A toilet system according to an embodiment of the present invention comprises: a first detection sensor that is provided to a toilet device and detects odorless gas; a second detection sensor that is provided to the toilet device and detects odorous gas; and an estimation means for estimating, on the basis of detection results from the first detection sensor and the second detection sensor, at least one of the intestinal bacteria, metabolites of intestinal bacteria, or pH of a user who uses the toilet device.
A health information inference system according to an embodiment of the present invention comprises: a data acquisition means for acquiring data that is detected by a sensor which is disposed in a wet-area space; a data structure determination means for determining a data structure, on the basis of a data array configured by associating, on the basis of date and time information, data that has been acquired by the data acquisition means; and a health information inference means for inferring, on the basis of the data array, health information pertaining to a user, wherein the health information inference means selects a model corresponding to the data structure from among a plurality of health information inference models and infers a health state of the user.
G16H 50/30 - ICT specially adapted for medical diagnosis, medical simulation or medical data miningICT specially adapted for detecting, monitoring or modelling epidemics or pandemics for calculating health indicesICT specially adapted for medical diagnosis, medical simulation or medical data miningICT specially adapted for detecting, monitoring or modelling epidemics or pandemics for individual health risk assessment
G16H 10/00 - ICT specially adapted for the handling or processing of patient-related medical or healthcare data
G01N 33/493 - Physical analysis of biological material of liquid biological material urine
An abnormality detection system according to an embodiment has an acquisition unit that acquires information that indicates a tendency of a usage state of one use item that is provided as an item for use that is executed by a user of a toilet, and a determination unit that determines that an abnormality concerning the one use item occurs in a case where a tendency of the usage state of the one use item is separated from a use tendency of the one use item in past.
An electrostatic chuck 10 includes a dielectric substrate 100 which includes a first part 101 including a placement surface and a second part 102 which protrudes from an outer circumferential edge of the first part 101 further towards an outer circumferential side, an internal electrode 140 provided inside the second part 102, a feed terminal 160 provided in a position which is not overlapped with the internal electrode 140 in top view, and a bypass portion 150 which is provided inside the dielectric substrate 100 and electrically connects the feed terminal 160 and the internal electrode 140.
An electrostatic chuck 10 includes a dielectric substrate 100 including a placement surface and a base plate 200 which is joined to the dielectric substrate 100 and which has formed therein a coolant flow path 400 through which a coolant flows. The coolant flow path 400 includes a first flow path 410 and a second flow path 420 connected in series to each other. The second flow path 420 is formed in a position on the dielectric substrate 100 side relative to the first flow path 410 in a direction perpendicular to the placement surface.
Disclosed is a hygienic ceramic ware provided with a matte surface, said hygienic ceramic ware having a moist and calm texture. A hygienic ceramic ware according to the present invention comprises a ceramic ware base and a glaze layer on the surface thereof, wherein the surface of the glaze layer (1) has a 20° gloss level of 5 or less, a 60° gloss level of 20 or less, and an 85° gloss level of 30 or less, and (2) has a surface roughness Ra of 1.0 μm or greater, and the hygienic ceramic ware imparts to a viewer a moist and calm impression differing from that of conventional matte surfaces. Consequently, it is possible to enhance the appearance (design) of products and harmonize the same with the textures of walls and fixtures in the same space, and design variation is broadened to be able to provide a design space that is unified with the surroundings, for example, and to increase product value.
An electrostatic chuck includes a ceramic dielectric substrate, a base plate, a heater part, and a bypass part. The ceramic dielectric substrate includes a substrate upper surface and a substrate lower surface. The heater part is disposed between the substrate upper surface and the substrate lower surface. The heater part includes at least one heater layer. The heater part includes a heater upper surface and a heater lower surface. The bypass part includes a first bypass portion disposed lower than the substrate lower surface. The first bypass portion including a first bypass upper surface and a first bypass lower surface. A second distance between the heater lower surface and the first bypass upper surface is greater than a first distance between the heater upper surface and the substrate upper surface.
H02N 13/00 - Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
B23Q 3/15 - Devices for holding work using magnetic or electric force acting directly on the work
8.
UNIT WITH TAP WATER-USING FACILITY IN BUILDING, OR METHOD FOR PREVENTING CHLORINE-RESISTANT METHYLOBACTERIUM FROM GROWING ON SURFACE OF SAID UNIT OR FOR STERILIZING CHLORINE-RESISTANT METHYLOBACTERIUM HAVING GROWN ON SURFACE OF SAID UNIT
A unit with a tap water-using facility in a building, the unit being capable of effectively suppressing the growth of a chlorine-resistant Methylobacterium, or being capable of effectively sterilizing the chlorine-resistant Methylobacterium that has once grown. This unit is positioned in a building, and comprises a supply of tap water to the tap water-using facility, an tap water electrolyzer to produce electrolyzed water by electrolyzing the tap water, and a nozzle or opening which discharges the electrolyzed water which allows the electrolyzed water to be in contact with a surface of the unit. The electrolyzed water comprises ozone and free chlorine, and a concentration of the ozone and a concentration of the free chlorine satisfy, when the latter concentration is referred to as y (ppm) and the former concentration is referred to as x (ppm), all conditions represented by
A unit with a tap water-using facility in a building, the unit being capable of effectively suppressing the growth of a chlorine-resistant Methylobacterium, or being capable of effectively sterilizing the chlorine-resistant Methylobacterium that has once grown. This unit is positioned in a building, and comprises a supply of tap water to the tap water-using facility, an tap water electrolyzer to produce electrolyzed water by electrolyzing the tap water, and a nozzle or opening which discharges the electrolyzed water which allows the electrolyzed water to be in contact with a surface of the unit. The electrolyzed water comprises ozone and free chlorine, and a concentration of the ozone and a concentration of the free chlorine satisfy, when the latter concentration is referred to as y (ppm) and the former concentration is referred to as x (ppm), all conditions represented by
y
≥
4.1079
e
-
18.35
x
,
formula
1
0.1
≤
y
<
5
,
and
formula
2
0
<
x
<
3.
formula
3
44 - Medical, veterinary, hygienic and cosmetic services; agriculture, horticulture and forestry services
Goods & Services
Health counselling, advisory and information services; counselling, advisory and information services in the field of nutrition; online counselling, advisory and information services related to personal physical conditions; providing health information via a website; providing healthcare information via a global computer network.
A structural member 10 has a base material 100 and a protective film 200 covering the surface S1 of the base material 100. A roughness of the surface S1 of the base material 100 is a roughness with an average length RSm of 70 μm or more.
The present invention provides a flush toilet apparatus that includes a flush toilet body including a bowl and having a rim water ejection port, a drain trap pipeline, and a jet water ejection port; a flush water tank body; a rim drain valve; and a jet drain valve, in which the flush toilet apparatus has an exhaust path along which air of an air layer formed in an upstream side of a jet water conduit is discharged, in which the rim-water-ejection drain port and the jet-water-ejection drain port are each provided at a position higher than the lower end of the rim water ejection port, and in which flush water is supplied into the jet water conduit after a flush is started and before the jet drain valve is opened.
A flush toilet apparatus according to the present invention includes: a flush toilet body including a bowl portion, a rim spout port, a drain trap pipe, and a jet spout port; a flush water tank body; a rim spouting/stopping switch mechanism that spouts or stops flush water from the rim spout port; and a jet spouting/stopping switch mechanism that spouts or stops flush water from the jet spout port. The flush toilet apparatus executes a flushing sequence including a first step of starting rim spouting, a second step of starting jet spouting in a state in which rim spouting is continued and activating a siphon action in the drain trap pipe, and a third step of continuing rim spouting while stopping jet spouting.
Provided is a structural member which has high durability with regard to plasma. A structural member10 comprises a base material 100 and a protective film 200 which covers a surface S1 of the base material 100. The protective film 200 is formed of a polycrystalline material which contains an alkaline earth metal oxide or an alkaline earth metal halide. In the structural member10, the respective orientations of crystallites 210 present on a surface S2 of the protective film 200 are not aligned and are irregular.
A structural member 10 has a base material 100 and a protective film 200 covering the surface Si of the base material 100. The protective film 200 is a film containing yttrium oxide as a main component, and an indentation hardness of the protective film 200 is 10 GPa or more.
A structural member 10 has a base material 100 and a protective film 200 covering the surface S1 of the base material 100. When a section obtained by cutting the base material 100 perpendicularly to the surface S1 thereof is defined as a cross-section, a shape of a line corresponding to the surface S1 of the base material 100 in the cross-section is defined as a surface shape, and Fourier transformation is performed on a function representing the surface shape, and the transformed function is drawn as a graph with wavelength (μm) on a horizontal axis, an average slope of the graph in a range where the wavelength is 30 μm or less is 0.0050 or less.
The present invention provides a flush toilet apparatus (1) including a flush toilet main body (2) including a bowl (2a) and a discharge trap conduit (2b), a flush water tank main body (4), a rim discharge valve (8) that controls spouting and stop of flush water from a rim spout port (2c), a jet discharge valve (10) that controls spouting and stop of flush water from a jet spout port (2d), a rim conduit (2e) that guides flush water drained via the rim discharge valve to the rim spout port, and a jet conduit (2f) that guides flush water drained via the jet discharge valve to the jet spout port, and a cross-sectional area of the rim spout port is smaller than a cross-sectional area of the jet spout port.
The present invention detects the condition of a user with high accuracy. A health management system 2 for managing the health of a user 5 in a space having a water-related area including a toilet 6, a washbasin 8, a kitchen 9, or a bathroom 7 comprises: a detection device provided in the space having the water-related area to detect the user 5 using the water-related area; and a stimulation device 70 provided in a space having the bathroom 7 to provide a predetermined stimulus to the user 5 on the basis of a detection result from the detection device.
G16H 50/30 - ICT specially adapted for medical diagnosis, medical simulation or medical data miningICT specially adapted for detecting, monitoring or modelling epidemics or pandemics for calculating health indicesICT specially adapted for medical diagnosis, medical simulation or medical data miningICT specially adapted for detecting, monitoring or modelling epidemics or pandemics for individual health risk assessment
A47K 4/00 - Combinations of baths, showers, sinks, wash-basins, closets, or urinals, not covered by a single other group of this subclass
G16H 20/00 - ICT specially adapted for therapies or health-improving plans, e.g. for handling prescriptions, for steering therapy or for monitoring patient compliance
18.
DEVICE FOR DISCHARGING REFORMED WATER, AND TOILET DEVICE PROVIDED WITH SAID DEVICE
Disclosed is a device for discharging reformed water capable of suppressing hydrophobization of a hydrophilic bowl surface of a toilet bowl due to adhesion of urine-derived protein to the bowl surface, thereby maintaining hydrophilicity of the bowl surface and waste-cleaning performance of the bowl surface. The device, which is used together with a toilet bowl having a hydrophilic bowl surface and discharges reformed water onto the bowl surface, comprises a generation unit for generating reformed water, and a discharge unit for discharging the generated reformed water onto the bowl surface, and is characterized in that: when the product of the concentration of an active component contained in the reformed water and the time during which the reformed water is discharged onto the bowl surface is defined as the CT value (ppm/sec), A: the reformed water is ozone water and is discharged with a CT value of 2 ppm/sec to 100 ppm/sec inclusive, B: the reformed water is hydrogen peroxide water and is discharged with a CT value of 5 ppm/sec or more and less than 1000 ppm/sec, or C: the reformed water is free chlorine water and is discharged with a CT value of 20 ppm/sec to 300 ppm/sec inclusive.
A toilet system according to an embodiment comprises: a data acquisition means for acquiring use data of a toilet device, the use data including at least one of biological data of a toilet user based on an output of a biological sensor provided in the toilet device and excretion data of the toilet user based on an output of an excretion sensor provided in the toilet device; a data analysis means for analyzing the health condition of the toilet user on the basis of the use data; and a criterion creation means for creating a predetermined biological analysis criterion to be used when the data analysis means analyzes the health condition of the toilet user, on the basis of the use data in a predetermined period.
03 - Cosmetics and toiletries; cleaning, bleaching, polishing and abrasive preparations
05 - Pharmaceutical, veterinary and sanitary products
16 - Paper, cardboard and goods made from these materials
Goods & Services
Tissues impregnated with cosmetic lotions; tissues
impregnated with essential oils, for cosmetic use; tissues
impregnated with a skin cleanser; pre-moistened towelettes
impregnated with a detergent for cleaning; cloths or tissues
impregnated with a skin cleanser; tissues impregnated with
make-up removing preparations; tissues impregnated with
cosmetics. Tissues impregnated with insect repellents; tissues and
wipes impregnated with pharmaceutical lotions and creams;
tissues impregnated with pharmaceutical lotions; tissues
impregnated with antibacterial preparations; sanitizing
wipes; disposable sanitizing wipes. Toilet tissue; toilet paper; facial tissues of paper;
tissues of paper for cosmetic use; tissues of paper for
removing make-up; paper tissues; facial tissue.
Provided is an electrostatic chuck capable of suppressing variation in the in-plane temperature distribution of a substrate being processed. An electrostatic chuck 10 includes a dielectric substrate 100, and a heater unit 300 for heating the dielectric substrate 100. The heater unit 300 has a heating part 351 which is a linearly routed conductor and generates heat by receiving externally supplied power. In a top view, the heating part 351 has a protruding part 351A routed along a path protruding in an arc shape. The line width W2 of the protruding part 351A of the heating part 351 is smaller than the line width W1 of a portion of the heating part 351 connected to the protruding part 351A.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
Provided is an electrostatic chuck that makes it possible to prevent a short circuit between a bypass portion and an electric power supply terminal. This electrostatic chuck 10 comprises a dielectric substrate 100 and a heater 300 that heats the dielectric substrate 100. The heater 300 includes a heat generation portion 351 that is a conductor routed in a linear manner and that generates heat by receiving a supply of electric power from the outside, a bypass layer 370 that is provided at a height position different from that of the heat generation portion 351, and an electric power supply terminal 390 that is joined to the bypass layer 370. In a top view, the heat generation portion 351 is routed along a path that does not pass through a region D1 overlapping the electric power supply terminal 390.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Provided is an electrostatic chuck capable of simplifying a circuit configuration for temperature regulation and control. An electrostatic chuck 10 includes a dielectric substrate 100 and a heater unit 300 that heats the dielectric substrate 100. The heater unit 300 has a heat generating part 331 that is a conductor routed linearly and generates heat by receiving power supply from the outside. In a top view, the heat generating part 331 is individually routed in each of the plurality of regions HA. The plurality of regions HA include a first region HA 11 and a second region HA 12. The electrostatic chuck 10 satisfies the condition (ǀR1-R2ǀ)/R2 < 0.15, where R1 is the electric resistance value of the heat generating part 331 routed in the first region HA 11, and R2 is the electric resistance value of the heat generating part 331 routed in the second region HA 12.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
An electrostatic chuck includes a base plate, a first heater element, and a plurality of first power feeding terminals. The base plate includes a communicating path having a spiral shape. The first heater element includes a plurality of first zones. The plurality of first power feeding terminals feeds power to the plurality of first zones. Each of the plurality of first zones includes a first heater line and a pair of first power feeding portions feeding power to the first heater line. The pair of first power feeding portions is electrically connected to the plurality of first power feeding terminals. The plurality of first power feeding terminals includes a first and a second annular portion. The communicating path includes a first circumferential portion surrounding the second annular portion between the first annular portion and the second annular portion when viewed along a stacking direction.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H05B 3/26 - Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
Provided is an electrostatic chuck capable of suppressing variation in the in-plane temperature distribution of a substrate during processing. An electrostatic chuck 10 comprises a dielectric substrate 100, and a heater unit 300 for heating the dielectric substrate 100. The heater unit 300 comprises a heat generation part 351 which is a linearly routed conductor. In the top plan view, the heat generation part 351 includes a first heat generation part 351A and a second heat generation part 351B that are routed along paths that do not pass through either a first region D1 or a second region D2, which are a pair of circular regions disposed at positions close to each other, the first heat generation part 351A and the second heat generation part 351B being disposed so as sandwich the entirety of the first region D1 and the second region D2. Each of the first heat generation part 351A and the second heat generation part 351B is routed along a path which is recessed toward the space between the first region D1 and the second region D2.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Provided is an electrostatic chuck capable of suppressing variation in the in-plane temperature distribution of a substrate during processing. An electrostatic chuck 10 comprises a dielectric substrate 100, and a heater unit 300 for heating the dielectric substrate 100. The heater unit 300 comprises a heat generation unit 351 that is a conductor routed linearly and generates heat by receiving power supply from the outside. In a top view, the heat generation unit 351 includes: a first portion P1 that is individually routed in each of a plurality of regions HB and is routed so as to extend along a boundary BD of a pair of the regions HB adjacent to each other; and a second portion P2 that is routed so as to protrude in an arc shape from the first portion P1 toward the side opposite to the boundary BD.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Provided is an electrostatic chuck capable of suppressing variation in the in-plane temperature distribution of a substrate during processing. The electrostatic chuck 10 comprises: a dielectric substrate 100; a heat generation section 300, namely, a conductor that is routed linearly, receives a power supply from the exterior and thereby generates heat, and heats the dielectric substrate 100; and a base plate 200 that is joined to the dielectric substrate 100 and has formed therein a refrigerant flow path 250 through which a refrigerant passes. In a top view, the refrigerant flow path 250 has an arc section 250A that is a part extending along an arc-shaped path, and the heat generation section 300 has a meandering section 300A, namely, a part that at least partially overlaps the arc section 250A and meanders relative to the arc section 250A.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Provided is an electrostatic chuck capable of suppressing the variation in in-plane temperature distribution of a substrate during processing. An electrostatic chuck 10 comprises: a dielectric substrate 100; a heat generation part 351 which is a conductor routed linearly and generates heat by receiving power supply from the outside to heat the dielectric substrate 100; and a base plate 200 which supports the dielectric substrate 100. In a top plan view, the heat generation part 351 is routed along a path that does not pass through either a circular first region D1, overlapping an opening formed in a surface 210 of the base plate 200 that faces the dielectric substrate 100, or a circular second region D2 not overlapping the opening, wherein the first region D1 is larger than the second region D2.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Provided is an electrostatic chuck that can suppress variation in an in-plane temperature distribution of a substrate during processing. The electrostatic chuck 10 comprises a dielectric substrate 100 and a heater unit 300 that heats the dielectric substrate 100. The heater unit 300 has a heat-generating part 351 that is a linearly routed conductor and generates heat upon receiving a supply of power from an external source. In a top view, the heat-generating part 351 is routed so as to straddle at least two mutually adjacent regions HB11 and HB12 and is routed along paths that are mutually the same or symmetrical in each region.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
A faucet device includes a water discharge part that discharges a hot or cold water and a faucet main body that is arranged inside a bathroom and supplies a hot or cold water to the water discharge part. The faucet main body includes a flow-rate/temperature control part that executes flow rate control and temperature control for a hot or cold water that is discharged from the water discharge part, a motor that drives the flow-rate/temperature control part, a controller that controls driving of the motor, a first waterproof case that houses the motor and isolates the motor from an internal space of the bathroom, and a second waterproof case that houses the controller and isolates the controller from an internal space of the bathroom. The first waterproof case and the second waterproof case are communicated with an external space of the bathroom.
E03C 1/04 - Water-basin installations specially adapted to wash-basins or baths
E03C 1/02 - Plumbing installations for fresh water
G05D 7/06 - Control of flow characterised by the use of electric means
G05D 11/16 - Controlling mixing ratio of fluids having different temperatures, e.g. by sensing the temperature of a mixture of fluids having different viscosities
31.
ELECTROSTATIC CHUCK INCLUDING A HEATER ELEMENT WITH MULTIPLE HEATING ZONES
An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater unit. The heater unit includes a first heater element. The first heater element includes a first zone, as well as first and second protruding portions. The first zone includes a first facing region in which the first protruding portion and the second protruding portion are disposed so as to face and be adjacent to each other. The first zone including an inner circumference portion and an outer circumference portion, as well as an outer circumference edge of the first heater element. The outer circumference portion being a portion positioned at the other side in the radial direction of a center line of the radial direction. The outer circumference portion including the outer circumference edge, and the first facing region being located in the inner circumference portion.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H05B 3/26 - Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
A faucet device according to an embodiment includes a water spout part, a hot water and cold water mixing unit, an actuator, a controller, and an operation unit. The hot water and cold water mixing unit includes a body casing, a thermo-sensitive energizing part, and a valve body. The controller is configured to: execute a water spouting mode and a calibration mode, the water spouting mode being a mode for driving, in receiving the information on the set temperature, the actuator to a predetermined position or by a predetermined drive amount that are corresponding to the set temperature to adjust a position of the valve body in an axial direction of the valve body; and the calibration mode is a mode for adjusting setting of the predetermined position or the predetermined drive amount in accordance with at least one of an arrangement environment and product unevenness.
G05D 23/13 - Control of temperature without auxiliary power by varying the mixing ratio of two fluids having different temperatures
F16K 11/00 - Multiple-way valves, e.g. mixing valvesPipe fittings incorporating such valvesArrangement of valves and flow lines specially adapted for mixing fluid
F16K 11/10 - Multiple-way valves, e.g. mixing valvesPipe fittings incorporating such valvesArrangement of valves and flow lines specially adapted for mixing fluid with two or more closure members not moving as a unit
A faucet device according to an embodiment include a water spout part, a hot water and cold water mixing part, an actuator, a controller, and an operation unit. The hot water and cold water mixing part includes a body casing, a thermo-sensitive energizing part, and a valve body. In receiving information on a set temperature, the controller drives the actuator to a predetermined position or by a predetermined drive amount which is corresponding to the set temperature to adjust a position of the valve body in an axial direction of the valve body.
E03C 1/05 - Arrangements of devices on wash-basins, baths, sinks, or the like, for remote control of taps
F16K 11/07 - Multiple-way valves, e.g. mixing valvesPipe fittings incorporating such valvesArrangement of valves and flow lines specially adapted for mixing fluid with all movable sealing faces moving as one unit comprising only sliding valves with linearly sliding closure members with cylindrical slides
A bathroom system according to an embodiment includes: a radio wave sensor which is installed in a bathroom formed by a plurality of panels and which detects a state change in the bathroom; and a state estimation means which estimates the state change in the bathroom on the basis of output data of the radio wave sensor. The state estimation means estimates the state change in a space in the bathroom while excluding a radio wave reflection region including a surface of the panel.
A61B 5/1171 - Identification of persons based on the shapes or appearances of their bodies or parts thereof
F24H 15/196 - Automatically filling bathtubs or poolsReheating the water in bathtubs or pools
G01S 13/52 - Discriminating between fixed and moving objects or between objects moving at different speeds
G01S 13/56 - Discriminating between fixed and moving objects or between objects moving at different speeds for presence detection
G01S 13/88 - Radar or analogous systems, specially adapted for specific applications
G08B 21/02 - Alarms for ensuring the safety of persons
G08B 25/04 - Alarm systems in which the location of the alarm condition is signalled to a central station, e.g. fire or police telegraphic systems characterised by the transmission medium using a single signalling line, e.g. in a closed loop
G08B 25/10 - Alarm systems in which the location of the alarm condition is signalled to a central station, e.g. fire or police telegraphic systems characterised by the transmission medium using wireless transmission systems
Provided is an electrostatic chuck capable of suppressing variation in in-plane temperature distribution in a substrate during processing. An electrostatic chuck 10 comprises: a dielectric substrate 100; an RF electrode 140 provided inside the dielectric substrate 100; a base plate 200 formed of metal and joined to the dielectric substrate 100; and a plurality of connection members 400 electrically connecting the RF electrode 140 and the base plate 200. In a top view, a plurality of gas holes 114 are formed in the dielectric substrate 100, and the connection members 400 and the gas holes 114 are arranged alternately in the circumferential direction.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H02N 13/00 - Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Provided is an electrostatic chuck that can suppress variation in the in-plane temperature distribution of a substrate during processing. An electrostatic chuck 10 comprises a dielectric substrate 100, an RF electrode 140 that is provided inside the dielectric substrate 100, a base plate 200 that is formed from metal and is joined to the dielectric substrate 100, and a plurality of connection members 400 that electrically connect the RF electrode 140 and the base plate 200. A plurality of gas holes 114 are formed in the dielectric substrate 100, and in top view, the connection members 400 and the gas holes 114 are arranged in a single ring.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H02N 13/00 - Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Provided is an electrostatic chuck capable of suppressing variation in in-plane temperature distribution in a substrate during processing. An electrostatic chuck 10 comprises: a dielectric substrate 100; an RF electrode 140 provided inside the dielectric substrate 100; a base plate 200 formed of metal and joined to the dielectric substrate 100; and connection members 400 electrically connecting the RF electrode 140 and the base plate 200. A plurality of gas holes 114 are formed in the dielectric substrate 100. A distribution flow path 240 for distributing gas to the plurality of gas holes 114 is formed in the base plate 200. In a top view, the connection members 400 are disposed at positions where at least portions thereof do not overlap the distribution flow path 240.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H02N 13/00 - Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
39.
FLUSH WATER TANK DEVICE, AND FLUSH TOILET APPARATUS INCLUDING THE SAME
The present invention provides a flush water tank device, including a flush water tank main body including a first tank part and a second tank part for storing flush water, a rim spouting switch mechanism that switches discharge and stop of flush water in the first tank part, and a jet spouting discharge valve that switches discharge and stop of flush water in the second tank part, the first tank part and the second tank part are configured to have different cross-sectional areas depending on a height, and a ratio of the cross-sectional area of the first tank part to that of the second tank part at a first height is different from a ratio of the cross-sectional area at a second height that is lower than the first height.
The present invention provides a flush water tank device including an outer tank, an inner tank disposed inside the outer tank, a water supply valve, a first water discharge/stop switching mechanism disposed inside the outer tank and outside the inner tank to switch supply and stop of flush water stored in the outer tank to the flush toilet main body, and a second water discharge/stop switching mechanism disposed inside the inner tank to switch supply and stop of flush water stored in the inner tank to the flush toilet main body, the water supply valve is configured to supply flush water into the inner tank, and the flush water supplied into the inner tank overflows from two or more sides of the inner tank to flow into the outer tank.
Provided is an electrostatic chuck capable of suppressing variation in the in-plane temperature distribution of a substrate during processing. This electrostatic chuck 10 comprises: a dielectric substrate 100; a seal ring 150 which is an annular protrusion formed on the dielectric substrate 100; an RF electrode 140 provided inside the dielectric substrate 100; a base plate 200 formed of metal and joined to the dielectric substrate 100; and a connection member 400 electrically connecting the RF electrode 140 and the base plate 200. In a top view, the connection member 400 is positioned so that at least a portion of the connection member does not overlap the seal ring 150.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H02N 13/00 - Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Provided is an electrostatic chuck capable of suppressing variation in an in-plane temperature distribution of a substrate during processing. An electrostatic chuck 10 comprises: a dielectric substrate 100; an RF electrode 140 provided inside the dielectric substrate 100; a base plate 200 formed of metal and joined to the dielectric substrate 100; and a connection member 400 electrically connecting the RF electrode 140 and the base plate 200. A refrigerant flow path 250 through which a refrigerant passes is formed inside the base plate 200, and the connection member 400 is disposed at a position where at least a part thereof overlaps the refrigerant flow path 250 in a top view.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H02N 13/00 - Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Disclosed is a composite structure having low-particle generation usable for a member for a semiconductor manufacturing apparatus and also the semiconductor manufacturing apparatus. The composite structure including a base material and a structure that is provided on the base material wherein the structure comprises Y2O3—ZrO2 solid solution (YZrO) as a main component, and lattice constants of the crystal satisfy at least one of a>9.06, b>6.93, and c>6.70 or an peak intensity ratio (300)/(121) which is the ratio of (300) peak to (121) peak in X-ray diffraction of the crystal, is greater than 100% has low-particle generation and is suitably used as a member for a semiconductor apparatus.
Disclosed is a composite structure having low-particle generation usable for a member for a semiconductor manufacturing apparatus and also the semiconductor manufacturing apparatus. The composite structure including a base material and a structure that is provided on the base material wherein the structure comprises Y2O3—ZrO2 solid solution (YZrO) as a main component, and a Y2O3 content of the YZrO is 20 mol % or more and 40 mol % or less has low-particle generation and is suitably used as a member for a semiconductor apparatus.
A biological information measurring system according to an embodiment of the present invention comprises: a suction device for suctioning gas in a bowl of a toilet installed in a lavatory; a gas flow passage for passing the gas that has been suctioned by the suction device; a gas detection device provided with a gas sensor for reacting with a predetermined gas component included in the gas passing through the gas flow passage; a state detection means for detecting a state change in the lavatory; and standby time setting means for setting, on the basis of the toilet state history detected by the gas detection device or the state detection means, a standby time from the end of measurement of a previous user until a next user becomes measurable.
Provided is an electrostatic chuck capable of suppressing an influence on a state of plasma. This electrostatic chuck 10 includes a dielectric substrate 100, and a heater unit 300 for heating the dielectric substrate 100. In a top view, the heater unit 300 includes: a heat generation unit 331 that is a conductor routed linearly on the inner side of a first region HA1; a heat transfer unit 335 that is a conductor disposed so as to occupy the entirety of a second region HA2 that is adjacent to the first region HA1 and has an area larger than the first region HA1; and a connection part 336 that electrically connects the heat generation unit 331 and the heat transfer unit 335.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H02N 13/00 - Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
An electrostatic chuck includes a dielectric substrate, an RF electrode provided inside the dielectric substrate, and a base plate made of metal and joined to the dielectric substrate. The dielectric substrate includes a protrusion section protruding outward beyond a surface of the base plate in top view, and a part of the RF electrode is provided in the protrusion section.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
An electrostatic chuck includes a dielectric substrate including a surface serving as a placement surface, and a base plate which is joined to the dielectric substrate and which has formed therein a coolant flow path through which a coolant flows. In top view, the base plate includes a first part that is a part overlapped with an edge on an outer circumferential side of the surface, and a second part P2 that is a part on the further outer circumferential side relative to the first part P1, and the coolant flow path is formed in each of the first part P1 and the second part. The coolant flow path is formed in a manner that a cooling performance for the first part is set to be higher than a cooling performance for the second part.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
An electrostatic chuck includes a dielectric substrate 100, and a base plate joined to the dielectric substrate. The dielectric substrate is provided with a flange section that is a part protruding outward along the entire periphery of a part of a side surface of the dielectric substrate on the base plate side. The base plate includes a surface which is closest to the dielectric substrate side and a part of which is joined to the dielectric substrate. A part of the surface, which is not joined to the dielectric substrate, surrounds the flange section along the entire periphery in top view.
09 - Scientific and electric apparatus and instruments
11 - Environmental control apparatus
42 - Scientific, technological and industrial services, research and design
44 - Medical, veterinary, hygienic and cosmetic services; agriculture, horticulture and forestry services
Goods & Services
Measuring, monitoring and testing machines and apparatus; electrical power distribution and control units; telecommunications machines and apparatus; electronic communications machines and apparatus; downloadable application software; downloadable computer software for remotely controlling sanitary installations, lighting apparatus and home electric appliances; downloadable computer software for remotely controlling bath installations, lighting apparatus and home electric appliances; downloadable computer software for remote-monitoring and analysis; application software for mobile phones, smart phones, tablet computers and tablet devices; computer application software; downloadable computer programs for connecting to remote computers and computer networks; remote control units; remote control devices; downloadable image files; downloadable computer programs for retrieving databases; electronic machines and instruments, and their parts; sensors; scanners Sanitary apparatus and installations; toilet bowls and seats sold as a unit; valves with a sensor for automatic flush system for toilet bowls; valves with a sensor for automatic flush system for urinals being sanitary fixtures; battery-powered portable bidets, not for medical purposes; toilet stool units with a washing water squirter; toilet seats; toilet bowls; seatings for use with Japanese style toilet bowls; urinals being sanitary fixtures; backrests for toilet stools; armrests for toilet stools; armrests with backrests for toilet stools; sound generating devices used for toilet, namely, noise generators for masking bodily noises being parts of sanitary installations; portable sound generating devices used for toilet, namely portable noise generators for masking bodily noises being parts of sanitary installations; janitorial sinks; excrement sinks being part of sanitary installations; portable bidets, not for medical purposes; bidets, not for medical purposes; toilet bowls with a built-in sensor; toilet seats with a built-in sensor Designing, creation and maintenance of computer software; designing of computer network systems, and advisory services therefor; designing, creation and maintenance of computer programs; rental and provision of computer software; cloud computing services; providing non-downloadable computer software for remotely controlling bath installations, lighting apparatus and home electric appliances; providing non-downloadable computer software for remote-monitoring and analysis; rental of computers; providing non-downloadable computer programs for retrieving databases; providing non-downloadable computer programs Health counselling, advisory and information services; counselling, advisory and information services in the field of nutrition; online counselling, advisory and information services related to personal physical conditions; providing health information via a website; providing healthcare information via a global computer network
The present invention provides a flush toilet apparatus (1) including a flush toilet main body (2), and a flush water tank device (4), in which the flush water tank device includes a flush water tank main body (26), a discharge port (30e), an annular seat surface (26d), a discharge valve (28) seated on the seat surface, an exhaust passage (28b) that communicates between a space below the seat surface and a space above a water surface in the flush water tank main body in a state in which the discharge valve is seated on the seat surface, and a guide part provided in the discharge valve or in a bottom portion of the flush water tank main body to suppress contraction and merging of flows of flush water toward a center from a periphery of the seat surface when the flush water is discharged.
An electrostatic chuck includes a dielectric substrate, an attraction electrode provided inside the dielectric substrate, and an RF electrode provided inside the dielectric substrate. The RF electrode is provided in a range where an outer circumferential edge of the RF electrode is positioned inside an outer circumferential edge of the attraction electrode in top view.
An electrostatic chuck includes a dielectric substrate and a base plate joined to the dielectric substrate. The base plate includes a first part that is a part on the dielectric substrate side, and a second part which is a part adjacent to the first part from an opposite side of the dielectric substrate and which has an outer shape larger than an outer shape of the first part in top view. The base plate is constituted by joining a plurality of members to each other, and a joint boundary B1 closest to the dielectric substrate is located in the second part.
An electrostatic chuck includes a dielectric substrate, an attraction electrode provided inside the dielectric substrate, and a base plate joined to the dielectric substrate. In top view, the dielectric substrate includes a protrusion section which protrudes outward from a surface to be joined of the base plate, and a part of the attraction electrode is provided in the protrusion section.
The present invention provides a siphon jet flush toilet, in which flush water is discharged from a rim spout port and a jet spout port at different timings, including a bowl including a waste receiving surface, a rim, a shelf surface, and a basin; a rim spout port provided in the rim, and spouting flush water along an inner peripheral surface of the rim; and a jet spout port provided in a bottom portion of the bowl, and spouting flush water toward an inlet of a discharge trap conduit, and the flush toilet is formed so that a curvature radius of a front end of the basin is smaller than a curvature radius of the inner peripheral surface of the rim in a front end of the bowl in planar view.
Disclosed is a resin molding member that has excellent scratch resistance of the surface and an excellent glossy texture. The resin molding member contains a crystalline resin and further contains an inorganic filler. The resin molding member characterized by having the surface gloss of 35-75 at Gs (20°) has excellent scratch resistance of the surface and an excellent glossy texture, and, for example, it is possible to acheive a texture similar to the texture of ceramic therewith, and it is also possible to acheive integrated designs when the resin molding member is combined with ceramic to create a toilet lid or accessories thereof such as a container and a cover.
09 - Scientific and electric apparatus and instruments
11 - Environmental control apparatus
42 - Scientific, technological and industrial services, research and design
Goods & Services
Measuring, monitoring and testing machines and apparatus; electrical power distribution and control units; telecommunications machines and apparatus; electronic communications machines and apparatus; downloadable application software; downloadable computer software for remotely controlling sanitary installations, lighting apparatus and home electric appliances; downloadable computer software for remotely controlling bath installations, lighting apparatus and home electric appliances; downloadable computer software for remote-monitoring and analysis; application software for mobile phones, smart phones, tablet computers and tablet devices; computer application software; downloadable computer programs for connecting to remote computers and computer networks; remote control units; remote control devices; personal digital assistants in the shape of a watch; smart phones; downloadable image files; downloadable computer programs for retrieving databases; downloadable music files; sensors; scanners; sound generating devices used for toilet, namely, noise generators for masking bodily noises being parts of sanitary installations; portable sound generating devices used for toilet, namely portable noise generators for masking bodily noises being parts of sanitary installations. Sanitary apparatus and installations; toilet bowls and seats sold as a unit; valves with a sensor for automatic flush system for toilet bowls; valves with a sensor for automatic flush system for urinals being sanitary fixtures; battery-powered portable bidets, not for medical purposes; toilet stool units with a washing water squirter; toilet seats; toilet bowls; seatings for use with Japanese style toilet bowls; urinals being sanitary fixtures; backrests for toilet stools; armrests for toilet stools; armrests with backrests for toilet stools; janitorial sinks; excrement sinks being part of sanitary installations; portable bidets, not for medical purposes; bidets, not for medical purposes; toilet bowls with a built-in sensor; toilet seats with a built-in sensor. Designing, creation and maintenance of computer software; designing of computer network systems, and advisory services therefor; designing, creation and maintenance of computer programs; rental and provision of computer software; cloud computing services; providing non-downloadable computer software for remotely controlling bath installations, lighting apparatus and home electric appliances; providing non-downloadable computer software for remote-monitoring and analysis; rental of computers; providing non-downloadable computer programs for retrieving databases; providing non-downloadable computer programs.
A toilet device includes a heat exchanger, an on-off valve, a temperature sensor, and a controller. The controller is configured to perform a determination control. of driving the heat exchanger in a state in which the on-off valve is open, and calculating a change amount of a detected temperature while driving the heat exchanger, stopping the driving of the heat exchanger in the case where the change amount does not reach or exceed a first value within a first period from when the driving of the heat exchanger started, and calculating a drop amount of the detected temperature while the driving of the heat exchanger is stopped, and determining the driving of the heat exchanger to be allowable in the case where the drop amount reaches or exceeds a second value within a second period from when the driving of the heat exchanger stopped.
An electrostatic chuck includes a dielectric substrate 100, an RF electrode provided inside the dielectric substrate, a base plate made of a metal and joined to the dielectric substrate, and a conductive member configured to electrically connect the RF electrode and the base plate to each other. A first recessed section which accommodates a part of the conductive member is formed on the surface on the base plate side of the dielectric substrate. A second recessed section which accommodates a part of the conductive member is formed on a surface on the dielectric substrate side of the base plate. In top view, the first recessed section is larger than the second recessed section.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
Toilets; Toilet stool units with a washing water squirter; Toilet bowls; Toilet seats; Bidets; Urinals being sanitary fixtures; Showers; Bath tubs; Vanity top sinks; Bath cubicles; Mixer taps for water pipes
09 - Scientific and electric apparatus and instruments
10 - Medical apparatus and instruments
11 - Environmental control apparatus
42 - Scientific, technological and industrial services, research and design
44 - Medical, veterinary, hygienic and cosmetic services; agriculture, horticulture and forestry services
Goods & Services
Measuring apparatus and their parts, namely, meters for measuring human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water; electrical power distribution and control units; downloadable computer application software for measuring and analyzing human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water, and for notifying the results of the analysis of human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water; tablet computers; downloadable computer software for remotely controlling sanitary installations, lighting apparatus and electric appliances for home use; recorded computer software for remotely controlling sanitary installations, lighting apparatus and electric appliances for home use; remote controls for air-conditioning installations, heating installations, plumbing installations and sanitary installations; downloadable computer programs for connecting to remote computers and computer networks; downloadable computer programs and software for remotely monitoring and analyzing human waste, blood flow, heart rate and other human physical statistics and conditions Medical apparatus and instruments for monitoring human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water; rollators; massage apparatus; gloves for medical purposes; urinals being vessels for medical purposes; bed pans; irrigators for medical use; micro bubble generators for medical use, namely, muscle stimulation, breech stimulation and anus stimulation; apparatus for testing human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water for medical purposes; medical apparatus for analyzing human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water for the evaluation of health conditions; apparatus for monitoring flow and quantity of urine for medical purposes; telemetry devices for medical applications Water closets; toilet stool units with a washing warm squirter; toilet seats; toilet bowls; urinals being sanitary fixtures; portable bidets; bidets; excrement sinks; sanitary installations in the nature of toilet stool units with a washing warm water squirter, toilet bowls, bidets, urinals, bath tubs, bath installations, shower bath installations, wash-hands basins being parts of sanitary installations, faucets, showers, electric water heaters and electric hand drying apparatus for washrooms Computer network design for others; advice relating to the design of computer network systems; rental of computer software; providing temporary use of on-line non-downloadable software for remotely monitoring and analyzing human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water and analyzing human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water; cloud computing featuring non-downloadable software for use in remotely monitoring and analyzing human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water; designing of machines, apparatus, instruments or systems composed of such machines, apparatus and instruments, and parts of all the foregoing; providing information relating to the design of computers; design of computers for others; design of electronic apparatus and electric telecommunication apparatus; provision of advice relating to the design of computer hardware; computer programming; provision of information relating to computer programming via the internet; providing temporary use of non-downloadable computer software for processing information; monitoring of computer systems by remote access to ensure proper functioning; design and development of computer programs for testing human waste, blood flow, heart rate and other human physical statistics and conditions, and provision of instructions and advice related thereto; providing on-line non-downloadable computer programs to evaluate health conditions based on the results of analysis of human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water and provision of information, instructions and advice related thereto; off-site data backup; software as a service (SaaS) services featuring software for monitoring and analyzing human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water, evaluating health conditions based on the results of analysis of human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water Provision of advice and information regarding health; provision of advice and information in the field of health utilizing the analysis of human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water; provision of advice and information regarding nutrition; provision of advice and information in the field of nutrition utilizing the analysis of human waste, blood flow, heart rate and other human physical statistics and conditions, particularly, blood gas concentrations, blood pressure and amounts of body water; nursing home services; providing on-line information related to personal physical condition of individuals; providing health information via a website; providing health care information via a global computer network; nutritional guidance
A biometric information measuring system according to an embodiment comprises a suction device for sucking defecation gas discharged into a bowl of a toilet installed in a toilet room, a gas flow passage through which the sucked gas is caused to pass by the suction device, a gas detecting device which is provided with a gas sensor that reacts to a prescribed gas component contained in the gas passing through the gas flow passage, and a control device which controls the suction flow rate of the suction device, wherein, if the suction flow rate of the suction device is x (L/min), the relationship 10≤x≤200 is satisfied.
A resin molded member having excellent surface scratch resistance and various properties required for a resin molded member is disclosed. The resin molded member according to the present invention comprises a crystalline resin, and the crystallinity of the outermost layer of the member is 50% or more, and the crystallinity of the outermost layer is maintained up to a depth of at least 9.0 μm from the outermost layer, i.e., the outermost surface of the member. The resin molded member has excellent performance such as durability, strength, and dimensional retention in addition to scratch resistance, and can be preferably used as a so-called water-related device member.
A nutrient intake amount estimation system according to an embodiment includes: a sensor that is disposed in a toilet space, and configured to detect an excretion smell related to excretion of a user of the toilet space; an estimation unit configured to estimate an estimated nutrient intake amount that is an amount of nutrients taken by the user by using an output of an estimation model that outputs information indicating an amount of nutrients estimated to be taken by the user in accordance with an input based on an output value of the sensor; and an output unit configured to output information based on the estimated nutrient intake amount.
G16H 20/60 - ICT specially adapted for therapies or health-improving plans, e.g. for handling prescriptions, for steering therapy or for monitoring patient compliance relating to nutrition control, e.g. diets
A47L 15/42 - Washing or rinsing machines for crockery or table-ware Details
G16H 40/63 - ICT specially adapted for the management or administration of healthcare resources or facilitiesICT specially adapted for the management or operation of medical equipment or devices for the operation of medical equipment or devices for local operation
70.
RESIN MOLDED MEMBER WITH EXCELLENT SCRATCH RESISTANCE AND DURABILITY
A resin molded member having excellent surface scratch resistance and various properties required for a resin molded member is disclosed. The resin molded member according to the present invention comprises a crystalline resin, and a signal intensity ratio of peaks which are measured by X-ray diffraction and correspond to two main crystal planes in an outermost layer of the member is maintained up to a depth of at least 9.0 μm from the outermost layer, i.e., the outermost surface of the member. The resin molded member has excellent performance such as durability, strength, and dimensional retention in addition to scratch resistance, and can be preferably used as a so-called water-related device member.
A hot water and cold water mixing apparatus includes: a valve body configured to adjust introduction amounts of cold water and hot water by moving in an axial direction; a valve case covering an outer side of the valve body; and an annular partition member arranged between an outer surface of the valve body and an inner surface of the valve case and configured to divide a gap therebetween into a cold water gap and a hot water gap. A groove portion is provided on the inner surface of the valve case. The annular partition member comes into close contact with a side wall of the groove portion and with the outer surface of the valve body and does not come into close contact with the inner surface of the valve case, under a state in which there is a differential pressure between the cold and hot water gaps.
F16K 11/02 - Multiple-way valves, e.g. mixing valvesPipe fittings incorporating such valvesArrangement of valves and flow lines specially adapted for mixing fluid with all movable sealing faces moving as one unit
72.
TOILET SYSTEM, RADIO WAVE DEVICE FOR TOILET DEVICE, AND TOILET SYSTEM STATE DETECTION METHOD
A toilet system according to an embodiment comprises: a bowl part for receiving excrement; a trap part for forming sealing water on the bottom side of the bowl part; a radio wave sensor for detecting a change in state in the sealing water on the trap part side as a result of the excrement falling into the sealing water; and an estimation means for estimating information on urine or feces related to the excrement on the basis of a detection result from the radio wave sensor.
An electrostatic chuck 10 includes a dielectric substrate 100, a base plate 200 which supports the dielectric substrate 100, and a joining layer 300 which joins the dielectric substrate 100 and the base plate 200. A value of a dielectric tangent of the joining layer 300 when a temperature of the joining layer 300 is 20° C. is set as a reference value. In the electrostatic chuck 10, when the temperature of the joining layer 300 has changed from 20° C. to −60° C., a range in which the value of the dielectric tangent of the joining layer 300 fluctuates falls within a range from 50% to 200% of the reference value.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
74.
HEALTH STATE ESTIMATION SYSTEM FOR TOILET USER, STATE ESTIMATION SYSTEM FOR TOILET USER, AND TOILET SYSTEM
A health state estimation system for a toilet user according to an embodiment comprises a log information acquisition means for acquiring a toilet log indicating the usage status of a toilet device, a state estimation means for estimating the health state of a toilet user on the basis of the toilet log acquired by the log information acquisition means, and a notification means for notifying a prescribed destination regarding a prescribed question relating to an estimation result from the state estimation means, the notification means notifying the prescribed destination regarding the prescribed question when the estimation result from the state estimation means satisfies a prescribed notification condition.
G16H 50/30 - ICT specially adapted for medical diagnosis, medical simulation or medical data miningICT specially adapted for detecting, monitoring or modelling epidemics or pandemics for calculating health indicesICT specially adapted for medical diagnosis, medical simulation or medical data miningICT specially adapted for detecting, monitoring or modelling epidemics or pandemics for individual health risk assessment
E03D 9/00 - Sanitary or other accessories for lavatories
G16H 20/00 - ICT specially adapted for therapies or health-improving plans, e.g. for handling prescriptions, for steering therapy or for monitoring patient compliance
An electrostatic chuck 10 includes a dielectric substrate 100 in which through-holes 140 are formed, a base plate 200 formed of a metal material, and a bonding layer 300 that bonds the dielectric substrate 100 and the base plate 200. When a Young's modulus of the bonding layer 300 is E (MPa), and a distance between a central axis AX0 of the dielectric substrate 100 and a central axis AX1 of each of the through-holes 140 is X (mm), with respect to the through-holes 140 at a position farthest from the central axis AX0, E≤0.2063×X2−59.3887×X+4278.8065 is established.
An electrostatic chuck (10) includes a dielectric substrate (100), a base plate (200) formed of a metal material, and a bonding layer (300) bonding the dielectric substrate (100) and the base plate (200). At least a portion of the base plate (200) facing the bonding layer (300) is covered with a ceramic film (231), and a surface of the ceramic film (231) is a bonded surface (S). The bonded surface (S) satisfies at least one of a first condition: arithmetic average height (Sa)≤1.5 μm or a second condition: root mean square height (Sq)≤2.0 μm, and at least one of a third condition: maximum valley depth (Sv)≥20.0 μm or a fourth condition: maximum height (Sz)≥20.0 μm.
A sanitary washing device includes a nozzle unit configured to advance and retreat between a toilet bowl and a casing, and a support portion configured to slidably support the nozzle unit. The nozzle unit is curved convexly upward and includes a nozzle cover configured to advance and retreat along a track having an arc shape. The support portion includes a groove portion extending in an advance/retreat direction of the nozzle unit, and a rail portion extending in the advance/retreat direction of the nozzle unit at a position different from a position of the groove portion. The nozzle unit includes a protruding portion held sandwiched by the groove portion in an up-down direction and configured to come into line contact with the groove portion, and a recessed portion held at either side of the rail portion in the up-down direction.
A flush toilet comprises a bowl including a waste receiving surface and a rim, a discharge trap conduit, a spouting portion provided in the bowl to spout the flush water, a flush water supply device configured to supply the flush water to the spouting portion, a waste information acquisition device configured to acquire an information regarding the waste excreted in the bowl, and a controller configured to determine a waste state by using the information regarding the waste and control the flush water supply device based on determination of the waste state. The controller controls the flush water supply device based on the determination of the waste state of the waste for each flush to the toilet so as to change a spout mode of the flush water spouted from the spouting portion
This toilet seat device according to an embodiment is a toilet seat device placed on a toilet bowl body, and includes: a seat portion that has a seat surface on which a user sits; a blood flow sensor that is disposed in the seat portion and measures the blood flow of a user seated on the seat surface; and a load distribution means that is provided on a bottom surface side of the seat portion, that comes into contact with the toilet bowl body, and disperses a load applied to the seat surface. The blood flow sensor is disposed in a position not overlapping with the load distribution means in a top view of the seat portion.
A sanitary washing device includes a casing and a nozzle unit. The nozzle unit advances and retreats between the casing and a toilet. The nozzle unit is curved to be upwardly convex and advances and retreats along an arc-like trajectory. The nozzle unit includes a first flow channel through which water flows and a second flow channel connected to the first flow channel. A water flow direction of the second flow channel in a longitudinal direction of the nozzle unit is different from a water flow direction of the first flow channel in the longitudinal direction.
Disclosed is a facility that uses tap water in a building and with which it is possible to efficiently inhibit the proliferation of chlorine-resistant Methylobacteria or viruses or to efficiently sterilize or inactivate chlorine-resistant Methylobacteria or viruses that have proliferated. This facility comprises a device that generates first modified water and second modified water, a pipe that supplies tap water to the device, a discharge unit for discharging the first modified water and the second modified water to a site at which contamination by microorganisms or viruses is to be suppressed, and a control unit, and is characterized in that the facility starts discharging the second modified water after starting the discharge of the first modified water, and the discharge of the second modified water is started after the discharge of the first modified water is stopped or started while the first modified water is being discharged.
Disclosed is a composite structure having low-particle generation usable for a member for a semiconductor manufacturing apparatus and also the semiconductor manufacturing apparatus. The composite structure including a base material and a structure that is provided on the base material wherein the structure comprises Y2O3—ZrO2 solid solution (YZrO) as a main component, and lattice constant of the YZrO is 5.252 Å or greater or has an indentation hardness of more than 12 GPa. has low-particle generation and is suitably used as a member for a semiconductor apparatus.
Showers; hand showers; overhead showers; shower heads; tap
water faucets; shower control valves; water control valves
for faucets; shower bath installations; shower panels;
shower tubs; sanitary apparatus and installations.
An electrostatic chuck (10) includes a dielectric substrate (100) and a heater unit (300) configured to heat the dielectric substrate (100). The heater unit (300) includes a power supply portion (390) configured to receive a supply of power from an external source, a heat generation portion (331) that is a conductor drawn in a linear shape and configured to receive the supply of power from the power supply portion (390) and generate heat, and a bypass layer (370) connecting the power supply portion (390) and the heat generation portion (331). The heat generation portion (331) includes a widened portion (332) that is a section in which a line width of the heat generation portion (331) is locally widened. The bypass layer (370) is connected to the heat generation portion (331) at a plurality of locations in the widened portion (332).
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
A plurality of color sensing sections are attached to a toilet seat so as to test a health state or a fecal occult blood portion every time by capturing the feces surface color during defecation. Before feces which have been excreted from a body sink into a water-seal portion, the circumference of the feces is optically captured to detect the color of the surface of the feces. By monitoring changes in color, the health state of the defecator is monitored. In particular, by checking the presence/absence of an occult blood portion, the present invention assists in early detection of colorectal cancer and allows a fecal occult blood test to be performed in a hygienic manner without burdening the user.
A61B 10/00 - Instruments for taking body samples for diagnostic purposesOther methods or instruments for diagnosis, e.g. for vaccination diagnosis, sex determination or ovulation-period determinationThroat striking implements
A47K 13/24 - Parts or details not covered in, or of interest apart from, groups
A47K 13/30 - Seats having provisions for heating, deodorising or the like
A61B 5/00 - Measuring for diagnostic purposes Identification of persons
E03D 9/00 - Sanitary or other accessories for lavatories
G01N 21/31 - Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
G01N 21/84 - Systems specially adapted for particular applications
G01N 33/483 - Physical analysis of biological material
A sensor unit includes a light emitting element that emits light toward an object, two light receiving elements that receive light from the object, and a transmissive window that is disposed between the light emitting element and the object and transmits light emitted from the light emitting element. The two light receiving elements are disposed so as to be positioned on a circle concentric with the light emitting element and to be positioned in a range of less than 180 degrees around the light emitting element.
A toilet-seat device according to an embodiment includes a hollow toilet seat and a sensor unit. The sensor unit includes a sensor case that is fixed to be exposed from an opening formed in the toilet seat, the sensor case housing therein a sensor substrate. The sensor case includes an engaging part that is engaged with the toilet seat to fix the sensor case to the toilet seat. The engaging part is arranged in a position that is inner than an outer edge of the sensor case.
A structural member 10 includes a base material 100 which is a ceramic, an underlayer 200 covering a surface S1 of the base material 100, and a protective film 300 covering a surface S2 of the underlayer 200. An orientation of each crystallite 210 on a surface S2 of the underlayer 200 on the protective film 300 side is not aligned and is irregular.
Object:
To provide a shower device suitable for use during a midday break by setting a temperature of discharged hot water reaching (landing in) a part corresponding to a user's neck (in particular, a back middle portion of the neck) to a relatively low temperature and setting a temperature of discharged hot water reaching (landing in) other areas of the user to a relatively high temperature. Resolution means:
A water discharge device according to the present invention includes a first water discharge unit configured to discharge hot water toward a first discharge range corresponding to a neck of a user who is to be at a predetermined position, and a second water discharge unit configured to discharge hot water toward a second discharge range to the user below the first discharge range, wherein a temperature of the hot water when the hot water reaches the user after having been discharged from the first water discharge unit is lower than a temperature of the hot water when the hot water reaches the user after having been discharged from the second water discharge unit.
E03C 1/04 - Water-basin installations specially adapted to wash-basins or baths
B05B 1/06 - Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops in annular, tubular or hollow conical form
A flush toilet includes: a bowl including a waste receiving surface, a rim, and a well portion; a first spouting port provided on a left side of the bowl and spouting flush water along the rim; a second spouting port provided on a right side of the bowl and spouting flush water toward a rear region of the bowl; and a discharge conduit connected to a bottom portion of the bowl, wherein the waste receiving surface and the inner circumference surface of the rim are connected to each other by a connecting portion, and the connecting portion includes, in the rear region of the bowl, an upward sloped portion sloped upward in a flow direction of the flush water, and a downward sloped portion positioned on a downstream side of the upward sloped portion and sloped downward in the flow direction of the flush water.
A sensor device includes a laser blood flow sensor and a control device. The laser blood flow sensor is provided in a toilet room and acquires biological information that includes blood flow information of a user. The control device controls the laser blood flow sensor. The control device determines presence or absence of a human body, based on information that is acquired by the laser blood flow sensor.
A structural member 10 includes a base material 100 and a protective film 200 covering a surface 110 of the base material 100. A particle 300 that is harder than the protective film 200 is dispersedly arranged inside the protective film 200.
To provide a sanitary facility member having excellent ease of contamination removal and excellent persistence of ease of contamination removal. A sanitary facility member including: a base material, at least the surface of which includes a metal element; a metal oxide layer formed on the surface of the base material; and an organic layer provided on the metal oxide layer; wherein the metal element is at least one element selected from the group consisting of Cr, Zr, and Ti, the metal oxide layer includes at least the metal element and an oxygen element, and the organic layer is bonded to the metal oxide layer by bonding (M-O—P bonding) of the metal element (M) and a phosphorus atom (P) of at least one group (X) selected from a phosphonic acid group, a phosphoric acid group, and a phosphinic acid group via an oxygen atom (O), the group X being bonded to a group R (where R is a hydrocarbon or a group having an atom other than carbon in 1 or 2 locations in a hydrocarbon group).
C23C 22/78 - Pretreatment of the material to be coated
C23C 22/03 - Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using non-aqueous solutions containing phosphorus compounds
C23C 22/73 - Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
C25D 3/04 - ElectroplatingBaths therefor from solutions of chromium
C25D 3/12 - ElectroplatingBaths therefor from solutions of nickel or cobalt
E03C 1/04 - Water-basin installations specially adapted to wash-basins or baths
96.
STRUCTURAL MEMBER AND METHOD FOR PRODUCING THE SAME
A structural member 10 includes a base material 100 and a protective film 200 covering a surface 101 of the base material 100. The protective film 200 has been subjected to reduction processing of reducing an in-plane variation in residual stress on a surface 201 of the protective film 200.
C04B 35/10 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on aluminium oxide
C04B 41/00 - After-treatment of mortars, concrete, artificial stone or ceramicsTreatment of natural stone
C04B 41/50 - Coating or impregnating with inorganic materials
A structural member 10 includes a base material 100 and a protective film 200 covering a surface 101 of the base material 100. At least a portion of the protective film 200 in the vicinity of a surface 201 thereof has a first layer 210 and a second layer 220 that contains all of elements contained in the first layer 210 and that is different from the first layer 210 in composition ratio of each element, wherein the first layer 210 and the second layer 220 are alternately aligned along a depth direction perpendicular to the surface 201 of the protective film 200.
A biological information measurement system according to an embodiment of the present invention measures biological information of a user of a bathroom on the basis of fecal gas discharged into the bowl of a toilet installed in the bathroom. The biological information measurement system has: a gas flow passage for suctioning and allowing the passage of gaseous matter inside the bowl where the fecal gas has been discharged by the user of the bathroom; and a sensor sensitive part that reacts with the gas contained in the gaseous matter passing through the gas flow passage. The gas flow passage includes a main flow passage, and a sub-flow passage which is provided to the inside of the main flow passage and through which gaseous matter that has flowed in from the main flow passage passes at a flow rate slower than that of the main flow passage. The sensor sensitive part is disposed to the inside of the sub-flow passage.
A biometric information measuring system according to an embodiment measures biometric information relating to a user of a toilet room on the basis of defecation gas discharged into a bowl of a toilet installed in the toilet room, and comprises: a suction device which sucks gas within the bowl into which the defecation gas has been discharged by the user of the toilet room; a gas flow passage through which the sucked gas is caused to pass by the suction device; a gas detecting device which is provided with a gas sensor that reacts to a gas contained in the gas passing through the gas flow passage; a control device which controls the suction device and the gas detecting device; and a pressure loss generating unit which causes a pressure loss generated when the gas passes through the gas flow passage to be higher on the downstream side of the location in which the gas sensor is installed, with respect to the direction of travel of the gas passing through the gas flow passage.
