTION OF AN ORGANIC LIGHT EMITTING ILLUMINANT
The invention relates to a method for producing an organic light emitting illuminant, in which a base electrode layer (202) is formed over a substrate (200) provided for that purpose, an organic light emitting layer (203) is formed over at least one portion of the base electrode layer, and a top electrode layer (204) is formed over at least one portion of the organic light emitting layer, the layers being formed in the shape of strips. The aim of the invention is to increase the efficiency of in-line vacuum treatment systems during the production of organic light emitting illuminants and simplify the steps required for electrically contacting the cathode and anode. Said aim is achieved in that the strip-shaped formation of the layers is carried out in a coating process in an in-line vacuum coating system having stationary shadowing masks on the advancing substrate such that at least one area of the base electrode layer remains uncoated (203-205) once the layers have been formed.
The invention relates to a sputtering device with a tubular target, comprising a holding device with a supporting shaft, which has a shaft flange, which is connected to a target tube detachably and in a water-tight manner by means of a clamping device, wherein that end of the target tube which faces the shaft flange of the supporting shaft is without a flange and a spacer ring is arranged detachably on the outer side thereof in a predetermined position, said spacer ring being held by a form-fitting connection at a minimum distance from the end of the target tube, wherein the clamping device is formed from the shaft flange of the supporting shaft, the spacer ring and a clamping ring, which engages over the shaft flange and the spacer ring and comprises at least two pieces, and wherein at least one sealing element is arranged between the outer side and/or the end side of the target tube, on one side, and an opposite sealing face of the shaft flange on the other side.
The invention relates to a method and to the use of a device for producing a layer of an organic material on a substrate, wherein the material is applied to the substrate using an intermediate carrier and is converted on the substrate. The aim of the invention is make the production of layers of molecules on a substrate, in particular of microstructured crystalline layers, easier and more cost effective, and to increase the variety of materials to be used. Said aim is achieved in that the material is vaporized from the intermediate carrier in a vacuum by energy input from a beam and is deposited onto the substrate, wherein the material on the substrate undergoes a conversion induced by radiation.
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
The invention, which relates to a modular-construction vacuum-coating system with a plurality of functional chambers which are arranged one behind the other along a longitudinal extent in which substrates are moved through the chambers in a substrate-transporting region, has the problem of lowering the production-related and installation-related outlay involved in supplying media to vacuum-coating systems. This problem is solved by a functional chamber, as a first sub-module, being arranged in a module which is provided with an outer interface which is the same for at least a second module.
A method and device are provided for cleaning of an optical position measurement system in a coating installation. The optical position measurement system includes a cantilever, and a sensor head having a radiation inlet and/or outlet for the reception and/or emission of an optical signal, at a free end of the cantilever. For tempering of the sensor head, a local thermoregulation is applied using a heater and/or cooling device for heating and/or cooling of the sensor head depending on thermal conductivity of material of at least the sensor head and depending on secondary heat in the coating installation.
G01B 11/14 - Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
B05B 5/12 - Plant for applying liquids or other fluent materials to objects specially adapted for coating the interior of hollow bodies
18.
HEAT-TREATABLE INFRARED RADIATION-REFLECTING LAYER SYSTEM AND METHOD FOR THE PRODUCTION THEREOF
The invention relates to a heat-treatable infrared radiation-reflecting layer system on a transparent, dielectric substrate (S0) and to a method for the production thereof, comprising viewed upwardly from the substrate (S0) a base layer array (GA) having a dielectric base layer (GAG) made of a nitride, oxide or oxynitride of a metal, a semiconductor or a semiconductor alloy, for reducing the diffusion processes from the substrate (S0). Above that is a functional layer array (UFA) having a metal functional layer (UFAF) and a blocker layer (UFAB) made of a metal, a metal mixture or metal alloy or made of an oxide, nitride or oxynitride thereof. The layer system is completed by a cover layer array (DA) having a first dielectric cover layer (DA1), which contains an oxide or oxynitride of zinc stannate that is deposited under a reactive gas atmosphere, and a second dielectric, highly refractive cover layer (DA2) containing an oxide, nitride or oxynitride of silicon.
C03C 17/36 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
C03C 17/00 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating
19.
METHOD FOR COATING SUBSTRATES FROM THE VAPOR PHASE
The invention relates to a method for coating substrates with organic materials, wherein the organic material, consisting of a powder mixture made of the organic material to be evaporated and a powdery, chemically inert material as an absorption material for microwaves, is evaporated in an evaporator and deposited on a substrate.
C23C 14/28 - Vacuum evaporation by wave energy or particle radiation
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
The invention relates to transport devices, in particular for use in substrate treatment devices, and to embodiments of substrate treatment devices, in particular horizontal coating plants for copiously coating plate-shaped substrates during the production of solar cells. The transport device comprises a plurality of transport rollers (1) which are mounted rotatably in each case at their two ends, wherein at least one transport roller (1) can be displaced axially, that is to say parallel to its rotational axis, during operation of the transport device.
The invention relates to a method and a device for locally depositing an organic material (6) on a substrate (7) using an intermediate carrier, wherein the organic material (6) is locally deposited of the intermediate carrier by means of energy input by radiation. The intermediate carrier has a microstructure by means of which the organic material (6) is transferred from the intermediate carrier to the substrate (7) in a microstructured manner.
B41M 5/382 - Contact transfer or sublimation processes
C23C 14/56 - Apparatus specially adapted for continuous coatingArrangements for maintaining the vacuum, e.g. vacuum locks
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
H01L 51/56 - Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
H05B 33/10 - Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
22.
METHOD AND DEVICE FOR MEASURING OPTICAL CHARACTERISTIC VARIABLES OF TRANSPARENT, SCATTERING MEASUREMENT OBJECTS
The invention relates to the measurement of various transmission and reflection values of transparent measurement objects (1), which are provided with transparent layers in an inline coating system, and to a device for carrying out said method. The aim of the invention is to provide such a method and a device that can be used for said method, with which the desired characteristic variables, and particularly the turbidity of the measurement object (1), can be determined inline - i.e., also during a relative movement between the measurement object and measuring device - and thus can be used for the ongoing monitoring of the characteristic variable in an inline system. In order to solve the problem, transmission fractions are measured in two different radiation directions of a lighting source (5) emitting diffuse light by means of two photodetectors (21, 22), by which the fraction of diffuse light of the lighting source (5) is suppressed in one direction.
The invention relates to a method for coating substrates (1) with materials to be vaporized in a vacuum coating system, wherein the vaporization material is deposited on the substrate (1) by double vaporization using an intermediate carrier (3), wherein the intermediate carrier (3) is continuously moved. The aim of the invention is to provide an intermediate carrier that ensures the application in a flow-through coating system. This aim is achieved according to the invention by a cylindrical intermediate carrier (3).
The invention, which relates to an apparatus for transporting strip-like material, having a treatment roller and at least one transporting or strip-gliding roller, addresses the problem of indicating an apparatus for transporting strip-like material (3) in which contact of the fair side is avoided and which can be used cost-effectively in coating installations. This problem is solved in that at least one transporting or belt-guiding roller, which is arranged upstream or downstream of a treatment roller (1, 2), is designed as a twisting roller such that it has an axis of rotation (9, 12) which encloses an angle other than 0° in relation to the axis of rotation (9, 13) of the respective treatment roller. The function of the twisting roller (8, 11) is that of rotating the course taken by the strip-like material in relation to the course defined by the surface of the treatment roller.
The invention relates to a planar heating unit for a substrate treatment device with an increased power density and an improved uniformity of heat radiation. According to the invention, in a planar heating unit for a substrate treatment device that comprises a jacketed tube heater with straight tube sections and bent tube sections, the straight tube sections lying parallel to one another on a primary plane and the straight tube sections being interconnected by bent tube sections, at least one part of the bent tube sections is inclined in relation to the primary plane.
F27D 99/00 - Subject matter not provided for in other groups of this subclass
C23C 16/48 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
H05B 3/48 - Heating elements having the shape of rods or tubes non-flexible heating conductor embedded in insulating material
26.
TRANSPORTING METHOD, DRIVING DEVICE AND SUBSTRATE TREATING INSTALLATION
A method for transporting substrates in substrate treating installations (1) is proposed, in which method a substrate is moved in the substrate treating installation (1) by means of a transporting device (2), wherein the transporting device (2) is driven by a driving device (3) with a driving means (34) and a drawing means (31), wherein, during the operation of the driving means (34), at least the empty strand (32) of the drawing means (31) is tensioned. Also proposed is a driving device (3) for a transporting device (2) of a substrate treating installation (1), which comprises a driving means (34) with a driving wheel (35) and a drawing means (31), which is led around the driving wheel (35) and at least one driven wheel (22) of the transporting device (2) and drives said wheels during the operation of the substrate treating installation (1), wherein a tensioning force acts at least on the empty strand (32) of the drawing means (31).
The aim of the invention, which relates to a method for coating a substrate in a vacuum chamber having a rotating magnetron, wherein a substrate is guided past the magnetron in a substrate transport direction and is coated by means of a material, which has been isolated from a target connected to the magnetron, optionally with the material reacting with a reactive gas present in the vacuum chamber, is to improve the homogeneity of the layer on a substrate by stabilizing the working point by way of the target rotation. This is achieved in that a periodic change of a first process parameter caused by the target revolution is compensated for by a periodic change of a second process parameter having a determined level and/or that two magnetrons having different rotational speeds are provided.
The invention, which relates to a device for controlling the temperature of substrates in a substrate-treatment system, in which a substrate (1) can be guided in the longitudinal extension (2) of the substrate-treatment system in a substrate transport plane (3) within a vacuum chamber past a treatment device (7), is based on the problem of dynamically shaping a dynamic change of the thermal insulation to control the heat transfer in the substrate (1) and to thereby reduce in particular thermal inertias. Said problem is solved in that provided on one side of the substrate transport plane (3) is a heat-absorbing cooling means (9) which in one embodiment can be shielded at least partially from the substrate transport plane (3) using an insulation means (10).
The invention, which concerns a continuous vacuum coating installation with an installation chamber which comprises statically defined stiffening elements (4), which are provided with walls that enclose a vacuum space (8), is based on the object of on one hand making the configuration of a continuous vacuum coating installation meet the conflicting technological requirements and on the other hand using a universal approach to the construction of the chamber to limit the production costs for installation chambers in the case of installations of a highly repetitive character. This is achieved according to the invention by the stiffening elements (4) being arranged outside the vacuum space (8).
W. HALDENWANGER TECHNISCHE KERAMIK GMBH & CO. KG (Germany)
Inventor
Klooss, Matthias
Naderer, Christian
Abstract
The invention relates to a transport roller, comprising a ceramic roller body (1) having two ends (11) and two metallic end caps (2), each having a receiving bore (21), wherein each end (11) of the roller body (1) is arranged in a receiving bore (21) of an end cap (2) and connected to the end cap (2) in a rotationally fixed manner, wherein the end (11) of the roller body (1) and the receiving bore (21) of the end cap (2) have at least one groove (12, 22) each, running parallel to the longitudinal axis of the roller body (1) that in pairs define a hollow space (3) similar to the bore in a joined state and at least one helical spring or a spring dowel pin (4) is arranged in said hollow space (3) and prevents a relative rotation between the roller body (1) and the end cap (2).
B21B 39/00 - Arrangements for moving, supporting, or positioning work, or controlling its movement, combined with or arranged in, or specially adapted for use in connection with, metal-rolling mills
B65G 39/02 - Adaptations of individual rollers and supports therefor
C21D 9/00 - Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articlesFurnaces therefor
F16D 1/104 - Quick-acting couplings in which the parts are connected by simply bringing them together axially having retaining means rotating with the coupling and acting only by friction
31.
ARRANGEMENT FOR COATING TAPE-SHAPED FILM SUBSTRATES
The invention relates to an arrangement for coating tape-shaped film substrates, comprising an unwinding reel and a winding reel, between which the film substrate is guided so as to be subjected to tensile stress, and a coating station that is arranged therebetween. The aim of the invention is to be able to vacuum-coat film substrates without exceeding the maximum substrate temperature and convey the substrate at a high quality. Said aim is achieved by providing the coating station with at least two coating sources which are disposed one behind another in the direction of travel of the tape on a side facing the side on which the film substrate is coated. Furthermore, a supporting element that generates a supporting force resulting from the tensile stress of the tape on the rear side of the film substrate as a force component is arranged between two adjacent coating sources, on a rear side of the film substrate facing away from the coating side, and the film substrate is freely stretched between two supporting elements.
The invention relates to a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode (3) and a first (1) and a second (2) anode supplied with voltage by means of an H-bridge circuit, with the object of increasing the efficiency of redundant anode sputtering having dual anodes, and increasing component reliability. The aim is achieved in that the DC current supply is designed as a pulse current supply (6), in that the pole reversal of the cathode voltage is effected by the pulse current supply, at least one anode being at positive potential at all times and the other anode being intermittently at negative potential during an etching time, and the H-bridge circuit being operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.
The invention relates to a method and device for transferring a substrate into or out of a vacuum coating installation, in which a transfer chamber (3) is adjoined by a buffer chamber (6) and said buffer chamber is adjoined by a process region (20), the transfer chamber (3) and the buffer chamber (6) can be separated from each other, from the surrounding atmosphere and from the process region (20) by closable doors (4, 2, 11), and the transfer chamber (3) comprises a first pumping system (9) and the buffer chamber (6) comprises a second pumping system (14). For the transfer, the substrate (10) is transported into an extended transfer chamber (1), formed by the transfer chamber (3) and the buffer chamber (6) when the intermediate door (4) between the two chambers 3, 6 is open, and pressure conditions such that there is a difference in pressure between the transfer chamber (3) and the buffer chamber (6), with lower pressure in the buffer chamber (6), are established when the doors (2, 11) on the inlet side and outlet side of the extended transfer chamber (1) are closed, by using a flow resistance (7) that is arranged in the extended transfer chamber (1).
The invention relates to a process and an apparatus for the introduction or removal of a substrate into or from a process chamber of a vacuum coating unit in which a process region is adjoined by a lock chamber which can be separated from the surrounding atmosphere and from the process region by two lock gates which can be closed in a vacuum-tight manner and the process region encompasses at least one process chamber and also a transfer chamber for altering the transport speed of the substrate. To introduce or remove a substrate, a vacuum-tight gate on the inlet side of a lock system is opened, the substrate is transported into the lock system and the gate is closed, the pressure in the lock system is subsequently matched to the pressure in the space which follows in the transport direction, an outlet-side gate at the end of the lock system is opened and the substrate is transported from the lock system. The lock system is formed by a lock chamber and an adjoining transfer chamber by the transfer chamber being connected to the lock chamber and the lock gate between transfer chamber and lock chamber remaining open during introduction or removal of the substrate.
The invention relates to a method and an apparatus for treating strip-shaped substrate (2) in a vacuum coating system comprising a vacuum zone (3)which is sealed by means of an inlet lock and an outlet lock (1) and is connected to vacuum generators. Each lock (1) encompasses a top lock component (4) that is arranged above the substrate (2) and a bottom lock component (5) which is disposed below the substrate. The aim of the invention is to develop an apparatus and a method for continuously conveying strip-shaped, generally metallic substrates from atmosphere into and out of vacuum process vessels, allowing the apparatus to be replaced without cutting the strip and be opened during operation. In the disclosed method, said aim is achieved by moving the top and the bottom lock component (4, 5) independently of one another and without penetrating the line of conveyance when the lock (1) is opened. In the disclosed arrangement, said aim is achieved by the fact that the top and the bottom lock component (4, 5) can be independently moved relative to the strip-shaped substrate (12).
A description is given of a light transmitter (1) comprising a hollow cylinder (10) having a highly reflective and diffusely scattering inner surface, having a light source (26) arranged in its interior and having a light exit opening (14) at a distance from the light source. A description is also given of a light receiver (2) comprising precisely such a hollow cylinder (10), having a light sensor (24) instead of the light source, at a distance from a light entrance opening (32). In this case, light source (26) and light sensor (24) are arranged at such a distance from the light exit opening (14) and from the light entrance opening (32) respectively, given a corresponding direction of propagation of the light, that the light emitted by the light source (26) or received by the light sensor (24) and multiply reflected in the hollow body (10) emerges as diffuse light from the light exit opening (14) or is incident on the light sensor (24). A description is likewise given of a measuring device using such a light transmitter (1) or light receiver (2) for measuring optical properties of transparent substrates (4).
The invention relates to a vacuum coating method and an arrangement for carrying out said method. In said method, evaporant is transferred into a liquid phase by means of a fusing process, and a vapor is produced from said liquid evaporant in a vacuum chamber by means of an evaporator. The aim of the invention is to develop a vacuum coating method and an arrangement for carrying out said method which allows new evaporant to be fed without interrupting the coating process and with little effort compared to the prior art. Said aim is achieved by introducing the evaporant into the vacuum chamber from outside the vacuum chamber while maintaining the process vacuum and fluidically supplying the evaporant to the evaporator via a connecting pipe.
The invention relates to an infrared reflecting layer system on a transparent substrate and a method for the production of said layer system. The task on which the invention is based, to produce a layer system and a method for the production thereof, providing sufficient quality at demanding climate conditions with a heat treatment of the substrate and/or undefined condition with the glass substrate, particularly an adjustable transmission of approximately 10 to 80 % in the visible range as well as providing a low emitability and at the same time a substantial stability of the color location of the layer system, is achieved by a temperable, infrared-reflecting and visible light in the range of visible light adjustable absorbing layer system for layering of dielectric substrates (S0), having on the substrate (S0) in the following sequence: a transparent, highly retractive dielectric layer S2, an absorber- or blocker layer S3 on the substrate side, a functional metallic reflection layer S4, an upper absorber- and blocker layer S5 and a transparent high braking dielectric layer S6. The layer system according to the invention, allows for the combination of properties of a temperable IR-reflecting layer system (Low-E) on glass substrates with those of a temperable solarcontrol-system with adjustable transmission of approximately 10% to approximately 80% in the visible range of light.
C03C 17/36 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
39.
TEMPERABLE SOLAR CONTROL LAYER SYSTEM AND METHOD FOR THE PRODUCTION THEREOF
The invention relates to a temperable solar control layer system on transpartent substrates with adjustable reflecting color and transmission and a method for the production thereof. The invention is based on the task to exhibit a sun protective layer system being applied to gas by a vacuum layer, being variably heat-treatable and keeping up the chemical and mechanic resistance with no visible color shift and is obtained by a temperable, visible light reflecting and absorbing layer system for coating of dielectric substrates S0, wherein the substrate S0 contains at least a transparent, highly refractive dielectric layer S2, a functional, metallic reflection- and absorption layer S4 and a transparent, highly-refractive dielectric layer S6 in this sequence. The solar control layer system according to the invention allows for adjustment of the reflecting color and the transmission.
C03C 17/34 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
C03C 17/36 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
The invention relates to a method and a device for coating a substrate with a defined distribution of coating thickness, in a vacuum coating process, by means of a coating source facing the substrate, essentially operated continuously and uniformly, wherein the substrate and the coating source are moved relative to each other. The problem addressed by the invention is to disclose a working method for adjusting a desired distribution of the thickness of a coating which can be applied to differently formed substrates in a vacuum coating process. According to the invention, the problem is solved by the fact that the substrate and/or the coating source are moved relative to each other by means of the first transport system and a second transport system respectively, due to which the substrate and/or coating source cover a series of successive defined positions and persist in each of the positions for an independently adjustable dwell period, and that the arrivals at the positions and the dwell periods take place by means of mutually synchronized controls of the two transport systems, according to the position-dependent dwelling function.
The invention relates to a highly efficient getter pump with low maintenance requirements and to a vacuum coating installation, in the vacuum chamber of which an ultra-high vacuum can be generated, thus allowing the substrate to be coated to remain uncontaminated by a dusting of getter material. The getter pump according to the invention comprises a pump housing (5) with an exposure opening (7). Said pump housing (5) is provided with a getter body (8), which consists of getter material, essentially closes the exposure opening (7) and is located so that it can move in relation to the exposure opening (7). An inner sub-section of the surface of the getter body (8) points towards the interior of the pump housing (5) and an outer sub-section of the surface of the getter body (8) points towards the exterior of the pump housing (5) through the exposure opening (7), the positions of the inner and outer sub-section of the surface of the getter body (8) being interchangeable by the movement of the getter body (8). The getter pump is characterised in that it is equipped with a removal device (9) for removing getter material from the inner sub-section of the surface of the getter body (8). The vacuum coating installation according to the invention comprises at least one getter pump of this type.
F04B 37/02 - Pumps specially adapted for elastic fluids and having pertinent characteristics not provided for in, or of interest apart from, groups for evacuating by absorption or adsorption
F04B 37/08 - Pumps specially adapted for elastic fluids and having pertinent characteristics not provided for in, or of interest apart from, groups for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
H01J 7/18 - Means for absorbing or adsorbing gas, e.g. by gettering
42.
VACUUM COATING SYSTEM COMPRISING A TRANSPORT UNIT FOR TRANSPORTING SUBSTRATES
The invention relates to a vacuum coating system with a transport unit for transporting substrates in a transport direction. Said system comprises at least one first continuous conveyer running in the transport direction and having a delivery element that is guided around at least two deflection rollers and that is located at a distance from a guide unit extending in the transport direction parallel to the delivery element of the first continuous conveyer in such a way that the substrates can be introduced into the gap between the delivery element of the first continuous conveyer and the guide unit and can be moved in the transport direction by the displacement of the delivery element of the first continuous conveyer.
B65G 37/00 - Combinations of mechanical conveyors of the same kind, or of different kinds, of interest apart from their application in particular machines or use in particular manufacturing processes
B65G 15/24 - Conveyors having endless load-conveying surfaces, i.e. belts and like continuous members, to which tractive effort is transmitted by means other than endless driving elements of similar configuration comprising a series of co-operating units in tandem
43.
HIGHLY REFLECTIVE LAYER SYSTEM, METHOD FOR PRODUCING THE LAYER SYSTEM AND DEVICE FOR CARRYING OUT THE METHOD
The invention relates to a highly reflective layer system for coating substrates with reflection-enhancing layers, to a method for producing the layer system and to a device for carrying out the method. On the surface of the substrate (S0), a first functional reflection layer (S3) is applied. The first functional reflection layer (S3) may be reflective or partially reflective and consist of metal or a metal alloy which contains one or more constituents from the group comprising copper, nickel, aluminium, titanium, molybdenum and tin. Provided over it is a second functional reflection layer (S5). The second functional reflection layer (S5) may consist of metal or a metal alloy, for example silver or a silver alloy. Over the second functional reflection layer (S5) there follows a first transparent dielectric layer (S7). The first transparent dielectric layer (S7) may consist, for example, of silicon oxide. Arranged over the first transparent dielectric layer (S7) is a second transparent dielectric layer (S8). This may consist, for example, of titanium oxide.
C23C 28/02 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of metallic material
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 14/02 - Pretreatment of the material to be coated
A heater panel of a radiant heater includes a heating spiral provided on a panel element and mechanically connected to the panel element with a portion of a spiral turn. With the object of providing a heater panel with a stable arrangement of the heating spiral on the panel element by which a high power density is achievable, each spiral turn is detachably connected to the panel element by three spaced-apart contact spots. Two of said contact spots are located on the outer circumference of the spiral turn in such a distance to each other that the radii originating at them define an angle of less than 180°, and the third contact spot is located on the inner circumference of the spiral turn within the portion of the spiral turn facing the panel element and confined by the two outer contacts.
The invention relates to a separating device for process chambers of vacuum coating installations and to a vacuum coating installation with which a separation of the process atmospheres of neighbouring process chambers is possible in a simple and low-cost way and it is possible to ventilate one process chamber while maintaining the process atmosphere that is prevailing in the neighbouring process chamber. The separating device according to the invention for process chambers arranged one after the other in a vacuum coating installation for coating two-dimensional substrates comprises a separating element which can be fitted between two process chambers transversely in relation to the transporting direction of the substrates, said element comprising a passage for the substrate that is arranged in the region of the transporting plane of the substrate and formed by at least one through-opening provided in the separating element, and is characterized in that at least one closure, optionally closing or opening the passage, is provided. According to a development of the invention, it is provided that an intermediate chamber formed by intermediate chamber outer walls is also provided and the separating element is arranged inside the intermediate chamber and the intermediate chamber is subdivided into two intermediate chamber segments. In the case of this configuration, the separating device according to the invention forms a chamber of its own, which may be arranged between two neighbouring process chambers.
The invention relates to a method for coating a substrate with the aid of a cathode which is embodied as a magnetron and in addition to which two electrodes are alternately impinged upon by a positive potential (anode potential) and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. The aim of the invention is to improve the quality of substrate coatings by increasing the regularity of the layer thickness and reducing soiling of the substrate caused by redundant anodes. Said aim is achieved by a method in which the negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. Said aim is also achieved by an assembly in which the magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.
The invention relates to an apparatus and a method for evaporating evaporation material that is in a crucible (1) by heating the evaporation material (3, 4, 5) by means of supplying energy from a controllable power generator (12) to a temperature at which part of the evaporation material (5) is in the gas phase. The invention is based on the object of providing a method and an apparatus for evaporating evaporation material (3, 4, 5) that allow the vapour stream at the vapour outlet (10) to be stabilized by means of simple, reliable and low-cost monitoring and regulating capabilities. This object is achieved by an evaporating method in which energy is supplied to and/or extracted from the evaporation material in such a way that, during the stable phase of the process, it is simultaneously in the gaseous phase (5), solid phase (3) and liquid phase (4) and the temperature at the surface of the liquid evaporation material corresponds approximately to the temperature of its triple point. An apparatus for carrying out the method has a measuring device (14, 15) for determining the degree of solidification and/or a partly heatable (12) and/or coolable (13) wall (1).
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