Tosoh Corporation

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C23C 14/34 - Sputtering 33
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1.

POWDER

      
Application Number 19133333
Status Pending
Filing Date 2023-11-29
First Publication Date 2026-03-12
Owner TOSOH CORPORATION (Japan)
Inventor
  • Hasegawa, Yuusuke
  • Hosoi, Kouhei
  • Nagayama, Hitoshi
  • Tsuchiya, Satoshi
  • Fukiage, Taku
  • Kawamura, Kenta
  • Itou, Akiko
  • Sugawara, Ryou

Abstract

A powder provides zirconia sintered bodies that contain manganese as a main coloring element, assume a black color, have high fracture toughness, and exhibit only a small variation in color tone due to different sintering temperatures; and a method for producing the powder. The powder contains zirconia containing yttrium as a stabilizing element, a manganese compound and alumina. The content of the stabilizing element in terms of oxide is 1.3 mol % or more and less than 2.0 mol % based on the total amount of the zirconia and the stabilizing element in terms of oxide. The content of the alumina is 0.2% by mass or more and 1.5% by mass or less based on the total mass of the powder, and the content of the manganese compound is 0.1% by mass or more and 0.6% by mass or less based on the total mass of the powder.

IPC Classes  ?

2.

ZEOLITE SHAPED BODIES

      
Application Number 19124961
Status Pending
Filing Date 2023-10-27
First Publication Date 2026-02-12
Owner TOSOH CORPORATION (Japan)
Inventor
  • Tsuchiya, Kazuyoshi
  • Okaniwa, Hiroshi
  • Nakazawa, Naoto

Abstract

Zeolite-containing shaped bodies that remove potassium from a dialysis effluent with less dissolution of aluminum compared to the conventional treatment of dialysis effluent using a zeolite, and a method of adsorbing potassium using the shaped bodies.

IPC Classes  ?

  • B01J 20/18 - Synthetic zeolitic molecular sieves
  • A61M 1/16 - Dialysis systemsArtificial kidneysBlood oxygenators with membranes
  • B01J 20/28 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof characterised by their form or physical properties
  • B01J 20/30 - Processes for preparing, regenerating or reactivating

3.

ZIRCONIA COMPOSITIONAL SUBSTANCE AND METHOD FOR PRODUCING THE SAME

      
Application Number 19112651
Status Pending
Filing Date 2023-09-15
First Publication Date 2026-01-29
Owner TOSOH CORPORATION (Japan)
Inventor
  • Ushio, Yuki
  • Tsukimori, Takashi
  • Nagayama, Hitoshi

Abstract

A zirconia compositional substance includes at least one first transition metal element selected from the group consisting of manganese, iron, cobalt, nickel, copper, molybdenum, technetium, ruthenium, rhodium, palladium, and silver; a coloring element that is either or both of a lanthanoid rare earth element and a second transition metal element different from the first transition metal element; and stabilizing element-containing zirconia, wherein a content of the first transition metal element is 100 mass ppm or more, a content of the second transition metal element is less than 100 mass ppm.

IPC Classes  ?

  • C04B 35/482 - Refractories from grain sized mixtures
  • C04B 35/49 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on zirconium or hafnium oxides or zirconates or hafnates containing also titanium oxide or titanates
  • C04B 35/64 - Burning or sintering processes

4.

POLYURETHANE FOAM AND PRODUCTION METHOD THEREFOR

      
Application Number 18994697
Status Pending
Filing Date 2023-07-19
First Publication Date 2026-01-15
Owner TOSOH CORPORATION (Japan)
Inventor Ishibashi, Keita

Abstract

There is provided a polyurethane foam, wherein at least one of principal surfaces opposite to each other has a hole opening ratio of 0% to 1.0%, and the principal surface having the hole opening ratio has a root mean square surface roughness of 0.01 to 0.30 μm in accordance with JIS B 0601:1994, and the polyurethane foam has an air permeability of 0 to 2.0 cm3/cm2/sec in accordance with JIS K 6400.

IPC Classes  ?

  • C08G 18/48 - Polyethers
  • B29C 44/14 - Incorporating or moulding on preformed parts, e.g. inserts or reinforcements the preformed part being a lining
  • B29C 44/34 - Component parts, details or accessoriesAuxiliary operations
  • B29K 75/00 - Use of polyureas or polyurethanes as moulding material
  • B29K 83/00 - Use of polymers having silicon, with or without sulfur, nitrogen, oxygen or carbon only, in the main chain, as moulding material
  • C08G 18/18 - Catalysts containing secondary or tertiary amines or salts thereof
  • C08G 18/20 - Heterocyclic aminesSalts thereof

5.

SINTERED BODY

      
Application Number 19114950
Status Pending
Filing Date 2023-09-28
First Publication Date 2026-01-08
Owner TOSOH CORPORATION (Japan)
Inventor
  • Nishiyama, So
  • Kawamura, Kenta
  • Nagayama, Hitoshi

Abstract

Provided is a zirconia sintered body having both good machinability and light shielding ability. The sintered body includes zirconia containing a stabilizing element, and the content of the stabilizing element is less than 3.0 mol %. The sintered body has a peak at 2θ=34.0°±0.2° in an XRD pattern.

IPC Classes  ?

  • B22F 7/00 - Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting
  • B22F 1/00 - Metallic powderTreatment of metallic powder, e.g. to facilitate working or to improve properties
  • B22F 1/05 - Metallic powder characterised by the size or surface area of the particles

6.

CONDUCTIVE POLYMER SOLUTION AND APPLICATION OF SAME

      
Application Number 19105444
Status Pending
Filing Date 2023-08-25
First Publication Date 2026-01-01
Owner TOSOH CORPORATION (Japan)
Inventor
  • Kudo, Kazuki
  • Yano, Hirokazu

Abstract

Provided is an electrically conductive polymer solution which can provide an electrolytic capacitor having a high capacity and exhibiting a low ESR characteristic. An electrically conductive polymer solution is used which contains: 0.01 to 10% by mass of polythiophene (A) including at least one structural unit selected from the group consisting of a structural unit represented by a general formula (1) below and a structural unit represented by a general formula (2) below; 0.001 to 20% by mass of an epoxy compound (B) having at least two epoxy groups; and water, and in which a pH is 1.5 to 5.0, Provided is an electrically conductive polymer solution which can provide an electrolytic capacitor having a high capacity and exhibiting a low ESR characteristic. An electrically conductive polymer solution is used which contains: 0.01 to 10% by mass of polythiophene (A) including at least one structural unit selected from the group consisting of a structural unit represented by a general formula (1) below and a structural unit represented by a general formula (2) below; 0.001 to 20% by mass of an epoxy compound (B) having at least two epoxy groups; and water, and in which a pH is 1.5 to 5.0, where R2 represents a hydrogen atom, a methyl group, an ethyl group, a linear or branched alkyl group having 3 to 6 carbon atoms, or a fluorine atom, m represents an integer of 1 to 10, and n represents 0 or 1.

IPC Classes  ?

  • C09D 5/24 - Electrically-conducting paints
  • C09D 7/65 - Additives macromolecular
  • C09D 165/00 - Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chainCoating compositions based on derivatives of such polymers
  • H01G 9/00 - Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devicesProcesses of their manufacture
  • H01G 9/042 - Electrodes characterised by the material

7.

GAS BARRIER FILM MATERIAL, SILICON OXIDE FILM, AND PRODUCTION METHOD OF SILICON OXIDE FILM

      
Application Number 18878649
Status Pending
Filing Date 2023-07-13
First Publication Date 2025-12-25
Owner TOSOH CORPORATION (Japan)
Inventor Chiba, Hirokazu

Abstract

A material for a gas barrier film includes an organosilane compound represented by the following general formula SiR1(4-a-b)R2aR3b. In the formula, R1 represents a phenyl group, a benzyl group or an alkyl group having 1 to 10 carbon atoms, R2 represents an alkenyl group having 2 to 10 carbon atoms or an alkynyl group having 2 to 10 carbon atoms, R3 represents an alkoxy group having 1 to 10 carbon atoms or a hydroxyl group, a is an integer of 1 to 4, and b is an integer of 0 to 3, provided that when R1, R2, or R3 is present in plurality, the plurality thereof may be identical to or different from one another.

IPC Classes  ?

  • C23C 16/40 - Oxides
  • C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

8.

METHOD FOR PRODUCING N-ALKYLMALEIMIDE COPOLYMER AND N-ALKYLMALEIMIDE COPOLYMER

      
Application Number 18878196
Status Pending
Filing Date 2023-06-29
First Publication Date 2025-12-18
Owner
  • TOSOH CORPORATION (Japan)
  • KAI PHOTONICS CO., LTD. (Japan)
Inventor
  • Yamada, Satoru
  • Watanabe, Misaki
  • Katagiri, Fumiaki
  • Kitagawa, Takahiro
  • Koike, Yasuhiro

Abstract

Provided is a method for efficiently producing an N-alkylmaleimide-based copolymer which has an excellent optical characteristic and excellent heat resistance, and also relates to an N-alkylmaleimide-based copolymer which has an excellent optical characteristic, excellent heat resistance, and excellent molding fluidity. In an aspect of the present invention, an N-alkylmaleimide-based copolymer is produced as a particulate product by precipitation polymerization in which radical copolymerization of monomers including 20% by weight to 95% by weight of a specific N-alkylmaleimide and 5% by weight to 80% by weight of a styrene compound is carried out in a specific polymerization solvent.

IPC Classes  ?

9.

HALOGENATED POLYMER AND METHOD FOR PRODUCING SAME

      
Application Number 19103626
Status Pending
Filing Date 2023-08-21
First Publication Date 2025-12-11
Owner TOSOH CORPORATION (Japan)
Inventor
  • Takahashi, Ryohei
  • Idate, Hiroto
  • Miyazaki, Takanori

Abstract

A halogenated polymer has excellent heat resistance and whiteness as compared with a conventional halogen-containing polymer. A halogenated polymer represented by the following formula (1), contains bromide ions, which has a bromide ion content of 1 to 2,000 ppm: A halogenated polymer has excellent heat resistance and whiteness as compared with a conventional halogen-containing polymer. A halogenated polymer represented by the following formula (1), contains bromide ions, which has a bromide ion content of 1 to 2,000 ppm: A halogenated polymer has excellent heat resistance and whiteness as compared with a conventional halogen-containing polymer. A halogenated polymer represented by the following formula (1), contains bromide ions, which has a bromide ion content of 1 to 2,000 ppm: wherein R is a C1-C6 alkylene group, —S— or —SO2—, and n is a real number.

IPC Classes  ?

  • C08G 65/40 - Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols and other compounds
  • C08K 5/053 - Polyhydroxylic alcohols
  • C08K 5/13 - PhenolsPhenolates
  • C08K 5/134 - Phenols containing ester groups
  • C08K 5/17 - AminesQuaternary ammonium compounds
  • C08K 5/18 - AminesQuaternary ammonium compounds with aromatically bound amino groups
  • C08K 5/32 - Compounds containing nitrogen bound to oxygen
  • C08K 5/3435 - Piperidines
  • C08K 5/37 - Thiols
  • C08K 5/378 - Sulfides containing heterocyclic rings
  • C08K 5/45 - Heterocyclic compounds having sulfur in the ring
  • C08K 5/524 - Esters of phosphorous acids, e.g. of H3PO3
  • C08K 5/526 - Esters of phosphorous acids, e.g. of H3PO3 with hydroxyaryl compounds

10.

GALLIUM NITRIDE SINTERED BODY AND METHOD FOR PRODUCING THE SAME

      
Application Number 18871809
Status Pending
Filing Date 2023-06-09
First Publication Date 2025-11-20
Owner TOSOH CORPORATION (Japan)
Inventor
  • Kususe, Yoshiro
  • Iihama, Junya
  • Hara, Shinichi
  • Mesuda, Masami

Abstract

Provided is at least one of a gallium nitride sintered body; a method for industrially producing the sintered body; a sputtering target including the sintered body; and a method for depositing a film with the sputtering target. With the gallium nitride sintered body, a sputtered film can be deposited at a faster deposition rate than with a gallium nitride sintered body produced by a hot-pressing process. A gallium nitride sintered body has a standard deviation of a porosity of 1.0% or less as determined from a scanning electron microscope image of a cross section of the gallium nitride sintered body.

IPC Classes  ?

  • C04B 35/58 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxides based on borides, nitrides or silicides
  • C23C 14/34 - Sputtering

11.

METALLIC SPUTTERING TARGET, PRODUCTION METHOD THEREFOR, AND METALLIC MATERIAL AND PRODUCTION METHOD THEREFOR

      
Application Number 18866558
Status Pending
Filing Date 2023-05-18
First Publication Date 2025-11-20
Owner TOSOH CORPORATION (Japan)
Inventor
  • Shono, Daiki
  • Mesuda, Masami
  • Kondo, Taiga

Abstract

A metal material includes a metal having a body-centered cubic structure, in which with respect to a sum of orientation area fractions of a {001} plane, a {101} plane and a {111} plane, a ratio of the orientation area fraction of the {111} plane is 0.45 or more.

IPC Classes  ?

12.

ORGANIC ELECTROLUMINESCENT ELEMENT

      
Application Number 18879063
Status Pending
Filing Date 2023-06-29
First Publication Date 2025-11-06
Owner TOSOH CORPORATION (Japan)
Inventor
  • Uchida, Naoki
  • Uehara, Fuminari
  • Oike, Kana
  • Takahashi, Yasuhiro
  • Nomura, Shintaro
  • Oota, Eriko

Abstract

An organic electroluminescent element includes a positive electrode, a negative electrode opposite the positive electrode, a light-emitting layer disposed between the positive electrode and the negative electrode and a hole transport region disposed between the positive electrode and the light-emitting layer. The organic electroluminescent element includes an electron transport region disposed between the light-emitting layer and the negative electrode, the electron transport region contains a triazine compound represented by formula (2), and the organic electroluminescent element satisfies at least one or more of condition (i) or (ii) below. (i) The light-emitting layer contains a boron compound represented by formula (1). (ii) The hole transport region contains a radialene compound represented by formula (3). An organic electroluminescent element includes a positive electrode, a negative electrode opposite the positive electrode, a light-emitting layer disposed between the positive electrode and the negative electrode and a hole transport region disposed between the positive electrode and the light-emitting layer. The organic electroluminescent element includes an electron transport region disposed between the light-emitting layer and the negative electrode, the electron transport region contains a triazine compound represented by formula (2), and the organic electroluminescent element satisfies at least one or more of condition (i) or (ii) below. (i) The light-emitting layer contains a boron compound represented by formula (1). (ii) The hole transport region contains a radialene compound represented by formula (3).

IPC Classes  ?

  • H10K 50/11 - OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
  • C09K 11/06 - Luminescent, e.g. electroluminescent, chemiluminescent, materials containing organic luminescent materials
  • H10K 50/15 - Hole transporting layers
  • H10K 50/16 - Electron transporting layers
  • H10K 85/40 - Organosilicon compounds, e.g. TIPS pentacene
  • H10K 85/60 - Organic compounds having low molecular weight

13.

COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, URETHANE RESIN, AQUEOUS URETHANE RESIN DISPERSION, AND COATING AGENT

      
Application Number 18855632
Status Pending
Filing Date 2023-03-31
First Publication Date 2025-10-02
Owner TOSOH CORPORATION (Japan)
Inventor Honda, Kohei

Abstract

One aspect of the present invention relates to a compound represented by Formula (A1-1). One aspect of the present invention relates to a compound represented by Formula (A1-1). [in Formula (A1-1), R1 represents a hydrogen atom, an alkyl group, or a hydroxyalkyl group, R2 represents an alkanediyl group, R3 represents an alkanediyl group or *1-Ra—C(═O)—O—Rb-*2, R4 represents an alkanediyl group, *1-O—Rc-*2, or *1-Ra—C(═O)—O—Rb-*2, Ra, Rb, and Rc each independently represent an alkanediyl group, *1 represents a site for bonding to a carbonyl group, *2 represents a site for bonding to an oxygen atom, n1 and m1 each represent an integer of 0 or more, and in a case where R4 is present in plurality, a plurality thereof may be the same or different from each other].

IPC Classes  ?

  • C08G 18/42 - Polycondensates having carboxylic or carbonic ester groups in the main chain
  • C08G 18/24 - Catalysts containing metal compounds of tin
  • C08G 18/28 - Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
  • C08G 18/32 - Polyhydroxy compoundsPolyaminesHydroxy amines
  • C08G 18/40 - High-molecular-weight compounds
  • C08G 18/44 - Polycarbonates
  • C08G 64/18 - Block or graft polymers
  • C09D 175/06 - Polyurethanes from polyesters

14.

HYDROCARBON TRAP, EXHAUST PURIFICATION DEVICE AND HYBRID VEHICLE

      
Application Number 19056771
Status Pending
Filing Date 2025-02-19
First Publication Date 2025-09-18
Owner
  • HONDA MOTOR CO., LTD. (Japan)
  • TOSOH CORPORATION (Japan)
Inventor
  • Oku, Yuki
  • Takeori, Hiroki
  • Ikutomo, Ryohei
  • Mori, Takeshi
  • Nemoto, Koji
  • Matsuo, Yuichi
  • Usui, Toyohiro
  • Nakazawa, Naoto
  • Mitsuhashi, Ryo
  • Nakao, Keita

Abstract

A hydrocarbon trap to be used in the adsorption of hydrocarbons contained in the exhaust gas of an internal combustion engine is provided in which a hydrocarbon adsorbing material is supported on a surface of pores of a porous substrate, the hydrocarbon adsorbing material comprises a first zeolite capable of adsorbing olefin contained in the exhaust gas, and a second zeolite capable of adsorbing paraffin and aromatic compound contained in the exhaust gas, the first zeolite adsorbs the olefin in a first temperature range, and desorbs the olefin in a second temperature range which has higher temperature than the first temperature range, and the second zeolite desorbs the paraffin and the aromatic compound in the first temperature range, and adsorbs the paraffin and the aromatic compound in the second temperature range.

IPC Classes  ?

  • B01D 53/04 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
  • B01D 53/94 - Chemical or biological purification of waste gases of engine exhaust gases by catalytic processes
  • B01J 20/02 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material
  • B01J 20/04 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising compounds of alkali metals, alkaline earth metals or magnesium
  • B01J 20/18 - Synthetic zeolitic molecular sieves
  • B01J 20/28 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof characterised by their form or physical properties
  • B01J 20/30 - Processes for preparing, regenerating or reactivating
  • B01J 20/34 - Regenerating or reactivating
  • F01N 3/10 - Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust
  • F01N 3/20 - Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust characterised by methods of operationControl specially adapted for catalytic conversion
  • F01N 3/28 - Construction of catalytic reactors

15.

AMINE COMPOSITION FOR CARBON DIOXIDE SEPARATION USE

      
Application Number 18857336
Status Pending
Filing Date 2023-04-18
First Publication Date 2025-08-21
Owner TOSOH CORPORATION (Japan)
Inventor
  • Fujiwara, Hiroshi
  • Yamamoto, Atsushi
  • Fujii, Ryotaro
  • Yanase, Manabu

Abstract

There is a problem that conventionally known carbon dioxide absorption liquids solutions of using aqueous N,N,N′,N″,N″-pentamethyldiethylenetriamine will have a low carbon dioxide emission rate. There is a problem that conventionally known carbon dioxide absorption liquids solutions of using aqueous N,N,N′,N″,N″-pentamethyldiethylenetriamine will have a low carbon dioxide emission rate. A composition for carbon dioxide separation use is used which includes: an amine compound (A) represented by General Formula (1) or (2) as described in the specification; an amine compound (B) represented by General Formula (3) as described in the specification; and water, in which the composition for carbon dioxide separation use may further contain an amine compound (C) represented by General Formula (4) as described in the specification, and the number of moles of nitrogen atoms (nitrogen atoms of tertiary amino groups) contained in the amine compounds (A) and (C) is within a range of 1.0 to 8.0 times the number of moles of nitrogen atoms (nitrogen atoms of secondary amino groups) contained in the amine compound (B).

IPC Classes  ?

  • B01D 53/14 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by absorption

16.

NOVEL COMPOUND, CONJUGATED POLYMER AND METHOD FOR PRODUCING SAME, FILM FORMATION COMPOSITION, ORGANIC THIN FILM AND ORGANIC SEMICONDUCTOR ELEMENT

      
Application Number 18859834
Status Pending
Filing Date 2023-04-24
First Publication Date 2025-08-14
Owner
  • TOSOH CORPORATION (Japan)
  • SAGAMI CHEMICAL RESEARCH INSTITUTE (Japan)
Inventor
  • Yamagata, Takuya
  • Mikami, Koichiro
  • Hanamura, Hitoshi
  • Wakioka, Masayuki
  • Miyashita, Masato
  • Watanabe, Makoto
  • Oku, Shinya

Abstract

The compound according to the present disclosure is a compound represented by general formula (1) below. The compound according to the present disclosure is a compound represented by general formula (1) below.

IPC Classes  ?

  • H10K 85/10 - Organic polymers or oligomers
  • C07D 498/04 - Ortho-condensed systems
  • C07D 513/04 - Ortho-condensed systems
  • C07D 517/04 - Ortho-condensed systems
  • C07F 5/02 - Boron compounds
  • C07F 7/22 - Tin compounds
  • C08G 61/12 - Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
  • H10K 10/46 - Field-effect transistors, e.g. organic thin-film transistors [OTFT]

17.

MODIFIED RECOMBINANT ADENO-ASSOCIATED VIRUS (AAV)-BINDING PROTEIN, AND METHOD FOR ANALYZING AAV BASED ON INFECTIVITY

      
Application Number 18729535
Status Pending
Filing Date 2023-01-13
First Publication Date 2025-07-24
Owner TOSOH CORPORATION (Japan)
Inventor
  • Kurihara, Kento
  • Watanabe, Kazuya
  • Omura, Keita
  • Yoshida, Kouhei
  • Makino, Yuriko
  • Tanaka, Toru

Abstract

A modified adeno-associated virus (AAV)-binding protein having an enhanced binding activity to AAV and a method for analyzing AAV contained in a sample based on a difference in the infectivity is provided. An amino acid residue at a specific position in regions corresponding to extracellular region domain 1 (PKD1) and domain 2 (PKD2) of KIAA0319L (UniProt No. Q8IZA0) is substituted with a different specific amino acid residue. An AAV analysis method includes allowing AAV contained in a sample adsorbed by an adsorbent which includes an insoluble carrier and a polypeptide including at least an amino acid sequence corresponding to extracellular region domain 1 or domain 2 of KIAA0319L immobilized on the carrier; and eluting the AAV adsorbed by the adsorbent using an eluent.

IPC Classes  ?

  • C07K 14/705 - ReceptorsCell surface antigensCell surface determinants
  • C12N 1/20 - BacteriaCulture media therefor
  • C12N 7/00 - Viruses, e.g. bacteriophagesCompositions thereofPreparation or purification thereof
  • C12N 15/70 - Vectors or expression systems specially adapted for E. coli
  • C12R 1/19 - Escherichia coli
  • G01N 30/88 - Integrated analysis systems specially adapted therefor, not covered by a single one of groups

18.

BUTANE DIISOCYANATE DERIVATIVE, METHOD FOR PRODUCING BUTANE DIISOCYANATE DERIVATIVE, POLYISOCYANATE COMPOSITION, POLYURETHANE RESIN FORMING COMPOSITION, COATING COMPOSITION AND COATING FILM

      
Application Number 18850805
Status Pending
Filing Date 2023-03-27
First Publication Date 2025-07-17
Owner TOSOH CORPORATION (Japan)
Inventor
  • Wada, Yuya
  • Nakashima, Yuji

Abstract

A butane diisocyanate derivative having an isocyanurate group and a uretdione group, wherein the molar ratio of the isocyanurate groups to the uretdione groups is 20/80 to 80/20, and wherein the weight average molecular weight based on gel permeation chromatography is 790 g/mol or less.

IPC Classes  ?

  • C07D 251/34 - Cyanuric or isocyanuric esters
  • C08G 18/10 - Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
  • C08G 18/79 - Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates
  • C09D 175/04 - Polyurethanes

19.

POLYISOCYANATE COMPOSITION, POLYURETHANE RESIN FORMING COMPOSITION, MEMBRANE SEALING MATERIAL AND MEMBRANE MODULE

      
Application Number 18850533
Status Pending
Filing Date 2023-03-29
First Publication Date 2025-07-10
Owner TOSOH CORPORATION (Japan)
Inventor Kamiya, Ayami

Abstract

A polyisocyanate composition containing: a diphenylmethane diisocyanate (a1); an isocyanate-terminated prepolymer (a2) that is a reaction product of a polyisocyanate (a2-1) and a polyol (a2-2); and a modified isocyanate (a3), in which the polyisocyanate (a2-1) contains a diphenylmethane diisocyanate (a2-1-1) and a modified isocyanate (a2-1-2), in which the modified isocyanate (a2-1-2) is at least one selected from the group consisting of a carbodiimide-modified diphenylmethane diisocyanate and a uretonimine-modified diphenylmethane diisocyanate, and the modified isocyanate (a3) is a modified product of a diphenylmethane diisocyanate, and the content of the modified isocyanate (a2-1-2) in the polyisocyanate (a2-1) is 4.5% to 15% by mass.

IPC Classes  ?

  • C08G 18/09 - Processes comprising oligomerisation of isocyanates or isothiocyanates involving reaction of a part of the isocyanate or isothiocyanate groups with each other in the reaction mixture
  • C08G 18/10 - Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
  • C08G 18/32 - Polyhydroxy compoundsPolyaminesHydroxy amines
  • C08G 18/36 - Hydroxylated esters of higher fatty acids

20.

POLYOL COMPOSITION FOR SOFT POLYURETHANE FOAM MOLDING, COMPOSITION FOR SOFT POLYURETHANE FOAM MOLDING, SOFT POLYURETHANE FOAM, AND PRODUCTION METHOD FOR SAME

      
Application Number 19086845
Status Pending
Filing Date 2025-03-21
First Publication Date 2025-07-03
Owner TOSOH CORPORATION (Japan)
Inventor
  • Ishibashi, Keita
  • Yoshii, Naoya
  • Yamamoto, Junya

Abstract

A polyol composition for forming flexible polyurethane foam including a polyol component having a number average molecular weight of 2,500 or more, a catalyst, a foam stabilizer, a foaming agent, and a crosslinking agent, wherein water is contained as the foaming agent, wherein a sugar alcohol is contained as the crosslinking agent, wherein the content of the sugar alcohol with respect to 100 parts by mass of the polyol component is 0.1 to 5.0 parts by mass, and wherein no divalent tin catalyst is contained.

IPC Classes  ?

  • C08G 18/76 - Polyisocyanates or polyisothiocyanates cyclic aromatic
  • C08G 18/32 - Polyhydroxy compoundsPolyaminesHydroxy amines
  • C08G 18/48 - Polyethers
  • C08G 18/66 - Compounds of groups , , or
  • C08J 9/12 - Working-up of macromolecular substances to porous or cellular articles or materialsAfter-treatment thereof using blowing gases generated by a previously added blowing agent by a physical blowing agent
  • C08K 5/524 - Esters of phosphorous acids, e.g. of H3PO3

21.

CYCLOHEXYLENEDIAMINIUM SALT, USE THEREOF, AND MSE-TYPE ZEOLITE OBTAINED THEREFROM

      
Application Number 18847826
Status Pending
Filing Date 2023-03-28
First Publication Date 2025-06-26
Owner
  • SAGAMI CHEMICAL RESEARCH INSTITUTE (Japan)
  • TOSOH CORPORATION (Japan)
Inventor
  • Araki, Keisuke
  • Yoshioka, Masato
  • Nakanishi, Yusuke
  • Nakazawa, Naoto
  • Mitsuhashi, Ryo

Abstract

Provided is at least one of a novel cyclohexylenediaminium salt, a producing method therefor and use thereof, and an MSE-type zeolite obtained by using the same. An MSE-type zeolite having the following powder X-ray diffraction peaks. Provided is at least one of a novel cyclohexylenediaminium salt, a producing method therefor and use thereof, and an MSE-type zeolite obtained by using the same. An MSE-type zeolite having the following powder X-ray diffraction peaks. TABLE 1 d Relative peak intensity (Å) (%) 9.18 ± 0.21 30~400 4.45 ± 0.04 10~100 4.32 ± 0.08 10~70  4.12 ± 0.03 50~500 4.05 ± 0.03 84~200 3.97 ± 0.04 50~150 3.84 ± 0.08 100

IPC Classes  ?

  • C01B 39/46 - Other types characterised by their X-ray diffraction pattern and their defined composition
  • C07D 401/08 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing alicyclic rings
  • C07D 403/08 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a carbon chain containing alicyclic rings

22.

GALLIUM NITRIDE SINTERED BODY AND METHOD FOR PRODUCING SAME

      
Application Number 18848926
Status Pending
Filing Date 2023-03-17
First Publication Date 2025-06-26
Owner TOSOH CORPORATION (Japan)
Inventor
  • Iihama, Junya
  • Kususe, Yoshiro
  • Hara, Shinichi
  • Kano, Erisa
  • Mesuda, Masami

Abstract

Provided is at least one of a gallium nitride sintered body that is less subject to increases in oxygen content caused by re-oxidation after sintering than known gallium nitride sintered bodies obtained by the hot pressing process, a method for producing the gallium nitride sintered body, or use of the gallium nitride sintered body. The gallium nitride sintered body comprises a surface layer having a higher density than an inner portion of the sintered body. The atomic mass ratio of gallium to the sum of gallium and nitrogen is more than 0.5 and 0.60 or less.

IPC Classes  ?

  • C04B 35/58 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxides based on borides, nitrides or silicides
  • C04B 35/645 - Pressure sintering
  • C04B 35/65 - Reaction sintering of free metal- or free silicon-containing compositions
  • C23C 14/34 - Sputtering

23.

ALUMINUM SCANDIUM NITRIDE FILM AND FERROELECTRIC ELEMENT

      
Application Number 18851695
Status Pending
Filing Date 2023-03-30
First Publication Date 2025-06-26
Owner
  • TOSOH CORPORATION (Japan)
  • TOKYO INSTITUTE OF TECHNOLOGY (Japan)
Inventor
  • Mesuda, Masami
  • Kususe, Yoshiro
  • Iihama, Junya
  • Suemoto, Yuya
  • Ueoka, Yoshihiro
  • Funakubo, Hiroshi
  • Shiraishi, Takahisa
  • Yasuoka, Shinnosuke
  • Mizutani, Ryoichi
  • Ota, Reika

Abstract

An aluminum scandium nitride film contains aluminum, scandium, and nitrogen and further contains gallium. A crystal phase of the aluminum scandium nitride film may include a hexagonal crystal. The crystal phase of the aluminum scandium nitride film may have a wurtzite structure.

IPC Classes  ?

  • H10N 30/853 - Ceramic compositions
  • C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C 14/34 - Sputtering
  • H10N 30/30 - Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors

24.

CALCINED BODY AND SINTERED BODY OF ZIRCONIA

      
Application Number 18838733
Status Pending
Filing Date 2023-02-16
First Publication Date 2025-06-19
Owner TOSOH CORPORATION (Japan)
Inventor
  • Ushio, Yuki
  • Azechi, Sho
  • Nagayama, Hitoshi

Abstract

A calcined body and a sintered body are respectively a calcined body of zirconia and a sintered body of zirconia that have less warpage even after being subjected to heat treatment such as sintering or calcination. The sintered body includes zirconia, wherein the zirconia contains (i) stabilizing element-containing zirconia or (ii) zirconia containing stabilizing element-containing zirconia and a coloring element, the sintered body has three or more regions stacked in a layered manner, two adjacent regions among the regions differ from each other in at least one of stabilizing element content and coloring element content, and a difference between the stabilizing element content in a first region located at one end among the stacked regions and the stabilizing element content in a second region located at the other end is 2.0 mol % or less.

IPC Classes  ?

  • C04B 35/48 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on zirconium or hafnium oxides or zirconates or hafnates
  • A61C 13/00 - Dental prosthesesMaking same
  • C04B 35/64 - Burning or sintering processes

25.

ZIRCONIA LAYERED BODY

      
Application Number 18838056
Status Pending
Filing Date 2023-02-16
First Publication Date 2025-06-19
Owner TOSOH CORPORATION (Japan)
Inventor
  • Ushio, Yuki
  • Azechi, Sho
  • Ito, Akiko
  • Nagayama, Hitoshi

Abstract

There is provided a layered body that has gradations in translucency and color allowing the layered body to give an impression similar to that of natural teeth and with which the chipping of the surface layer (layer closer to the incisal edge of the dental restoration) can be reduced. There is provided a layered body that has gradations in translucency and color allowing the layered body to give an impression similar to that of natural teeth and with which the chipping of the surface layer (layer closer to the incisal edge of the dental restoration) can be reduced. The layered body comprises a surface layer containing zirconia containing at least one stabilizing element and a composition-gradient layer composed of two or more unit layers. The unit layers each contain at least one coloring element and zirconia containing at least one stabilizing element, and the composition-gradient layer is constructed as a result of the unit layers being stacked in such a manner that the amount of the stabilizing element in the zirconia containing at least one stabilizing element contained in the composition-gradient layer remains unchanged or decreases from the surface layer toward the surface of the layered body opposite the surface layer. The amount of the stabilizing element in the zirconia containing at least one stabilizing element contained in the surface layer is smaller than the amount of the stabilizing element in the zirconia containing at least one stabilizing element contained in a first composition-gradient layer, which is one of the unit layers constituting the composition-gradient layer and is adjacent to the surface layer.

IPC Classes  ?

  • A61K 6/818 - Preparations for artificial teeth, for filling teeth or for capping teeth comprising ceramics comprising zirconium oxide
  • A61C 5/77 - Methods or devices for making crowns
  • A61C 13/083 - Porcelain or ceramic teeth
  • A61K 6/78 - Pigments
  • A61K 6/813 - Preparations for artificial teeth, for filling teeth or for capping teeth comprising ceramics comprising iron oxide
  • A61K 6/822 - Preparations for artificial teeth, for filling teeth or for capping teeth comprising ceramics comprising rare earth metal oxides
  • A61K 6/824 - Preparations for artificial teeth, for filling teeth or for capping teeth comprising ceramics comprising transition metal oxides
  • C04B 35/488 - Composites
  • C04B 35/63 - Preparing or treating the powders individually or as batches using additives specially adapted for forming the products
  • C04B 35/64 - Burning or sintering processes
  • C09C 1/00 - Treatment of specific inorganic materials other than fibrous fillers Preparation of carbon black

26.

METHOD FOR PRODUCING SINTERED BODY

      
Application Number 18875321
Status Pending
Filing Date 2023-06-30
First Publication Date 2025-06-19
Owner TOSOH CORPORATION (Japan)
Inventor
  • Azechi, Sho
  • Matsuura, Moeka
  • Kawamura, Kiyotaka
  • Nagayama, Hitoshi
  • Ushio, Yuki

Abstract

A method for producing a stabilizing element-containing zirconia sintered body includes heating a zirconia compositional substance containing a stabilizing element from a heating start temperature to a first target temperature of 800° C. or higher and lower than 1400° C. at a heating rate of 150° C./minute or more; elevating the temperature from the first target temperature to a second target temperature of 1400° C. or higher and lower than 1580° C. at a heating rate of more than 30° C./minute and less than 200° C./minute; and retaining the second target temperature.

IPC Classes  ?

  • C04B 35/48 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on zirconium or hafnium oxides or zirconates or hafnates
  • C04B 35/64 - Burning or sintering processes
  • F27B 5/14 - Arrangements of heating devices

27.

CONTINUOUS CERAMIC FIBER, METHOD FOR PRODUCING THE SAME, AND CERAMIC MATRIX COMPOSITE CONTAINING THE CONTINUOUS CERAMIC FIBER

      
Application Number 18846441
Status Pending
Filing Date 2023-03-14
First Publication Date 2025-06-12
Owner TOSOH CORPORATION (Japan)
Inventor
  • Hirataka, Yo
  • Nawata, Yushi
  • Ohta, Ikuya
  • Yamashita, Isao

Abstract

Provided is at least one of a continuous ceramic fiber in which the decrease in single fiber strength after exposure to a high temperature is inhibited, a method for producing the continuous ceramic fiber, a ceramic matrix composite using the continuous ceramic fiber, and a method for producing the ceramic matrix composite. Provided is at least one of a continuous ceramic fiber in which the decrease in single fiber strength after exposure to a high temperature is inhibited, a method for producing the continuous ceramic fiber, a ceramic matrix composite using the continuous ceramic fiber, and a method for producing the ceramic matrix composite. The continuous ceramic fiber includes a region containing at least one of ytterbium and lutetium on a surface of the continuous ceramic fiber.

IPC Classes  ?

  • C04B 35/80 - Fibres, filaments, whiskers, platelets, or the like
  • C04B 35/626 - Preparing or treating the powders individually or as batches
  • C04B 35/628 - Coating the powders

28.

SINTERED BODY

      
Application Number 18873444
Status Pending
Filing Date 2023-06-13
First Publication Date 2025-06-05
Owner TOSOH CORPORATION (Japan)
Inventor
  • Fukiage, Taku
  • Tsuchiya, Satoshi
  • Tsukimori, Takashi
  • Higuchi, Yuya
  • Nagayama, Hitoshi

Abstract

At least one of a zirconia sintered body that contributes to the sustainable development goals (SDGs) and has high impact resistance and a method for producing the zirconia sintered body is provided. A zirconia sintered body includes 4.5% by mole or more and 15.5% by mole or less of a stabilizing element other than yttrium, wherein the stabilizing element contains 0% by mole or more and 8.5% by mole or less of cerium, a cubic phase of zirconia is not contained, and a monoclinic phase ratio is 70% or less.

IPC Classes  ?

  • C04B 35/48 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on zirconium or hafnium oxides or zirconates or hafnates
  • C04B 35/64 - Burning or sintering processes

29.

MAIN CHAIN POLYMER, OPTICAL FILM, METHOD FOR PRODUCING MAIN CHAIN POLYMER, METHOD FOR PRODUCING OPTICAL FILM, AND MULTILAYER FILM

      
Application Number 18721466
Status Pending
Filing Date 2022-12-22
First Publication Date 2025-06-05
Owner
  • TOSOH CORPORATION (Japan)
  • SAGAMI CHEMICAL RESEARCH INSTITUTE (Japan)
Inventor
  • Ichijo, Hiroki
  • Sakashita, Ryuichi
  • Murakami, Noritake
  • Shichida, Yuki
  • Inaba, Ayato
  • Kitagawa, Takahiro
  • Yokoi, Taiyo
  • Ibe, Kouta
  • Kobayashi, Osamu

Abstract

A main chain polymer comprises, in its main chain, a photoreactive reverse wavelength dispersion unit exhibiting photoreactivity and reverse wavelength dispersion of birefringence, the photoreactive reverse wavelength dispersion unit has a structure of formula (1): A main chain polymer comprises, in its main chain, a photoreactive reverse wavelength dispersion unit exhibiting photoreactivity and reverse wavelength dispersion of birefringence, the photoreactive reverse wavelength dispersion unit has a structure of formula (1): A main chain polymer comprises, in its main chain, a photoreactive reverse wavelength dispersion unit exhibiting photoreactivity and reverse wavelength dispersion of birefringence, the photoreactive reverse wavelength dispersion unit has a structure of formula (1): L1 and L2 are the same or different, each is a carbonyl group, an ester linkage, an amide linkage, an ether linkage or a single bond; * represents a site of binding with another structure in the main chain polymer; Ar is a ring system selected from a monocyclic aromatic ring system, a polycyclic aromatic ring system and an annulated aromatic ring system whose ring-constituting atoms are atoms selected from a carbon atom, a nitrogen atom, an oxygen atom and a sulfur atom, with the monocyclic aromatic ring system, polycyclic aromatic ring system or annulated aromatic ring system optionally having a substituent; R0, R1, R2, R3 and R4 each independently are a hydrogen atom, a halogen atom or a C1 to C8 alkyl group.

IPC Classes  ?

  • C08G 63/688 - Polyesters containing atoms other than carbon, hydrogen, and oxygen containing sulfur
  • C07D 207/333 - Radicals substituted by oxygen or sulfur atoms
  • C07D 307/46 - Doubly bound oxygen atoms, or two oxygen atoms singly bound to the same carbon atom
  • C07D 333/22 - Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
  • C07D 333/28 - Halogen atoms
  • C07D 333/32 - Oxygen atoms
  • C08G 63/547 - Hydroxy compounds containing aromatic rings
  • C08G 63/682 - Polyesters containing atoms other than carbon, hydrogen, and oxygen containing halogens
  • C08G 63/78 - Preparation processes
  • G02B 1/04 - Optical elements characterised by the material of which they are madeOptical coatings for optical elements made of organic materials, e.g. plastics

30.

POLYURETHANE RESIN COMPOSITION, ARTIFICIAL LEATHER, SYNTHETIC LEATHER, AND SURFACE TREATMENT AGENT FOR LEATHER

      
Application Number 18838210
Status Pending
Filing Date 2023-02-13
First Publication Date 2025-05-22
Owner TOSOH CORPORATION (Japan)
Inventor
  • Honda, Kohei
  • Anzai, Hironao

Abstract

A polyurethane resin composition containing an isocyanate-terminated urethane prepolymer (E) or a reaction product of an isocyanate-terminated urethane prepolymer (E) and a chain extender (G), and a neutralizing agent (F), wherein the isocyanate-terminated urethane prepolymer (E) includes a reaction product of: a polyol (A1) including a polycarbonate polyol (B1) having an ester bond and an average hydroxyl group functionality of more than 2; an organic acid (C); and a polyisocyanate (D), and wherein the content of the polycarbonate polyol (B1) or the content of urea groups derived from the chain extender (G) satisfies a specific condition.

IPC Classes  ?

  • C08G 18/12 - Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step using two or more compounds having active hydrogen in the first polymerisation step
  • C08G 18/32 - Polyhydroxy compoundsPolyaminesHydroxy amines
  • C08G 18/44 - Polycarbonates
  • C08G 18/75 - Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic
  • D06N 3/14 - Artificial leather, oilcloth, or like material obtained by covering fibrous webs with macromolecular material, e.g. resins, rubber or derivatives thereof with macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds with polyurethanes

31.

SINTERED BODY, METHOD FOR PRODUCING SINTERED BODY, POWDER AND CALCINED BODY

      
Application Number 18841079
Status Pending
Filing Date 2023-02-28
First Publication Date 2025-05-15
Owner TOSOH CORPORATION (Japan)
Inventor
  • Kawamura, Kenta
  • Nishiyama, So
  • Fukiage, Taku
  • Hosoi, Kohei
  • Nagayama, Hitoshi

Abstract

To provide at least one of a sintered body with both high dynamic strength and high static strength, a method for producing the sintered body, a powder and a calcined body. A sintered body of zirconia, wherein the zirconia contains a stabilizing element, the stabilizing element contains at least one rare-earth element other than yttrium, and the sintered body has an average grain size of 0.05 μm or more and 0.75 μm or less and has a plastic deformable region.

IPC Classes  ?

32.

MATERIAL FOR METAL PATTERNING, HETEROCYCLIC COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENT DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN

      
Application Number 18835842
Status Pending
Filing Date 2023-02-09
First Publication Date 2025-05-15
Owner TOSOH CORPORATION (Japan)
Inventor
  • Kawashima, Hiroyuki
  • Koike, Kenji
  • Matsumoto, Naoki
  • Nomura, Shintaro
  • Ota, Eriko
  • Hattori, Kazuki

Abstract

To provide a material for metal patterning capable of significantly suppressing the formation of a thin metal film on a film surface, a heterocyclic compound, a thin film for metal patterning using them, an organic electroluminescent element, a method for forming a metal pattern, and an electronic device. A material for metal patterning represented by the formula (A1) or (B1): To provide a material for metal patterning capable of significantly suppressing the formation of a thin metal film on a film surface, a heterocyclic compound, a thin film for metal patterning using them, an organic electroluminescent element, a method for forming a metal pattern, and an electronic device. A material for metal patterning represented by the formula (A1) or (B1): wherein A each independently denotes N or CR, at least one thereof being N and at least one thereof being CR; and B denotes N, NR, S, O or CR, at least one thereof being N, S or O and at least one thereof being CR.

IPC Classes  ?

  • C07D 251/30 - Only oxygen atoms
  • B05D 1/32 - Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
  • C07D 213/26 - Radicals substituted by halogen atoms or nitro radicals
  • C07D 239/26 - Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
  • C07D 241/12 - Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
  • C07D 251/20 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to only one ring carbon atom with no nitrogen atoms directly attached to a ring carbon atom
  • C07D 401/04 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring- member bond
  • C07D 401/10 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing aromatic rings
  • C07D 401/12 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
  • C07D 401/14 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing three or more hetero rings
  • C07D 403/04 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings directly linked by a ring-member-to-ring- member bond
  • C07D 403/10 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a carbon chain containing aromatic rings
  • C07D 403/12 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
  • C07D 403/14 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group containing three or more hetero rings
  • C07D 405/04 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring- member bond
  • C07D 405/14 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
  • C07D 409/10 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing aromatic rings
  • C07D 409/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
  • C07D 471/04 - Ortho-condensed systems
  • C07D 471/08 - Bridged systems
  • C07D 487/04 - Ortho-condensed systems
  • H10K 50/813 - Anodes characterised by their shape
  • H10K 71/60 - Forming conductive regions or layers, e.g. electrodes

33.

POWDER AND METHOD FOR PRODUCING THE SAME

      
Application Number 18832723
Status Pending
Filing Date 2023-01-25
First Publication Date 2025-05-08
Owner TOSOH CORPORATION (Japan)
Inventor
  • Ushio, Yuki
  • Tsukimori, Takashi
  • Nagayama, Hitoshi

Abstract

Provided are a powder which contains zirconia as a main component and at least a transition metal element and from which a calcined body having mechanical properties more suitable for calcined body processing is obtained, a method for producing the powder and at least one of a calcined body, a sintered body obtained from the powder and methods for producing them. A powder of zirconia includes a stabilizing element and a transition metal element, in which in a frequency distribution of element ratios of the transition metal element/zirconium plotted at intervals of 0.005, a difference between a minimum value and a maximum value of the transition metal element/zirconium is less than 0.25.

IPC Classes  ?

  • C04B 35/488 - Composites
  • B28B 11/24 - Apparatus or processes for treating or working the shaped articles for curing, setting or hardening
  • C04B 35/626 - Preparing or treating the powders individually or as batches
  • C04B 35/645 - Pressure sintering

34.

NOVEL YFI-TYPE ZEOLITE

      
Application Number 18835208
Status Pending
Filing Date 2023-01-31
First Publication Date 2025-05-01
Owner TOSOH CORPORATION (Japan)
Inventor
  • Nakazawa, Naoto
  • Mitsuhashi, Ryo
  • Usui, Toyohiro

Abstract

Provided is a method for producing a YFI-type zeolite that is simplified compared to the conventional YFI-type zeolite production methods, or a YFI-type zeolite with a structure that is obtained by the method.

IPC Classes  ?

  • B01J 29/06 - Crystalline aluminosilicate zeolitesIsomorphous compounds thereof
  • B01J 35/63 - Pore volume
  • B01J 35/67 - Pore distribution monomodal
  • C01B 39/46 - Other types characterised by their X-ray diffraction pattern and their defined composition

35.

WATER-SOLUBLE CHELATING POLYMER AND METHOD FOR PRODUCING SAME

      
Application Number 18835468
Status Pending
Filing Date 2023-01-30
First Publication Date 2025-05-01
Owner TOSOH CORPORATION (Japan)
Inventor
  • Inoue, Hiroshi
  • Tougou, Eiichi

Abstract

To provide a water-soluble chelating polymer that can rapidly trap a trace amount of heavy-metal ions to reduce the amount of heavy-metal ions to a ppm level or lower in a short time. To provide a water-soluble chelating polymer that can rapidly trap a trace amount of heavy-metal ions to reduce the amount of heavy-metal ions to a ppm level or lower in a short time. Use a water-soluble chelating polymer comprising an anionic polymer having a carboxy group, a sulfonate group and/or a sulfate group bonded through an ionic bond to a chelating functional group having a cationic functional group, wherein the water-soluble chelating polymer contains 0.2 to 6 mmol/g of the chelating functional group and has a weight-average molecular weight in the range of 30,000 to 1,000,000.

IPC Classes  ?

  • B01J 45/00 - Ion-exchange in which a complex or a chelate is formedUse of material as complex or chelate forming ion-exchangersTreatment of material for improving the complex or chelate forming ion-exchange properties
  • C02F 1/42 - Treatment of water, waste water, or sewage by ion-exchange
  • C02F 1/62 - Heavy metal compounds
  • C08B 37/00 - Preparation of polysaccharides not provided for in groups Derivatives thereof
  • H01M 4/13 - Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulatorsProcesses of manufacture thereof

36.

INSULATING FILM FOR SECONDARY BATTERY AND METHOD FOR PRODUCING IT

      
Application Number 18493807
Status Pending
Filing Date 2023-10-25
First Publication Date 2025-05-01
Owner
  • TOSOH FINECHEM CORPORATION (Japan)
  • University of Miyazaki (Japan)
  • TOSOH CORPORATION (Japan)
Inventor
  • Aoki, Masahiro
  • Mori, Haruna
  • Yoshino, Kenji
  • Imai, Masato
  • Miyazawa, Atsushi

Abstract

An insulating film for a secondary battery, which has desired insulating property and heat resistance, and which contributes to an increase of the energy density of a battery without considerable increase of the thickness. An insulating film for a secondary battery, including a substrate film which is a polyolefin microporous membrane, and having a metal oxide contained in the substrate film. In the insulating film, the metal oxide is contained in at least some of micropores and is present on the inner wall of the micropores. A method for producing the insulating film for a secondary battery is a method of spraying a solution containing an alkyl compound corresponding to a metal of the metal oxide and/or a partial hydrolysate of the alkyl compound over the substrate film, and drying the solution.

IPC Classes  ?

  • H01M 50/434 - Ceramics
  • H01M 50/403 - Manufacturing processes of separators, membranes or diaphragms
  • H01M 50/417 - Polyolefins
  • H01M 50/451 - Separators, membranes or diaphragms characterised by the material having a layered structure comprising layers of only organic material and layers containing inorganic material
  • H01M 50/489 - Separators, membranes, diaphragms or spacing elements inside the cells, characterised by their physical properties, e.g. swelling degree, hydrophilicity or shut down properties

37.

SINTERED BODY AND METHOD FOR PRODUCING SAME

      
Application Number 18729346
Status Pending
Filing Date 2022-12-28
First Publication Date 2025-03-20
Owner TOSOH CORPORATION (Japan)
Inventor
  • Shimoyama, Tomotaka
  • Kuramoto, Yasunori

Abstract

There is provided at least one of a sintered body having both excellent mechanical strength and translucency and a method for producing the sintered body. The sintered body comprises a matrix of zirconia in which a stabilizing element and lanthanum are dissolved to form a solid solution, the zirconia having a cubic phase fraction of 95% or more, and in which the amount of the stabilizing element is 8% or more by mole and 12% or less by mole.

IPC Classes  ?

38.

RARE EARTH COMPLEX

      
Application Number 18576457
Status Pending
Filing Date 2022-07-04
First Publication Date 2025-03-06
Owner
  • TOSOH CORPORATION (Japan)
  • SAGAMI CHEMICAL RESEARCH INSTITUTE (Japan)
Inventor
  • Araki, Keisuke
  • Maebayashi, Haruki
  • Masaki, Airi
  • Koiso, Naoyuki
  • Nakagame, Ryo
  • Yamamoto, Masanori
  • Sasaki, Ippei
  • Iwanaga, Kohei

Abstract

A rare earth complex is represented by general formula (1). A rare earth complex is represented by general formula (1). M3+·(HC)n·(L1)m1·(L2)m2·(XL)3-n  (1) [In the formula, HC represents a quinolinonato ligand or coumarinato ligand, L1 represents, for example, a nitrogen-containing ligand, L2 represents, for example, water, XL represents, for example, a halide ion, M3+ represents a trivalent rare earth metal ion, n represents 1, 2 or 3, m1 represents 0, 1 or 2, and m2 represents 0 to 3.]

IPC Classes  ?

  • C07F 5/00 - Compounds containing elements of Groups 3 or 13 of the Periodic Table
  • C07D 213/22 - Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing two or more pyridine rings directly linked together, e.g. bipyridyl
  • C07D 215/22 - Oxygen atoms attached in position 2 or 4
  • C07D 221/10 - Aza-phenanthrenes
  • C07D 221/18 - Ring systems of four or more rings
  • C07D 401/04 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring- member bond
  • C07D 405/06 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
  • C07D 409/06 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
  • C07D 471/04 - Ortho-condensed systems
  • C07D 471/06 - Peri-condensed systems
  • C07D 487/14 - Ortho-condensed systems
  • C07D 491/048 - Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring the oxygen-containing ring being five-membered
  • C07D 495/04 - Ortho-condensed systems
  • C07D 498/06 - Peri-condensed systems
  • C07D 513/06 - Peri-condensed systems
  • C07D 513/16 - Peri-condensed systems
  • C07F 9/53 - Organo-phosphine oxidesOrgano-phosphine sulfides
  • C08K 3/40 - Glass
  • C08K 5/00 - Use of organic ingredients
  • C09K 11/06 - Luminescent, e.g. electroluminescent, chemiluminescent, materials containing organic luminescent materials

39.

METHOD FOR PRODUCING POLYMER, AND RESIN COMPOSITION

      
Application Number 18721350
Status Pending
Filing Date 2022-12-21
First Publication Date 2025-02-20
Owner
  • TOSOH CORPORATION (Japan)
  • KAI PHOTONICS CO., LTD. (Japan)
Inventor
  • Yamada, Satoru
  • Watanabe, Misaki
  • Katagiri, Fumiaki
  • Kitagawa, Takahiro
  • Sakashita, Ryuichi
  • Koike, Yasuhiro

Abstract

It is an object to provide a method for efficiently producing an N-alkylmaleimide-based polymer that has an excellent optical characteristic, excellent heat resistance, and excellent mechanical strength. A method for producing an N-alkylmaleimide-based polymer in accordance with an aspect of the present invention includes using an oil-soluble radical polymerization initiator to carry out suspension polymerization, in an aqueous medium in the presence of at least one dispersant selected from the group consisting of a nonionic compound having no hydrogen bonded to oxygen or nitrogen, a polyacrylate salt, and a polyalkylene glycol, with respect to a monomer mixture consisting of 20% by weight to 100% by weight of N-alkylmaleimide and 0% by weight to 80% by weight of other copolymerizable monomers, the N-alkylmaleimide being represented by the following general formula (1): It is an object to provide a method for efficiently producing an N-alkylmaleimide-based polymer that has an excellent optical characteristic, excellent heat resistance, and excellent mechanical strength. A method for producing an N-alkylmaleimide-based polymer in accordance with an aspect of the present invention includes using an oil-soluble radical polymerization initiator to carry out suspension polymerization, in an aqueous medium in the presence of at least one dispersant selected from the group consisting of a nonionic compound having no hydrogen bonded to oxygen or nitrogen, a polyacrylate salt, and a polyalkylene glycol, with respect to a monomer mixture consisting of 20% by weight to 100% by weight of N-alkylmaleimide and 0% by weight to 80% by weight of other copolymerizable monomers, the N-alkylmaleimide being represented by the following general formula (1): It is an object to provide a method for efficiently producing an N-alkylmaleimide-based polymer that has an excellent optical characteristic, excellent heat resistance, and excellent mechanical strength. A method for producing an N-alkylmaleimide-based polymer in accordance with an aspect of the present invention includes using an oil-soluble radical polymerization initiator to carry out suspension polymerization, in an aqueous medium in the presence of at least one dispersant selected from the group consisting of a nonionic compound having no hydrogen bonded to oxygen or nitrogen, a polyacrylate salt, and a polyalkylene glycol, with respect to a monomer mixture consisting of 20% by weight to 100% by weight of N-alkylmaleimide and 0% by weight to 80% by weight of other copolymerizable monomers, the N-alkylmaleimide being represented by the following general formula (1): where R represents a C1-C12 linear alkyl group, a C3-C12 branched alkyl group, or a C3-C6 cyclic alkyl group.

IPC Classes  ?

  • C08F 234/00 - Copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring

40.

SINTERED BODY, METHOD FOR PRODUCING SINTERED BODY, RAW MATERIAL POWDER FOR SINTERED BODY, AND CALCINED BODY

      
Application Number 18723691
Status Pending
Filing Date 2022-12-27
First Publication Date 2025-02-20
Owner TOSOH CORPORATION (Japan)
Inventor
  • Kawamura, Kenta
  • Hosoi, Kohei
  • Nagayama, Hitoshi

Abstract

Provided is at least one of a zirconia sintered body, a raw material powder for the zirconia sintered body, a calcined body and a method for producing the sintered body. The zirconia sintered body does not exhibit a color derived from ceria and exhibits high impact resistance. The sintered body comprises zirconia and germanium oxide, the zirconia containing a stabilizing element, wherein Y/X is 0.35 or greater, and X+Y is 4.0 or less, where X is an amount of the stabilizing element in the zirconia expressed in mol %, and Y is an amount of the germanium oxide in the zirconia expressed in mol %.

IPC Classes  ?

41.

DIAMANTANE COMPOUND, ORGANIC ELECTROLUMINESCENT DEVICE MATERIAL AND ORGANIC ELECTROLUMINESCENT DEVICE

      
Application Number 18721316
Status Pending
Filing Date 2022-12-06
First Publication Date 2025-02-13
Owner
  • TOSOH CORPORATION (Japan)
  • SAGAMI CHEMICAL RESEARCH INSTITUTE (Japan)
Inventor
  • Uehara, Fuminari
  • Uchida, Naoki
  • Oike, Kana
  • Takahashi, Yasuhiro
  • Hattori, Kazuki
  • Nomura, Shintaro
  • Aihara, Hidenori
  • Hayakawa, Naoki
  • Matsumoto, Shuya

Abstract

Provided are a diamantane compound with which an organic electroluminescent device that can exhibit excellent luminous efficiency characteristics, more preferably excellent drive voltage characteristics and excellent luminous efficiency characteristics, can be produced, and an organic electroluminescent device material containing the diamantane compound. Also provided is an organic electroluminescent device that can achieve luminous efficiency characteristics, more preferably drive voltage characteristics and luminous efficiency characteristics, at high levels. Provided are a diamantane compound with which an organic electroluminescent device that can exhibit excellent luminous efficiency characteristics, more preferably excellent drive voltage characteristics and excellent luminous efficiency characteristics, can be produced, and an organic electroluminescent device material containing the diamantane compound. Also provided is an organic electroluminescent device that can achieve luminous efficiency characteristics, more preferably drive voltage characteristics and luminous efficiency characteristics, at high levels. A diamantane compound has a group represented by formula (1) below and a group represented by formula (2) below. Provided are a diamantane compound with which an organic electroluminescent device that can exhibit excellent luminous efficiency characteristics, more preferably excellent drive voltage characteristics and excellent luminous efficiency characteristics, can be produced, and an organic electroluminescent device material containing the diamantane compound. Also provided is an organic electroluminescent device that can achieve luminous efficiency characteristics, more preferably drive voltage characteristics and luminous efficiency characteristics, at high levels. A diamantane compound has a group represented by formula (1) below and a group represented by formula (2) below. Provided are a diamantane compound with which an organic electroluminescent device that can exhibit excellent luminous efficiency characteristics, more preferably excellent drive voltage characteristics and excellent luminous efficiency characteristics, can be produced, and an organic electroluminescent device material containing the diamantane compound. Also provided is an organic electroluminescent device that can achieve luminous efficiency characteristics, more preferably drive voltage characteristics and luminous efficiency characteristics, at high levels. A diamantane compound has a group represented by formula (1) below and a group represented by formula (2) below. (In formula (1), carbon atoms of a diamantane ring are optionally substituted with an aryl group having 6 to 12 carbon atoms. In formula (1), * represents a bond, and a represents an integer of 1 to 6.) Provided are a diamantane compound with which an organic electroluminescent device that can exhibit excellent luminous efficiency characteristics, more preferably excellent drive voltage characteristics and excellent luminous efficiency characteristics, can be produced, and an organic electroluminescent device material containing the diamantane compound. Also provided is an organic electroluminescent device that can achieve luminous efficiency characteristics, more preferably drive voltage characteristics and luminous efficiency characteristics, at high levels. A diamantane compound has a group represented by formula (1) below and a group represented by formula (2) below. (In formula (1), carbon atoms of a diamantane ring are optionally substituted with an aryl group having 6 to 12 carbon atoms. In formula (1), * represents a bond, and a represents an integer of 1 to 6.)

IPC Classes  ?

  • C07C 15/38 - Polycyclic condensed hydrocarbons containing four rings
  • H10K 50/15 - Hole transporting layers
  • H10K 50/16 - Electron transporting layers
  • H10K 85/60 - Organic compounds having low molecular weight

42.

COMPOSITION AND METHOD FOR PRODUCING SAME

      
Application Number 18716594
Status Pending
Filing Date 2022-12-06
First Publication Date 2025-01-30
Owner TOSOH CORPORATION (Japan)
Inventor
  • Tsuchiya, Kazuyoshi
  • Shirakura, Yoshinori

Abstract

At least one of a composition including silver and crystalline silicotitanate to which cesium and strontium ions can be adsorbed and to which an iodide ion can also be adsorbed simultaneously and a method for producing the composition.

IPC Classes  ?

  • B01J 20/10 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
  • B01J 20/30 - Processes for preparing, regenerating or reactivating
  • C02F 1/28 - Treatment of water, waste water, or sewage by sorption
  • C02F 1/70 - Treatment of water, waste water, or sewage by reduction
  • C02F 101/12 - Halogens or halogen-containing compounds
  • C02F 101/20 - Heavy metals or heavy metal compounds
  • C02F 103/06 - Contaminated groundwater or leachate
  • C02F 103/08 - Seawater, e.g. for desalination

43.

SEPARATION METHOD OF ANTIBODY

      
Application Number 18709920
Status Pending
Filing Date 2022-11-14
First Publication Date 2025-01-23
Owner TOSOH CORPORATION (Japan)
Inventor
  • Hayakawa, Yuta
  • Taniguchi, Naomasa
  • Terao, Yosuke

Abstract

An antibody separation method including a step of applying a solution containing an antibody to a column filled with an antibody adsorption material containing an insoluble porous carrier and an Fc-binding protein immobilized on the carrier and adsorbing the antibody onto the antibody adsorption material; and a step of applying a buffer solution to the column and eluting the antibody adsorbed onto the antibody adsorption material with a pH gradient, wherein the pH gradient is a step gradient in which a pH of the buffer solution is lowered in steps, and wherein the magnitude of pH decrease is 0.1 or more and less than 1.

IPC Classes  ?

  • C07K 1/22 - Affinity chromatography or related techniques based upon selective absorption processes
  • C07K 16/28 - Immunoglobulins, e.g. monoclonal or polyclonal antibodies against material from animals or humans against receptors, cell surface antigens or cell surface determinants

44.

OPTICAL FILM AND POLARIZING PLATE

      
Application Number 18710380
Status Pending
Filing Date 2022-11-16
First Publication Date 2025-01-09
Owner TOSOH CORPORATION (Japan)
Inventor
  • Komine, Takuya
  • Yoshimura, Asuka
  • Kitagawa, Takahiro

Abstract

There has been a demand for an optical film having excellent glass-range photoelastic coefficient and a polarizing plate which uses this optical film. The present invention provides an optical film which is characterized by containing an ester-based resin that contains 50% by mole or more of a fumaric acid ester residue unit represented by formula (1) and having a negative birefringence, and a photoelasticity regulator having a positive birefringence, and which is also characterized in that the absolute value of the glass-range photoelastic coefficient thereof is 5×10−12 Pa−1 or less. There has been a demand for an optical film having excellent glass-range photoelastic coefficient and a polarizing plate which uses this optical film. The present invention provides an optical film which is characterized by containing an ester-based resin that contains 50% by mole or more of a fumaric acid ester residue unit represented by formula (1) and having a negative birefringence, and a photoelasticity regulator having a positive birefringence, and which is also characterized in that the absolute value of the glass-range photoelastic coefficient thereof is 5×10−12 Pa−1 or less. (In the formula, each of R1 and R2 independently represents a linear alkyl group having 1 to 12 carbon atoms, a branched alkyl group having 3 to 12 carbon atoms, or a cyclic alkyl group having 3 to 6 carbon atoms.)

IPC Classes  ?

  • C08L 67/02 - Polyesters derived from dicarboxylic acids and dihydroxy compounds
  • C08K 5/01 - Hydrocarbons
  • C08K 5/06 - EthersAcetalsKetalsOrtho-esters
  • C08K 5/18 - AminesQuaternary ammonium compounds with aromatically bound amino groups
  • C08K 5/3437 - Six-membered rings condensed with carbocyclic rings
  • C08K 5/3492 - Triazines
  • C08K 5/45 - Heterocyclic compounds having sulfur in the ring
  • G02B 5/30 - Polarising elements

45.

RESIN, INSULATING FILM AND ORGANIC FIELD EFFECT TRANSISTOR COMPRISING SAME

      
Application Number 18704567
Status Pending
Filing Date 2022-10-24
First Publication Date 2024-12-26
Owner TOSOH CORPORATION (Japan)
Inventor
  • Iijima, Yuta
  • Yumino, Shohei
  • Fukuda, Takashi
  • Shiwaku, Rei
  • Oku, Shinya

Abstract

The present invention provides a resin which enables the production of an organic field effect transistor element which has excellent resistance to bias stress by being used as a gate insulating film layer for an organic field effect transistor. The present invention provides a resin which comprises a repeating unit represented by Formula (1) and a repeating unit represented by Formula (2), wherein: the repeating unit represented by Formula (2) has a HOMO level of −6.4 eV or less; and 20% by mole or more of the repeating unit represented by Formula (2) is contained relative to the total amount of the repeating unit represented by Formula (1) and the repeating unit represented by Formula (2).

IPC Classes  ?

  • C08F 8/24 - Haloalkylation
  • C08F 8/30 - Introducing nitrogen atoms or nitrogen-containing groups
  • C08F 12/08 - Styrene
  • C08J 5/18 - Manufacture of films or sheets
  • H10K 10/46 - Field-effect transistors, e.g. organic thin-film transistors [OTFT]

46.

Sputtering target, method for producing same, and method for producing sputtering film using sputtering target

      
Application Number 18698353
Grant Number 12385126
Status In Force
Filing Date 2022-10-05
First Publication Date 2024-12-12
Grant Date 2025-08-12
Owner
  • TOSOH CORPORATION (Japan)
  • TOSOH SPECIALITY MATERIALS CORPORATION (Japan)
Inventor
  • Shono, Daiki
  • Kondo, Taiga
  • Mesuda, Masami
  • Itoh, Kenichi
  • Hanawa, Koichi

Abstract

A sputtering target includes crystal grains, has a content of an amorphous phase of 3% by volume or less, and contains at least one metal selected from the group consisting of chromium, molybdenum, and chromium-molybdenum alloys.

IPC Classes  ?

  • C23C 14/34 - Sputtering
  • H01J 37/34 - Gas-filled discharge tubes operating with cathodic sputtering

47.

Powder of gallium nitride and method for producing the same

      
Application Number 18732633
Grant Number 12528711
Status In Force
Filing Date 2024-06-04
First Publication Date 2024-12-12
Grant Date 2026-01-20
Owner TOSOH CORPORATION (Japan)
Inventor
  • Kususe, Yoshiro
  • Hara, Shinichi
  • Iihama, Junya
  • Mesuda, Masami

Abstract

7Ω·cm or less.

IPC Classes  ?

  • C01G 15/00 - Compounds of gallium, indium, or thallium

48.

POWDER AND METHOD FOR PRODUCING THE SAME

      
Application Number 18712036
Status Pending
Filing Date 2022-11-24
First Publication Date 2024-12-12
Owner TOSOH CORPORATION (Japan)
Inventor
  • Matsui, Koji
  • Imai, Kenji
  • Hosoi, Kohei

Abstract

A zirconia powder including 2% by mole or more and 8% by mole or less of a stabilizing element and 50 ppm or less of titanium (Ti) and having an activation energy of 225 kJ/mol or more and 300 kJ/mol or less, which provides a zirconia powder capable of producing a sintered body with high translucency even by pressureless sintering and suitable for industrial production, a method for producing the zirconia powder, a method for producing a calcined body using the zirconia powder, and a method for producing a sintered body using the zirconia powder. Such a powder is produced by a method including adjusting a pH of a raw material solution containing a zirconium source and a stabilizing element source to 3.5 or more and 5.5 or less; heating the raw material solution to produce a zirconia sol solution; mixing the zirconia solution and an alkaline solution; and heat-treating.

IPC Classes  ?

49.

LAMINATE AND METHOD FOR MANUFACTURING SAME

      
Application Number 18698360
Status Pending
Filing Date 2022-10-06
First Publication Date 2024-12-05
Owner
  • TOSOH CORPORATION (Japan)
  • NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)
Inventor
  • Suemoto, Yuya
  • Ueoka, Yoshihiro
  • Mesuda, Masami
  • Nagata, Takahiro
  • Sang, Liwen
  • Chikyow, Toyohiro

Abstract

A laminate includes a structure in which a Si (111) substrate, an oxygen-containing aluminum nitride film, and a gallium nitride film are laminated. The laminate is obtained by a production method for a laminate that is characterized by having a structure in which a Si (111) substrate, an oxygen-containing aluminum nitride film, and a gallium nitride film are laminated, the production method having: an AlN film-formation step in which an aluminum nitride film is formed on the Si (111) substrate and an Si substrate including an aluminum nitride film is obtained; an oxidation step in which the Si substrate including the aluminum nitride film is treated in an oxidizing atmosphere and a Si substrate including an oxygen-containing aluminum nitride film is obtained; and a GaN film-formation step in which a gallium nitride film is formed on the Si substrate including the oxygen-containing aluminum nitride film.

IPC Classes  ?

  • C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C 14/34 - Sputtering
  • C23C 14/58 - After-treatment
  • H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
  • H01L 29/207 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds further characterised by the doping material

50.

POLYARYLENE SULFIDE COMPOSITION AND METHOD FOR PRODUCING SAME

      
Application Number 18699487
Status Pending
Filing Date 2022-10-14
First Publication Date 2024-12-05
Owner TOSOH CORPORATION (Japan)
Inventor
  • Harunari, Takeshi
  • Inoue, Hiroki

Abstract

There are provided a polyarylene sulfide composition that contains a post-consumer recycled polyamide and a fibrous filler without compromising the intrinsic heat resistance, chemical resistance, flowability and other characteristics of a polyarylene sulfide and a method for producing it. The polyarylene sulfide composition comprises a polyarylene sulfide (A) having a melt viscosity of 100 to 3000 poises as measured under the conditions of a measuring temperature of 315° C. and a load of 10 kg using a capillary rheometer flow tester fitted with a 1-mm diameter and 2-mm long die, 10 to 90 parts by weight of a post-consumer recycled polyamide (B) per 100 parts by weight of the polyarylene sulfide (A) and 20 to 110 parts by weight of a fibrous filler (C) per a total of 100 parts by weight of the polyarylene sulfide (A) and the post-consumer recycled polyamide (B).

IPC Classes  ?

  • C08L 81/02 - PolythioethersPolythioether-ethers
  • C08J 3/20 - Compounding polymers with additives, e.g. colouring
  • C08K 3/26 - CarbonatesBicarbonates
  • C08K 5/3492 - Triazines
  • C08K 5/5435 - Silicon-containing compounds containing oxygen containing oxygen in a ring
  • C08K 7/14 - Glass
  • C08K 13/04 - Ingredients characterised by their shape and organic or inorganic ingredients

51.

HOLE TRANSPORT PROMOTING MATERIAL, MATERIAL FOR LIGHT RECEIVING ELEMENT, CYANO COMPOUND, AND ORGANIC LIGHT RECEIVING ELEMENT

      
Application Number 18577046
Status Pending
Filing Date 2022-06-28
First Publication Date 2024-12-05
Owner TOSOH CORPORATION (Japan)
Inventor
  • Arai, Nobumichi
  • Okada, Takeshi
  • Takahashi, Yasuhiro
  • Nomura, Keisuke

Abstract

Provided are a material for a light receiving element having excellent hole transport characteristics, and an organic light receiving element using the same. Provided are a material for a light receiving element having excellent hole transport characteristics, and an organic light receiving element using the same. A material for a light receiving element is used that includes a compound represented by general formula (1) or general formula (2). Ar2 and Ar3 are preferably cyano groups. Ar and Ar5 are preferably cyano groups. Provided are a material for a light receiving element having excellent hole transport characteristics, and an organic light receiving element using the same. A material for a light receiving element is used that includes a compound represented by general formula (1) or general formula (2). Ar2 and Ar3 are preferably cyano groups. Ar and Ar5 are preferably cyano groups.

IPC Classes  ?

  • H10K 85/60 - Organic compounds having low molecular weight
  • C07D 241/36 - Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
  • C07D 475/12 - Heterocyclic compounds containing pteridine ring systems containing pteridine ring systems condensed with carbocyclic rings or ring systems
  • H10K 30/86 - Layers having high hole mobility, e.g. hole-transporting layers or electron-blocking layers

52.

METHOD FOR DETECTING ALZHEIMER'S DISEASE, AND DETECTION REAGENT

      
Application Number 18690047
Status Pending
Filing Date 2022-09-08
First Publication Date 2024-11-28
Owner
  • TOSOH CORPORATION (Japan)
  • JAPANESE FOUNDATION FOR CANCER RESEARCH (Japan)
Inventor
  • Yuyama, Kohei
  • Igeta, Yukifusa
  • Ueda, Koji

Abstract

Provided are a method of simply detecting Alzheimer's disease (AD) and a method of simply stratifying AD pathological phases, and a reagent that can be used for the methods, based on the fact that measurement of a protein contained in extracellular vesicles enables detection of Alzheimer's disease and stratification of AD pathological phases.

IPC Classes  ?

  • G01N 33/68 - Chemical analysis of biological material, e.g. blood, urineTesting involving biospecific ligand binding methodsImmunological testing involving proteins, peptides or amino acids

53.

YFI-TYPE ZEOLITE, METHOD FOR PRODUCING THE SAME, HYDROCARBON ADSORBENT AND HYDROCARBON ADSORPTION METHOD

      
Application Number 18563536
Status Pending
Filing Date 2022-05-31
First Publication Date 2024-11-21
Owner TOSOH CORPORATION (Japan)
Inventor
  • Mitsuhashi, Ryo
  • Nakazawa, Naoto
  • Usui, Toyohiro

Abstract

It is an object of the present disclosure to provide a YFl-type zeolite with a small difference in desorption starting temperature due to hydrothermal durability treatment, a method for producing the YFl-type zeolite, a hydrocarbon adsorbent containing the YFl-type zeolite and a hydrocarbon adsorption method using the YFl-type zeolite The YFl-type zeolite is characterized in that the ratio of the mass of extra-framework aluminum to the mass of contained aluminum is 0% by mass or more and 28% by mass or less.

IPC Classes  ?

  • B01J 20/18 - Synthetic zeolitic molecular sieves
  • B01D 53/02 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by adsorption, e.g. preparative gas chromatography
  • B01J 20/04 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising compounds of alkali metals, alkaline earth metals or magnesium
  • B01J 20/28 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof characterised by their form or physical properties
  • B01J 20/30 - Processes for preparing, regenerating or reactivating

54.

POWDER COMPOSITION, CALCINED BODY, SINTERED BODY, AND METHOD FOR PRODUCING SAME

      
Application Number 18691559
Status Pending
Filing Date 2022-09-15
First Publication Date 2024-11-14
Owner TOSOH CORPORATION (Japan)
Inventor
  • Azechi, Sho
  • Higuchi, Yuya
  • Fujisaki, Hiroyuki
  • Nagayama, Hitoshi
  • Kawamura, Kiyotaka

Abstract

Provided is a powder composition that includes, as a matrix, a zirconia having a high content of a stabilizing element and that can provide, through short-time sintering, a sintered body satisfying translucency and mechanical strength required for dental prosthetic materials, in particular, prosthetic anterior teeth. Provided is a powder composition including two or more stabilized zirconias having different contents of a stabilizing element, in which the powder composition has a content of the stabilizing element of more than 4.0 mol % and 5.8 mol % or less, a rate of change in thermal shrinkage rate per unit temperature at 1,300° C. is 0.07% C−1 or less, and the contents of the stabilizing element of the stabilized zirconias are each 8.0 mol % or less.

IPC Classes  ?

55.

METAL MEMBER-POLYARYLENE SULFIDE MEMBER COMPOSITE AND METHOD FOR ITS PRODUCTION

      
Application Number 18682669
Status Pending
Filing Date 2022-08-03
First Publication Date 2024-10-31
Owner TOSOH CORPORATION (Japan)
Inventor Harunari, Takeshi

Abstract

A metal member-polyarylene sulfide resin member composite having an air-tight joint between the metal member and the polyarylene sulfide resin member and a method for its production are provided. A metal member-polyarylene sulfide resin member composite comprising a metal member and a polyarylene sulfide member which is obtained by injection molded direct joining, wherein the polyarylene sulfide member is made of a polyarylene sulfide resin composition which satisfies all of the following (1) to (3): (1) it has a melt crystallization peak temperature of at least 200° C. and at most 230° C., (2) it has an MFR of at least 20 g/10 minutes and at most 150 g/10 minutes, and (3) it comprises 100 parts by weight of a polyarylene sulfide resin (A), from 5 to 25 parts by weight of a modified ethylene copolymer (B) and from 10 to 120 parts by weight of glass fiber (C).

IPC Classes  ?

  • B29C 45/14 - Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mouldApparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
  • B29C 45/16 - Making multilayered or multicoloured articles
  • B29K 23/00 - Use of polyalkenes as moulding material
  • B29K 63/00 - Use of epoxy resins as moulding material
  • B29K 81/00 - Use of polymers having sulfur, with or without nitrogen, oxygen or carbon only, in the main chain, as moulding material
  • B29K 305/02 - Aluminium
  • B29K 305/10 - Copper
  • B29K 305/12 - Iron
  • C08K 3/40 - Glass
  • C08K 7/14 - Glass
  • C08L 23/08 - Copolymers of ethene
  • C08L 23/26 - Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bondCompositions of derivatives of such polymers modified by chemical after-treatment
  • C08L 63/00 - Compositions of epoxy resinsCompositions of derivatives of epoxy resins
  • C08L 81/02 - PolythioethersPolythioether-ethers
  • C08L 91/06 - Waxes

56.

Stretched polyethylene film for lamination

      
Application Number 18281806
Grant Number 12434463
Status In Force
Filing Date 2022-02-18
First Publication Date 2024-09-19
Grant Date 2025-10-07
Owner TOSOH CORPORATION (Japan)
Inventor
  • Kouda, Shingo
  • Nishio, Shoji
  • Suzuki, Kenichi

Abstract

3, and has at least one peak in a range of 135° C. or higher in an endothermic curve as measured by differential scanning calorimetry, the film having high recyclability and excellent in heat resistance.

IPC Classes  ?

  • B32B 27/32 - Layered products essentially comprising synthetic resin comprising polyolefins
  • B32B 7/02 - Physical, chemical or physicochemical properties
  • B32B 27/08 - Layered products essentially comprising synthetic resin as the main or only constituent of a layer next to another layer of a specific substance of synthetic resin of a different kind
  • C08F 10/02 - Ethene
  • C08J 5/18 - Manufacture of films or sheets
  • C08L 23/06 - Polyethene
  • C08L 23/0807 - Copolymers of ethene with unsaturated hydrocarbons only containing four or more carbon atoms

57.

RESIN COMPOSITION FOR ULTRAVIOLET CURING HARD COATING CONTAINING ELECTRICALLY CONDUCTIVE POLYMER AND PRODUCTION METHOD THEREFORE

      
Application Number 18594711
Status Pending
Filing Date 2024-03-04
First Publication Date 2024-09-12
Owner TOSOH CORPORATION (Japan)
Inventor
  • Aoki, Haruka
  • Hayashi, Sadayoshi
  • Yano, Hirokazu
  • Miyake, Hirofumi

Abstract

In regard to a conventionally known resin composition for an antistatic hard coating to which an ionic liquid is added and an antistatic hard coating using it, there is a problem that it is difficult to achieve both an antistatic ability and high hardness. In order to solve the problem, used is a resin composition for an ultraviolet curing hard coating, the resin composition containing: an electrically conductive polymer that contains polythiophene (A) including at least two structural units represented by a specific general formula; an ultraviolet curable resin (B); and a solvent (C).

IPC Classes  ?

  • C08L 41/00 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfurCompositions of derivatives of such polymers
  • C08F 20/06 - Acrylic acidMethacrylic acidMetal salts or ammonium salts thereof
  • C08F 20/32 - Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
  • C08F 20/36 - Esters containing nitrogen containing oxygen in addition to the carboxy oxygen
  • C09D 4/06 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
  • C09D 5/16 - Anti-fouling paintsUnderwater paints
  • C09D 7/63 - Additives non-macromolecular organic
  • C09D 7/65 - Additives macromolecular

58.

Blocked isocyanate composition, production method thereof, curing agent for paint, paint composition and coated film

      
Application Number 18597171
Grant Number 12281193
Status In Force
Filing Date 2024-03-06
First Publication Date 2024-09-12
Grant Date 2025-04-22
Owner TOSOH CORPORATION (Japan)
Inventor
  • Nakashima, Yuji
  • Noguchi, Shuto
  • Ikemoto, Mitsushige

Abstract

A production method of a blocked isocyanate composition, including a step of mixing and reacting a polyisocyanate and an oxime-based blocking agent, in which a ratio of an amount of the oxime-based blocking agent mixed to an amount of the polyisocyanate mixed is 0.91 to 0.99 in terms of an equivalent ratio.

IPC Classes  ?

59.

SINTERED BODY, METHOD FOR PRODUCING THE SAME, AND ORTHODONTIC BRACKET

      
Application Number 18562976
Status Pending
Filing Date 2022-05-25
First Publication Date 2024-09-12
Owner TOSOH CORPORATION (Japan)
Inventor
  • Shimoyama, Tomotaka
  • Kuramoto, Yasunori

Abstract

There are provided a sintered body having both excellent mechanical strength and translucency, a method for producing the same and an orthodontic bracket. There are provided a sintered body having both excellent mechanical strength and translucency, a method for producing the same and an orthodontic bracket. A sintered body, comprising a crystal grain having a cubic domain and a tetragonal domain, a stabilizer and lanthanum being dissolved in zirconia to form a solid solution as a matrix, and the amount of stabilizer contained being 1% or more by mole and 6% or less by mole, in which an average torque strength is 1.00 kgf·cm or more, and an in-line transmittance is 35% or more for visible light having a wavelength of 600 nm at a sample thickness of 1 mm.

IPC Classes  ?

60.

SPINEL-TYPE LITHIUM MANGANESE OXIDE, METHOD FOR PRODUCING THE SAME AND APPLICATIONS THEREOF

      
Application Number 18259076
Status Pending
Filing Date 2021-12-21
First Publication Date 2024-09-12
Owner TOSOH CORPORATION (Japan)
Inventor
  • Suzuki, Naoto
  • Fujii, Yasuhiro
  • Taniguchi, Jun

Abstract

Provided is a lithium secondary battery having excellent charge-discharge cycle performance at high temperatures and having low resistance and high power. A spinel-type lithium manganese oxide including a phosphate, the spinel-type lithium manganese oxide being represented by chemical formula: Li1+XMn2−X−YMYO4 (where 0.02≤X≤0.20, 0.05≤Y≤0.30, and M represents Al or Mg), wherein the volume of pores having a size of 0.6 μm or less is 0.003 cm3/g or more and 0.2 cm3/g or less, and the relative standard deviation of size of secondary particles is 25% or more and 45% or less, a method for producing the spinel-type lithium manganese oxide and applications of the spinel-type lithium manganese oxide.

IPC Classes  ?

  • H01M 4/505 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
  • C01B 25/45 - Phosphates containing plural metal, or metal and ammonium
  • C01G 45/12 - Complex oxides containing manganese and at least one other metal element
  • H01M 4/02 - Electrodes composed of, or comprising, active material
  • H01M 4/58 - Selection of substances as active materials, active masses, active liquids of inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFySelection of substances as active materials, active masses, active liquids of polyanionic structures, e.g. phosphates, silicates or borates

61.

POLYOL BLENDED LIQUID COMPOSITION FOR PRODUCTION OF HYDROCHLOROFLUOROOLEFIN BLOWN POLYURETHANE FOAM, AND ITS APPLICATION

      
Application Number 18560037
Status Pending
Filing Date 2022-05-09
First Publication Date 2024-08-22
Owner TOSOH CORPORATION (Japan)
Inventor
  • Tokumoto, Katsumi
  • Tanaka, Yudai

Abstract

Production of a hydrochlorofluoroolefin-based polyurethane foam using a known amine catalyst, has such problems that a mixed liquid does not quickly start blowing reaction, and dropping may occur in spraying process. Production of a hydrochlorofluoroolefin-based polyurethane foam using a known amine catalyst, has such problems that a mixed liquid does not quickly start blowing reaction, and dropping may occur in spraying process. A polyol blended liquid composition for production of a polyurethane foam, which comprises: (i) a carbonate (A) of an amine compound represented by the following formula (1), (2) or (4), (ii) a blowing agent containing a hydrochlorofluoroolefin (B), and (iii) a polyol (C): Production of a hydrochlorofluoroolefin-based polyurethane foam using a known amine catalyst, has such problems that a mixed liquid does not quickly start blowing reaction, and dropping may occur in spraying process. A polyol blended liquid composition for production of a polyurethane foam, which comprises: (i) a carbonate (A) of an amine compound represented by the following formula (1), (2) or (4), (ii) a blowing agent containing a hydrochlorofluoroolefin (B), and (iii) a polyol (C):

IPC Classes  ?

  • C08J 9/14 - Working-up of macromolecular substances to porous or cellular articles or materialsAfter-treatment thereof using blowing gases generated by a previously added blowing agent by a physical blowing agent organic
  • C08G 18/08 - Processes
  • C08G 18/18 - Catalysts containing secondary or tertiary amines or salts thereof
  • C08G 18/44 - Polycarbonates
  • C08G 101/00 - Manufacture of cellular products

62.

URETHANE RESIN-FORMING COMPOSITION, ADHESIVE AGENT, CURED PRODUCT, AND PRODUCTION METHOD FOR CURED PRODUCT

      
Application Number 18567211
Status Pending
Filing Date 2022-06-08
First Publication Date 2024-08-22
Owner TOSOH CORPORATION (Japan)
Inventor Shinozuka, Yuji

Abstract

A urethane resin-forming composition including: a main agent (A); and a curing agent (B), in which the main agent (A) contains an isocyanate group-terminated prepolymer (A-1) which is a reaction product of a component (a) containing a polyol (a-1) having a number average molecular weight of 2,500 or more and a polyisocyanate (a-2), the curing agent (B) contains at least one diol (B-1) selected from the group consisting of an aliphatic diol and an alicyclic diol, and a diol (B-2) represented by Formula (1) below, and at least one of the component (a) and the curing agent (B) contains a polyfunctional component. A urethane resin-forming composition including: a main agent (A); and a curing agent (B), in which the main agent (A) contains an isocyanate group-terminated prepolymer (A-1) which is a reaction product of a component (a) containing a polyol (a-1) having a number average molecular weight of 2,500 or more and a polyisocyanate (a-2), the curing agent (B) contains at least one diol (B-1) selected from the group consisting of an aliphatic diol and an alicyclic diol, and a diol (B-2) represented by Formula (1) below, and at least one of the component (a) and the curing agent (B) contains a polyfunctional component. A urethane resin-forming composition including: a main agent (A); and a curing agent (B), in which the main agent (A) contains an isocyanate group-terminated prepolymer (A-1) which is a reaction product of a component (a) containing a polyol (a-1) having a number average molecular weight of 2,500 or more and a polyisocyanate (a-2), the curing agent (B) contains at least one diol (B-1) selected from the group consisting of an aliphatic diol and an alicyclic diol, and a diol (B-2) represented by Formula (1) below, and at least one of the component (a) and the curing agent (B) contains a polyfunctional component. [In the formula, L is a trivalent group consisting of one or more atoms selected from the group consisting of a carbon atom, a hydrogen atom, a nitrogen atom, and an oxygen atom, and R is a group having at least one ring structure selected from the group consisting of an alicyclic structure, an aromatic ring, and a heterocyclic ring.]

IPC Classes  ?

  • C09J 175/08 - Polyurethanes from polyethers
  • C08G 18/12 - Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step using two or more compounds having active hydrogen in the first polymerisation step
  • C08G 18/32 - Polyhydroxy compoundsPolyaminesHydroxy amines

63.

IRIDIUM-MANGANESE OXIDE COMPOSITE MATERIAL, IRIDIUM-MANGANESE OXIDE COMPOSITE ELECTRODE MATERIAL AND METHODS FOR PRODUCING THE SAME

      
Application Number 18569341
Status Pending
Filing Date 2022-06-13
First Publication Date 2024-08-22
Owner
  • RIKEN (Japan)
  • TOSOH CORPORATION (Japan)
Inventor
  • Nakamura, Ryuhei
  • Kong, Shuang
  • Li, Ailong
  • Fushimi, Kazuna
  • Suetsugu, Kazumasa
  • Okada, Takuya

Abstract

Provided are an iridium-manganese oxide composite material and an iridium-manganese oxide composite electrode material that are inexpensive and have high catalytic activity for use in an anode catalyst for oxygen evolution associated with water electrolysis. Also provided are methods for producing the same. An iridium-manganese oxide composite material includes a manganese oxide and iridium distributed on at least a surface of the manganese oxide, the iridium having a metal valence of 3.1 or greater and 3.8 or less. An iridium-manganese oxide composite electrode material includes a conductive substrate formed of a fiber, with the iridium-manganese oxide composite material being coated on at least a portion of the conductive substrate.

IPC Classes  ?

  • C25B 11/093 - Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalysts material consisting of at least one catalytic element and at least one catalytic compoundElectrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalysts material consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
  • C25B 1/04 - Hydrogen or oxygen by electrolysis of water
  • C25B 1/21 - Manganese oxides
  • C25B 9/23 - Cells comprising dimensionally-stable non-movable electrodesAssemblies of constructional parts thereof with diaphragms comprising ion-exchange membranes in or on which electrode material is embedded
  • C25D 9/04 - Electrolytic coating other than with metals with inorganic materials

64.

STACKED STRUCTURE AND GALLIUM NITRIDE-BASED SEMICONDUCTOR DEVICE

      
Application Number 18647501
Status Pending
Filing Date 2024-04-26
First Publication Date 2024-08-22
Owner
  • Japan Display Inc. (Japan)
  • TOSOH CORPORATION (Japan)
Inventor
  • Nishimura, Masumi
  • Tsubuku, Masashi
  • Ueoka, Yoshihiro
  • Suemoto, Yuya
  • Mesuda, Masami

Abstract

A stacked structure includes an amorphous substrate, a buffer layer on the amorphous substrate, and a gallium nitride-based semiconductor layer on the buffer layer. The gallium nitride-based semiconductor layer includes at least one gallium nitride layer, and an oxygen concentration of the gallium nitride layer is less than 1×1021/cm3.

IPC Classes  ?

  • H01L 33/32 - Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
  • H01L 33/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof
  • H01L 33/12 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof characterised by the semiconductor bodies with a stress relaxation structure, e.g. buffer layer
  • H01L 33/16 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous

65.

POLYCARBONATE DIOL, URETHANE RESIN, AND COATING AGENT

      
Application Number 18439596
Status Pending
Filing Date 2024-02-12
First Publication Date 2024-08-22
Owner TOSOH CORPORATION (Japan)
Inventor Honda, Kohei

Abstract

A polycarbonate diol having a repeating unit (A) of a carbonate structure, and containing terminal hydroxyl groups, wherein 90 to 100 mol % of the repeating unit (A) is a repeating unit (B) of a 3-methylpentan-1,5-diyl group-containing carbonate structure and/or a repeating unit (C) of a 1,6-hexanediyl group-containing carbonate structure, the polycarbonate diol contains a polycarbonate diol (D) represented by the following formula (D), a number average molecular weight calculated from a hydroxyl value of the polycarbonate diol is 300 to 2800 g/mol, and in an LC spectrum measured for the polycarbonate diol, when X0 represents the number of repeating units of the polycarbonate diol (D) corresponding to a peak of molecular weight closest to the above number average molecular weight, the number of consecutive peaks at each of which a peak area value ratio to an area value of the peak at which the number of repeating units is X0 is 0.90 to 1.10 is 2 to 7, including the peak at which the number of repeating units is X0, A polycarbonate diol having a repeating unit (A) of a carbonate structure, and containing terminal hydroxyl groups, wherein 90 to 100 mol % of the repeating unit (A) is a repeating unit (B) of a 3-methylpentan-1,5-diyl group-containing carbonate structure and/or a repeating unit (C) of a 1,6-hexanediyl group-containing carbonate structure, the polycarbonate diol contains a polycarbonate diol (D) represented by the following formula (D), a number average molecular weight calculated from a hydroxyl value of the polycarbonate diol is 300 to 2800 g/mol, and in an LC spectrum measured for the polycarbonate diol, when X0 represents the number of repeating units of the polycarbonate diol (D) corresponding to a peak of molecular weight closest to the above number average molecular weight, the number of consecutive peaks at each of which a peak area value ratio to an area value of the peak at which the number of repeating units is X0 is 0.90 to 1.10 is 2 to 7, including the peak at which the number of repeating units is X0, A polycarbonate diol having a repeating unit (A) of a carbonate structure, and containing terminal hydroxyl groups, wherein 90 to 100 mol % of the repeating unit (A) is a repeating unit (B) of a 3-methylpentan-1,5-diyl group-containing carbonate structure and/or a repeating unit (C) of a 1,6-hexanediyl group-containing carbonate structure, the polycarbonate diol contains a polycarbonate diol (D) represented by the following formula (D), a number average molecular weight calculated from a hydroxyl value of the polycarbonate diol is 300 to 2800 g/mol, and in an LC spectrum measured for the polycarbonate diol, when X0 represents the number of repeating units of the polycarbonate diol (D) corresponding to a peak of molecular weight closest to the above number average molecular weight, the number of consecutive peaks at each of which a peak area value ratio to an area value of the peak at which the number of repeating units is X0 is 0.90 to 1.10 is 2 to 7, including the peak at which the number of repeating units is X0, wherein R1 represents —(CH2)6— or —CH2CH2CH(CH3)CH2CH2—.

IPC Classes  ?

66.

URETHANE RESIN-FORMING COMPOSITION, ADHESIVE AGENT, CURED PRODUCT, AND PRODUCTION METHOD FOR CURED PRODUCT

      
Application Number 18567334
Status Pending
Filing Date 2022-06-08
First Publication Date 2024-08-15
Owner TOSOH CORPORATION (Japan)
Inventor Shinozuka, Yuji

Abstract

A urethane resin-forming composition including: a main agent (A); and a curing agent (B), in which the main agent (A) contains an isocyanate group-terminated prepolymer (A-1) which is a reaction product of a component (a) containing one or more polyols (a-1) selected from the group consisting of a polyether polyol (a-1-1) and a polycarbonate polyol (a-1-2) and a polyisocyanate (a-2), the curing agent (B) contains an alicyclic diol (B-1), and the urethane resin-forming composition forms a urethane resin having a urethane group concentration of 2,800 mmol/kg or more.

IPC Classes  ?

  • C09J 175/04 - Polyurethanes
  • C08G 18/10 - Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
  • C08G 18/32 - Polyhydroxy compoundsPolyaminesHydroxy amines
  • C08G 18/42 - Polycondensates having carboxylic or carbonic ester groups in the main chain
  • C08G 18/44 - Polycarbonates
  • C08G 18/48 - Polyethers
  • C08G 18/76 - Polyisocyanates or polyisothiocyanates cyclic aromatic

67.

POLYARYLENE SULFIDE COMPOSITION

      
Application Number 18291077
Status Pending
Filing Date 2022-07-13
First Publication Date 2024-08-01
Owner TOSOH CORPORATION (Japan)
Inventor
  • Yamamoto, Nobuhiro
  • Yamano, Naoki

Abstract

A polyarylene sulfide composition having excellent mechanical characteristics, acid resistance and heat/cold resistance is provided. A polyarylene sulfide composition comprising from 30 to 70 wt % of polyarylene sulfide (A), from 2 to 10 wt % of an ethylene polymer (B) and from 20 to 60 wt % of glass fiber (C), wherein the glass fiber (C) has a boron oxide content of at most 1.5 wt % and a fluorine content of at most 0.1 wt %.

IPC Classes  ?

  • C08L 81/02 - PolythioethersPolythioether-ethers
  • C08K 5/20 - Carboxylic acid amides
  • C08K 7/14 - Glass
  • C08L 23/08 - Copolymers of ethene
  • C08L 23/26 - Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bondCompositions of derivatives of such polymers modified by chemical after-treatment
  • C08L 91/06 - Waxes

68.

MANUFACTURING METHOD OF 1,4-DIOXANE DERIVATIVE, 1,4-DIOXANE DERIVATIVE, COMPOSITION CONTAINING 1,4-DIOXANE DERIVATIVE, AND MANUFACTURING METHOD OF (1,3-DIOXOLANE)-2- CARBOXYLIC ACID DERIVATIVE, (1,3-DIOXOLANE)-2-CARBOXYLIC ACID DERIVATIVE, AND COMPOSITION CONTAINING (1,3-DIOXOLANE)-2-CARBOXYLIC ACID DERIVATIVE

      
Application Number 18562005
Status Pending
Filing Date 2022-05-16
First Publication Date 2024-07-25
Owner
  • TOSOH CORPORATION (Japan)
  • TOSOH FINECHEM CORPORATION (Japan)
  • SAGAMI CHEMICAL RESEARCH INSTITUTE (Japan)
Inventor
  • Inoue, Munenori
  • Ueji, Tatsuya
  • Sesoko, Yusuke
  • Adachi, Hiroaki
  • Inoue, Daisuke

Abstract

The manufacturing method of the 1,4-dioxane derivative represented by Formula (2) and/or Formula (10) includes reacting water, an inorganic base, and a fluoroalkene oxide represented by Formula (1). The manufacturing method of the (1,3-dioxolane)-2-carboxylic acid derivative includes manufacturing the 1,4-dioxane derivative represented by Formula (2) and/or Formula (10) by the above manufacturing method and a manufacturing method of the (1,3-dioxolane)-2-carboxylic acid derivative includes manufacturing the 1,4-dioxane derivative represented by Formula (2) and/or Formula (10) comprising ring reduction under heating. In Formula (1), R represents a fluorine atom or a fluoroalkyl group. In Formula (2) and in Formula (10), R represents a fluorine atom or a fluoroalkyl group, two R's present are the same as or different from each other, and M′+ represents a counter cation. The manufacturing method of the 1,4-dioxane derivative represented by Formula (2) and/or Formula (10) includes reacting water, an inorganic base, and a fluoroalkene oxide represented by Formula (1). The manufacturing method of the (1,3-dioxolane)-2-carboxylic acid derivative includes manufacturing the 1,4-dioxane derivative represented by Formula (2) and/or Formula (10) by the above manufacturing method and a manufacturing method of the (1,3-dioxolane)-2-carboxylic acid derivative includes manufacturing the 1,4-dioxane derivative represented by Formula (2) and/or Formula (10) comprising ring reduction under heating. In Formula (1), R represents a fluorine atom or a fluoroalkyl group. In Formula (2) and in Formula (10), R represents a fluorine atom or a fluoroalkyl group, two R's present are the same as or different from each other, and M′+ represents a counter cation.

IPC Classes  ?

  • C07D 319/10 - 1,4-DioxanesHydrogenated 1,4-dioxanes
  • C07D 317/32 - Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms

69.

TRANSVERSE CURRENT SUPPRESSING MATERIAL, CARBAZOLE COMPOUND, HOLE-INJECTION LAYER AND ORGANIC ELECTROLUMINESCENT ELEMENT

      
Application Number 18285084
Status Pending
Filing Date 2022-03-31
First Publication Date 2024-07-25
Owner TOSOH CORPORATION (Japan)
Inventor
  • Hirano, Masaya
  • Matsumoto, Naoki
  • Shinya, Hirokazu
  • Nomura, Shintaro
  • Kawashima, Hiroyuki
  • Koike, Kenji

Abstract

There is provided a transverse current suppressing material that suppresses a transverse current of an organic electroluminescent element, a carbazole compound, a hole-injection layer containing the transverse current suppressing material and the carbazole compound and an organic electroluminescent element that has good drive voltage, luminous efficiency and durability and has a lower transverse current. A transverse current suppressing material for an organic electroluminescent element, represented by the formula (1) [In the formula (1), A is represented by the formula (2) or (3), and B is represented by the formula (4)]. There is provided a transverse current suppressing material that suppresses a transverse current of an organic electroluminescent element, a carbazole compound, a hole-injection layer containing the transverse current suppressing material and the carbazole compound and an organic electroluminescent element that has good drive voltage, luminous efficiency and durability and has a lower transverse current. A transverse current suppressing material for an organic electroluminescent element, represented by the formula (1) [In the formula (1), A is represented by the formula (2) or (3), and B is represented by the formula (4)].

IPC Classes  ?

  • H10K 85/60 - Organic compounds having low molecular weight
  • C07D 209/88 - CarbazolesHydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
  • C07D 405/04 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring- member bond
  • C07D 405/10 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
  • C07D 405/12 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
  • C07D 405/14 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
  • C07D 409/04 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring- member bond
  • C07D 409/10 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing aromatic rings
  • C07D 409/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
  • C07D 409/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
  • C09K 11/06 - Luminescent, e.g. electroluminescent, chemiluminescent, materials containing organic luminescent materials
  • H10K 50/15 - Hole transporting layers
  • H10K 50/17 - Carrier injection layers
  • H10K 85/40 - Organosilicon compounds, e.g. TIPS pentacene

70.

FUMARIC ACID DIESTER RESIN, FILM AND POLARIZING PLATE

      
Application Number 18552950
Status Pending
Filing Date 2022-03-28
First Publication Date 2024-07-18
Owner TOSOH CORPORATION (Japan)
Inventor
  • Yoshimura, Asuka
  • Komine, Takuya
  • Sakashita, Ryuichi
  • Ichijo, Hiroki

Abstract

The present invention provides a resin which has low wavelength dispersion R450/R550 and is capable of improving the viewing angle characteristics and contrast over a wide wavelength range; and a film which uses this resin. A fumaric acid diester resin according to the present invention contains a fumaric acid diester residue unit that is represented by formula (1) and a (meth)acrylic acid ester residue unit that is represented by formula (2). The present invention provides a resin which has low wavelength dispersion R450/R550 and is capable of improving the viewing angle characteristics and contrast over a wide wavelength range; and a film which uses this resin. A fumaric acid diester resin according to the present invention contains a fumaric acid diester residue unit that is represented by formula (1) and a (meth)acrylic acid ester residue unit that is represented by formula (2).

IPC Classes  ?

  • C08F 222/10 - Esters
  • C08F 226/02 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a single or double bond to nitrogen
  • C08F 226/06 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
  • C08J 5/18 - Manufacture of films or sheets
  • G02B 5/30 - Polarising elements

71.

CELL CULTURE SUBSTRATE AND METHOD FOR PRODUCING SAME, METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELL, AND CELL CULTURE KIT

      
Application Number 18287964
Status Pending
Filing Date 2022-04-20
First Publication Date 2024-07-04
Owner TOSOH CORPORATION (Japan)
Inventor
  • Imaizumi, Yu
  • Kadota, Junpei
  • Kuno, Goshi

Abstract

A cell culture substrate including: a substrate; and a layer containing hydrophilic polymer with a layer thickness of 5 to 2,000 nm covering at least a part of a surface of the substrate, in which the hydrophilic polymer contain a phosphorylcholine group or a hydroxyl group, the cell culture substrate has regions (A) below and regions (B) below, and an unevenness height at a boundary between each of the regions (A) and each of the regions (B) is 1 to 500 nm. (A): Island-shaped region of 0.001 to 5 mm2 in area with cell adhesiveness and cell proliferation properties (B): Region which is adjacent to region (A) and has no cell adhesiveness or cell proliferation properties

IPC Classes  ?

  • C12N 5/00 - Undifferentiated human, animal or plant cells, e.g. cell linesTissuesCultivation or maintenance thereofCulture media therefor

72.

MANUFACTURING METHOD OF SINTERED BODY

      
Application Number 18288202
Status Pending
Filing Date 2022-04-25
First Publication Date 2024-07-04
Owner TOSOH CORPORATION (Japan)
Inventor
  • Ushio, Yuki
  • Fujisaki, Hiroyuki
  • Higuchi, Yuya
  • Nagayama, Hitoshi

Abstract

Provided is a method for manufacturing a sintered body that uses atmospheric pressure sintering in an atmospheric atmosphere and allows the time required for sintering to be reduced. Provided is a method for manufacturing a sintered body that uses atmospheric pressure sintering in an atmospheric atmosphere and allows the time required for sintering to be reduced. The method for manufacturing the sintered body includes subjecting a sintered body of zirconia containing a coloring element to heat treatment at 600° C. or higher and 1200° C. or lower.

IPC Classes  ?

  • C04B 35/488 - Composites
  • C04B 35/645 - Pressure sintering
  • C04B 41/00 - After-treatment of mortars, concrete, artificial stone or ceramicsTreatment of natural stone

73.

ZIRCONIA LAYERED BODY

      
Application Number 18603813
Status Pending
Filing Date 2024-03-13
First Publication Date 2024-06-27
Owner TOSOH CORPORATION (Japan)
Inventor
  • Ushio, Yuki
  • Ito, Akiko
  • Azechi, Sho
  • Fujisaki, Hiroyuki

Abstract

A layered body, which has a change in texture derived from zirconia, particularly a change in translucency and is suitable as a dental prosthetic member, a precursor thereof, or a method for producing these. The layered body has a structure in which two or more layers containing zirconia containing a stabilizer are layered, the layered body including at least: a first layer containing zirconia having a stabilizer content of higher than or equal to 4 mol %; and a second layer containing zirconia having a stabilizer content different from that of the zirconia contained in the first layer. At least a first layer and a second layer contain an element having a function of coloring zirconia and the content or the type of the element having a function of coloring zirconia in the first layer is different from the element having a function of coloring zirconia in the second layer.

IPC Classes  ?

74.

DEODORANT COMPOSITION AND DEODORANT ARTICLE

      
Application Number 18551344
Status Pending
Filing Date 2022-03-24
First Publication Date 2024-06-20
Owner
  • TOSOH CORPORATION (Japan)
  • SAGAMI CHEMICAL RESEARCH INSTITUTE (Japan)
Inventor
  • Tsuboi, Yuki
  • Nakashima, Ryohei
  • Nakamura, Takumu
  • Sudo, Yukinori
  • Kobayashi, Osamu
  • Omata, Daichi
  • Fukawa, Marina

Abstract

A deodorant composition which can remove aldehydes more effectively than conventional aldehyde scavengers even after rinsing with water or washings is provided. A deodorant composition comprising a support having chemically bonded aminooxyalkyl groups and a binder resin.

IPC Classes  ?

  • B01J 20/22 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising organic material
  • A61L 9/014 - Deodorant compositions containing sorbent material, e.g. activated carbon
  • B01J 20/10 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
  • B01J 20/28 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof characterised by their form or physical properties
  • B01J 20/32 - Impregnating or coating

75.

MULTILAYER FILM STRUCTURE AND METHOD FOR PRODUCING THE SAME

      
Application Number 18553843
Status Pending
Filing Date 2022-04-01
First Publication Date 2024-06-13
Owner TOSOH CORPORATION (Japan)
Inventor
  • Ueoka, Yoshihiro
  • Suemoto, Yuya
  • Mesuda, Masami

Abstract

A multilayer film structure includes a SiC substrate and a film disposed on the SiC substrate and containing a nitride-based material at least containing Ga, wherein the multilayer film structure has an off-angle of 0.03° or more and 8° or less with respect to a Silicon face of a (0001) plane of a SiC single crystal forming the SiC substrate and the film containing the nitride-based material has a C content of 2×1019 atoms/cm3 or less and a Cl content of 2×1018 atoms/cm3 or less.

IPC Classes  ?

  • H01L 33/32 - Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
  • H01L 33/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof
  • H01L 33/16 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous

76.

FLUORINE RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, AND ELECTRONIC DEVICE PROVIDED THEREWITH

      
Application Number 18552780
Status Pending
Filing Date 2022-03-25
First Publication Date 2024-06-06
Owner TOSOH CORPORATION (Japan)
Inventor
  • Lee, Junghwi
  • Fukuda, Takashi
  • Oku, Shinya

Abstract

Provided is a fluorine-based resin that has liquid-repellency and high solubility in a fluorine-based solvent, and becomes insoluble in the solvent by photocrosslinking at low light exposure intensity. A fluorine-based resin of the present invention includes: a repeating unit that is represented by Formula (1) including a photocrosslinkable group; and a repeating unit that includes a fluorine atom, Provided is a fluorine-based resin that has liquid-repellency and high solubility in a fluorine-based solvent, and becomes insoluble in the solvent by photocrosslinking at low light exposure intensity. A fluorine-based resin of the present invention includes: a repeating unit that is represented by Formula (1) including a photocrosslinkable group; and a repeating unit that includes a fluorine atom, where R1 represents hydrogen or methyl, L1 represents a single bond or a linking group, A represents a linking group, and R2 through R6 represent one selected from the group consisting of hydrogen, halogen, alkyl, alkyl halide, alkoxy, aryl, aryloxy, cyano, and amino.

IPC Classes  ?

  • C08F 220/22 - Esters containing halogen
  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable

77.

CR-SI FILM

      
Application Number 18552439
Status Pending
Filing Date 2022-03-25
First Publication Date 2024-05-30
Owner TOSOH CORPORATION (Japan)
Inventor
  • Hara, Hiroyuki
  • Mesuda, Masami
  • Masuda, Ayaka

Abstract

A Cr—Si film contains chromium (Cr) and silicon (Si). In the Cr—Si film, a composition range of the film is Cr/(Cr+Si)=0.25 to 0.75, and absolute values of TCR in increments of 10° C. in a temperature range of 40° C. to 150° C. are each 0 ppm/° C. or more and 100 ppm/° C. or less.

IPC Classes  ?

  • C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C 14/34 - Sputtering

78.

THERMOPLASTIC RESIN, THERMOSETTING RESIN, LIQUID DISPERSION COMPOSITIONS, LAMINATES FOR POLYMER ELECTROLYTE FUEL CELL, AND METHODS FOR MANUFACTURING LAMINATE FOR POLYMER ELECTROLYTE FUEL CELL

      
Application Number 18552896
Status Pending
Filing Date 2022-03-23
First Publication Date 2024-05-23
Owner TOSOH CORPORATION (Japan)
Inventor
  • Miyazawa, Atsushi
  • Ozaki, Sou
  • Togo, Eiichi
  • Inoue, Hiroshi

Abstract

A thermoplastic resin (thermosetting resin) for forming a microporous layer of a polymer electrolyte fuel cell has a melt viscosity at 350° C. of less than or equal to 200 Pa·s. In an instance where 2 g of the thermoplastic resin (thermosetting resin) is immersed in 100 ml of hot water having a temperature of 100° C. for 6 hours, an amount of metal ions dissolved from the thermoplastic resin (thermosetting resin) is less than or equal to 65 ppm.

IPC Classes  ?

  • H01M 8/1067 - Polymeric electrolyte materials characterised by their physical properties, e.g. porosity, ionic conductivity or thickness
  • H01M 8/04119 - Arrangements for control of reactant parameters, e.g. pressure or concentration of gaseous reactants with simultaneous supply or evacuation of electrolyteHumidifying or dehumidifying
  • H01M 8/1032 - Polymeric electrolyte materials characterised by the chemical structure of the main chain of the ion-conducting polymer having sulfur, e.g. sulfonated-polyethersulfones [S-PES]
  • H01M 8/1046 - Mixtures of at least one polymer and at least one additive
  • H01M 8/1053 - Polymer electrolyte composites, mixtures or blends consisting of layers of polymers with at least one layer being ionically conductive
  • H01M 8/1081 - Polymeric electrolyte materials characterised by the manufacturing processes starting from solutions, dispersions or slurries exclusively of polymers

79.

Multilayer film structure and method for producing same

      
Application Number 17772972
Grant Number 12247297
Status In Force
Filing Date 2020-10-27
First Publication Date 2024-05-16
Grant Date 2025-03-11
Owner
  • TOSOH CORPORATION (Japan)
  • National Institute for Materials Science (Japan)
Inventor
  • Tsuchida, Yuya
  • Suemoto, Yuya
  • Ueoka, Yoshihiro
  • Mesuda, Masami
  • Kuramochi, Hideto
  • Nagata, Takahiro
  • Sang, Liwen
  • Chikyow, Toyohiro

Abstract

The present invention provides: a multilayer film structure which has high crystallinity and planarity; and a method for producing this multilayer film structure. This multilayer film structure is provided with: an Si (111) substrate; a first thin film that is arranged on the Si (111) substrate, while being formed of a nitride material and/or aluminum; and a second thin film that is arranged on the first thin film, while being formed of a nitride material. An amorphous layer having a thickness of 0 nm or more but less than 1.0 nm are present on the Si (111) substrate; and the full width at half maximum (FWHM) of a rocking curve of the (0002) plane at the surface of this multilayer film structure is 1.50° or less.

IPC Classes  ?

  • H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
  • C23C 14/00 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C 14/02 - Pretreatment of the material to be coated
  • C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C 14/34 - Sputtering
  • C23C 14/35 - Sputtering by application of a magnetic field, e.g. magnetron sputtering
  • C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
  • C30B 23/02 - Epitaxial-layer growth
  • C30B 25/06 - Epitaxial-layer growth by reactive sputtering
  • C30B 25/18 - Epitaxial-layer growth characterised by the substrate
  • C30B 29/40 - AIIIBV compounds
  • C30B 29/68 - Crystals with laminate structure, e.g. "superlattices"
  • H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
  • H01L 29/205 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds in different semiconductor regions
  • H01L 33/32 - Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
  • H01S 5/02 - Structural details or components not essential to laser action

80.

TEMPERATURE-RESPONSIVE POLYMER SURFACE TREATMENT AGENT

      
Application Number 18284133
Status Pending
Filing Date 2022-03-23
First Publication Date 2024-05-16
Owner TOSOH CORPORATION (Japan)
Inventor
  • Jido, Yumiko
  • Hiratoko, Shoya
  • Imatomi, Shinya
  • Ito, Hiroyuki

Abstract

Provided are a temperature-responsive polymer surface treatment agent containing: a temperature-responsive polymer; and a cell-adhesive polymer including a monomer having a functional group exhibiting acidity and a monomer having a HLB value (a Griffin's method) in a range of 0 to 5.0, and a temperature-responsive cell culture substrate obtained by covering a substrate with the temperature-responsive polymer surface treatment agent, in which cell adhesiveness and cell recovery by a cooling treatment are compatible.

IPC Classes  ?

  • C12M 1/12 - Apparatus for enzymology or microbiology with sterilisation, filtration, or dialysis means
  • C08J 5/18 - Manufacture of films or sheets
  • C08L 53/00 - Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bondsCompositions of derivatives of such polymers

81.

SURFACE TREATMENT AGENT

      
Application Number 18284359
Status Pending
Filing Date 2022-03-23
First Publication Date 2024-05-16
Owner TOSOH CORPORATION (Japan)
Inventor
  • Nezu, Yusuke
  • Imatomi, Shinya
  • Chinson, Shimou
  • Ito, Hiroyuki

Abstract

It is possible to provide a surface treatment agent containing a cell-adhesive polymer, by a surface treatment agent obtained by dissolving a water-insoluble polymer compound including constituents of (A) a monomer having a functional group exhibiting acidity and (B) a monomer having a HLB value (a Griffin's method) in a range of 0 to 5.0, in which a ratio of (A) is 10 to 50 mol %, and a solvent is an alcoholic solvent.

IPC Classes  ?

  • C09D 125/08 - Copolymers of styrene
  • C09D 133/02 - Homopolymers or copolymers of acidsMetal or ammonium salts thereof

82.

FLUORORESIN

      
Application Number 18394049
Status Pending
Filing Date 2023-12-22
First Publication Date 2024-05-16
Owner TOSOH CORPORATION (Japan)
Inventor
  • Sakaguchi, Kota
  • Iwanaga, Kazunari
  • Shimono, Tomoya
  • Nagai, Tomonari
  • Yamakawa, Hiroshi

Abstract

A fluororesin that includes a residue unit represented by formula (1), and a terminal group represented by formula (2); and a fluororesin that includes a residue unit represented by formula (1) and has a transmittance of 50% or more measured at an optical path length of 10 mm and a wavelength of 275 nm when dissolved in perfluorohexane to produce a 10 wt % perfluorohexane solution. In formula (1): Rf1, Rf2, Rf3, and Rf4 each independently represent one selected from the group consisting of fluorine atoms, C1-7 linear perfluoroalkyl groups, C3-7 branched perfluoroalkyl groups, or C3-7 cyclic perfluoroalkyl groups; the perfluoroalkyl groups may have an etheric oxygen atom; Rf1, Rf2, Rf3, and Rf4 may bond to each other to form a ring having 4 to 8 carbon atoms; and the ring may include an etheric oxygen atom. In formula (2), i is an integer of 3-20. A fluororesin that includes a residue unit represented by formula (1), and a terminal group represented by formula (2); and a fluororesin that includes a residue unit represented by formula (1) and has a transmittance of 50% or more measured at an optical path length of 10 mm and a wavelength of 275 nm when dissolved in perfluorohexane to produce a 10 wt % perfluorohexane solution. In formula (1): Rf1, Rf2, Rf3, and Rf4 each independently represent one selected from the group consisting of fluorine atoms, C1-7 linear perfluoroalkyl groups, C3-7 branched perfluoroalkyl groups, or C3-7 cyclic perfluoroalkyl groups; the perfluoroalkyl groups may have an etheric oxygen atom; Rf1, Rf2, Rf3, and Rf4 may bond to each other to form a ring having 4 to 8 carbon atoms; and the ring may include an etheric oxygen atom. In formula (2), i is an integer of 3-20. A fluororesin that includes a residue unit represented by formula (1), and a terminal group represented by formula (2); and a fluororesin that includes a residue unit represented by formula (1) and has a transmittance of 50% or more measured at an optical path length of 10 mm and a wavelength of 275 nm when dissolved in perfluorohexane to produce a 10 wt % perfluorohexane solution. In formula (1): Rf1, Rf2, Rf3, and Rf4 each independently represent one selected from the group consisting of fluorine atoms, C1-7 linear perfluoroalkyl groups, C3-7 branched perfluoroalkyl groups, or C3-7 cyclic perfluoroalkyl groups; the perfluoroalkyl groups may have an etheric oxygen atom; Rf1, Rf2, Rf3, and Rf4 may bond to each other to form a ring having 4 to 8 carbon atoms; and the ring may include an etheric oxygen atom. In formula (2), i is an integer of 3-20.

IPC Classes  ?

83.

SODIUM TITANIUM PHOSPHATE SALT AND USE THEREOF

      
Application Number 18281024
Status Pending
Filing Date 2022-03-02
First Publication Date 2024-05-09
Owner
  • YAMAGUCHI UNIVERSITY (Japan)
  • TOSOH CORPORATION (Japan)
Inventor
  • Kitajou, Ayuko
  • Yamashita, Maho
  • Okada, Masaki
  • Kobayashi, Wataru
  • Takahara, Toshiya

Abstract

Provided are a sodium titanium phosphate salt and, additionally, at least one of a negative electrode active material that gives a sodium secondary battery having superior power characteristics as compared to conventional aqueous sodium secondary batteries and a sodium secondary battery including such a negative electrode active material. In particular, provided is a negative electrode active material that gives an aqueous sodium secondary battery having superior power characteristics as compared to conventional aqueous sodium secondary batteries including NASICON type NaTi2(PO4)3 as a negative electrode active material. Provided are a sodium titanium phosphate salt and, additionally, at least one of a negative electrode active material that gives a sodium secondary battery having superior power characteristics as compared to conventional aqueous sodium secondary batteries and a sodium secondary battery including such a negative electrode active material. In particular, provided is a negative electrode active material that gives an aqueous sodium secondary battery having superior power characteristics as compared to conventional aqueous sodium secondary batteries including NASICON type NaTi2(PO4)3 as a negative electrode active material. A sodium titanium phosphate salt represented by the general formula Na1+xTi2(PO4)3 (where 0≤x≤2) includes a surface layer containing Na5Ti(PO4)3.

IPC Classes  ?

  • H01M 4/58 - Selection of substances as active materials, active masses, active liquids of inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFySelection of substances as active materials, active masses, active liquids of polyanionic structures, e.g. phosphates, silicates or borates
  • C01B 25/45 - Phosphates containing plural metal, or metal and ammonium
  • H01M 4/36 - Selection of substances as active materials, active masses, active liquids
  • H01M 10/36 - Accumulators not provided for in groups

84.

FLUORORESIN, AND METHOD FOR PRODUCING SAME

      
Application Number 18406542
Status Pending
Filing Date 2024-01-08
First Publication Date 2024-05-02
Owner TOSOH CORPORATION (Japan)
Inventor
  • Sakaguchi, Kota
  • Shimono, Tomoya
  • Nagai, Tomonari
  • Iwanaga, Kazunari
  • Yumino, Shohei
  • Tanabiki, Masao
  • Doi, Toru

Abstract

A fluororesin including a residue unit of formula (1) and having a haze value equal to 2% or less of a heat-press molded product (thickness 1 mm) with a small haze value of a melt-molded product and a method for producing the same, A fluororesin including a residue unit of formula (1) and having a haze value equal to 2% or less of a heat-press molded product (thickness 1 mm) with a small haze value of a melt-molded product and a method for producing the same, A fluororesin including a residue unit of formula (1) and having a haze value equal to 2% or less of a heat-press molded product (thickness 1 mm) with a small haze value of a melt-molded product and a method for producing the same, Rf1, Rf2, Rf3 and Rf4 each independently represent one of the groups consisting of a fluorine atom, a linear perfluoroalkyl group having 1 to 7 carbon atoms, a branched perfluoroalkyl group having 3 to 7 carbon atoms, and a cyclic perfluoroalkyl group having 3 to 7 carbon atoms, the perfluoroalkyl group may have an ethereal oxygen atom, Rf1, Rf2, Rf3 and Rf4 may be linked to each other to form a ring having 4 or more and 8 or less carbon atoms, and the ring may include an ethereal oxygen atom.

IPC Classes  ?

  • C08F 124/00 - Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
  • C08J 3/14 - Powdering or granulating by precipitation from solutions

85.

Metal member-polyarylene sulfide resin member complex and production method therefor

      
Application Number 18279106
Grant Number 12409589
Status In Force
Filing Date 2022-02-08
First Publication Date 2024-05-02
Grant Date 2025-09-09
Owner TOSOH CORPORATION (Japan)
Inventor
  • Harunari, Takeshi
  • Yamano, Naoki

Abstract

A metal member—polyarylene sulfide resin member complex superior in airtightness between the metal member and the polyarylene sulfide (PAS) resin member and a production method therefor, in which the complex comprises a metal member and a PAS member combined together into a one-piece shaped article by injection molding and satisfies conditions 1) and 2) as described, and the PAS resin member contains a PAS resin and a modified ethylene copolymer.

IPC Classes  ?

  • B29C 45/14 - Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mouldApparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
  • B29C 45/00 - Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mouldApparatus therefor
  • B29C 65/00 - Joining of preformed partsApparatus therefor
  • B29K 23/00 - Use of polyalkenes as moulding material
  • B29K 81/00 - Use of polymers having sulfur, with or without nitrogen, oxygen or carbon only, in the main chain, as moulding material
  • B29L 31/00 - Other particular articles
  • B29L 31/30 - Vehicles, e.g. ships or aircraft, or body parts thereof
  • C08G 75/0254 - Preparatory processes using metal sulfides
  • C08L 23/0869 - Copolymers of ethene with unsaturated hydrocarbons containing atoms other than carbon or hydrogen with unsaturated acids, e.g. [meth]acrylic acidCopolymers of ethene with unsaturated hydrocarbons containing atoms other than carbon or hydrogen with unsaturated esters, e.g. [meth]acrylic acid esters

86.

NONFLAMMABLE LIQUID COMPOSITION AND ITS APPLICATIONS

      
Application Number 18272724
Status Pending
Filing Date 2022-01-20
First Publication Date 2024-04-25
Owner TOSOH CORPORATION (Japan)
Inventor
  • Oka, Yuji
  • Kawabe, Kosuke
  • Kanbara, Takeshi

Abstract

To provide an industrially and environmentally more preferable nonflammable liquid composition having a fluorine compound reduced, as compared to previously known nonflammable liquid compositions. To provide an industrially and environmentally more preferable nonflammable liquid composition having a fluorine compound reduced, as compared to previously known nonflammable liquid compositions. A liquid composition is used, which includes a flammable liquid and a fluoroiodoalkane represented by the following formula (1): To provide an industrially and environmentally more preferable nonflammable liquid composition having a fluorine compound reduced, as compared to previously known nonflammable liquid compositions. A liquid composition is used, which includes a flammable liquid and a fluoroiodoalkane represented by the following formula (1): To provide an industrially and environmentally more preferable nonflammable liquid composition having a fluorine compound reduced, as compared to previously known nonflammable liquid compositions. A liquid composition is used, which includes a flammable liquid and a fluoroiodoalkane represented by the following formula (1): (in the formula, X each independently represents H or F, and n represents an integer of from 0 to 5), and which is characterized in that the total amount of the above-mentioned flammable liquid and the above-mentioned fluoroiodoalkane is from 95 to 100 wt % of the entire amount of the above-mentioned liquid composition.

IPC Classes  ?

  • A01N 25/22 - Biocides, pest repellants or attractants, or plant growth regulators, characterised by their forms, or by their non-active ingredients or by their methods of applicationSubstances for reducing the noxious effect of the active ingredients to organisms other than pests containing ingredients stabilising the active ingredients
  • A01P 1/00 - DisinfectantsAntimicrobial compounds or mixtures thereof
  • C11D 7/30 - Halogenated hydrocarbons

87.

METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN

      
Application Number 18020652
Status Pending
Filing Date 2021-08-11
First Publication Date 2024-04-11
Owner TOSOH CORPORATION (Japan)
Inventor
  • Matsumoto, Naoki
  • Kawashima, Hiroyuki
  • Nomura, Shintaro

Abstract

The present invention provides: a metal patterning material which exhibits excellent heat resistance and is suppressed in the formation of a metal thin film on a film surface; an amine compound; a method for forming a metal pattern using these; and an electronic device. The present invention uses a metal patterning material that contains a compound which comprises, in each molecule, an aromatic ring and/or a heteroaromatic ring, a fluorine atom and at least one tertiary amine, wherein: the aromatic ring is composed of at least one ring selected from the group consisting of a monocyclic aromatic ring, a linked aromatic ring and a fussed aromatic ring having from 6 to 15 carbon atoms; a fused aromatic ring having 16 or more carbon atoms is not contained; the proportion of carbon atoms directly bonded to a fluorine atom among the carbon atoms that form the aromatic ring and the carbon atoms that form the heteroaromatic ring is 10% or more; the molecular weight is from 500 to 3,000; and the glass transition temperature is 60° C. or higher.

IPC Classes  ?

  • H10K 85/60 - Organic compounds having low molecular weight
  • H10K 85/40 - Organosilicon compounds, e.g. TIPS pentacene

88.

POWDER COMPOSITION

      
Application Number 18272756
Status Pending
Filing Date 2022-01-19
First Publication Date 2024-03-28
Owner TOSOH CORPORATION (Japan)
Inventor
  • Azechi, Sho
  • Ushio, Yuki
  • Shimizu, Takahiro
  • Higuchi, Yuya
  • Nagayama, Hitoshi
  • Fujisaki, Hiroyuki
  • Imai, Kenji
  • Kawashima, Risa

Abstract

To provide at least one of: a powder composition from which a calcined body with similar processability can be produced without requiring the application of different forming conditions and calcination conditions for each composition; a method for producing the powder composition; a calcined body produced from the powder composition; a method for producing the calcined body; and uses thereof. To provide at least one of: a powder composition from which a calcined body with similar processability can be produced without requiring the application of different forming conditions and calcination conditions for each composition; a method for producing the powder composition; a calcined body produced from the powder composition; a method for producing the calcined body; and uses thereof. A powder composition including: two or more types of zirconia in which a lanthanoid rare-earth element is dissolved; a transition metal element other than zirconium and hafnium; and a remainder composed of zirconia stabilized only by one or more selected from the group consisting of yttrium, calcium and magnesium, wherein a different lanthanoid rare-earth element is dissolved in each zirconia in which the lanthanoid rare-earth element is dissolved, and a transition metal element content is 1500 ppm or less.

IPC Classes  ?

  • C04B 35/488 - Composites
  • A61C 13/08 - Artificial teethMaking same
  • A61C 13/083 - Porcelain or ceramic teeth
  • A61K 6/818 - Preparations for artificial teeth, for filling teeth or for capping teeth comprising ceramics comprising zirconium oxide
  • C04B 35/64 - Burning or sintering processes

89.

Fluororesin, fluororesin particles, and methods for producing these

      
Application Number 18471794
Grant Number 12528894
Status In Force
Filing Date 2023-09-21
First Publication Date 2024-03-07
Grant Date 2026-01-20
Owner TOSOH CORPORATION (Japan)
Inventor
  • Yumino, Shohei
  • Shimono, Tomoya
  • Sakaguchi, Kota
  • Nagai, Tomonari
  • Iwanaga, Kazunari
  • Tanabiki, Masao
  • Doi, Toru

Abstract

5, and a yellow index of a heat-melted molded product (thickness 3 mm) after 24 h at 280° C. of equal to or less than 6, and a method for producing thereof. 4 may be linked to one another to form a ring having 4 or more and 8 or less carbon atoms, and the ring may include an ethereal oxygen atom.

IPC Classes  ?

  • C08F 24/00 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
  • C08F 2/38 - Polymerisation using regulators, e.g. chain terminating agents
  • C08F 124/00 - Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen

90.

Fluororesin, fluororesin particles, and methods for producing these

      
Application Number 18471482
Grant Number 12325769
Status In Force
Filing Date 2023-09-21
First Publication Date 2024-02-22
Grant Date 2025-06-10
Owner TOSOH CORPORATION (Japan)
Inventor
  • Yumino, Shohei
  • Shimono, Tomoya
  • Sakaguchi, Kota
  • Nagai, Tomonari
  • Iwanaga, Kazunari
  • Tanabiki, Masao
  • Doi, Toru

Abstract

5, and a yellow index of a heat-melted molded product (thickness 3 mm) after 24 h at 280° C. of 6 or less, 4 may be linked to form a ring having 4 to 8 or carbon atoms.

IPC Classes  ?

  • C08F 24/00 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen

91.

BIOMARKER FOR DETERMINING FERTILITY, AND DETERMINING METHOD USING SAME

      
Application Number 18270749
Status Pending
Filing Date 2021-12-13
First Publication Date 2024-02-15
Owner
  • PUBLIC UNIVERSITY CORPORATION YOKOHAMA CITY UNIVERSITY (Japan)
  • TOSOH CORPORATION (Japan)
Inventor
  • Miyagi, Etsuko
  • Murase, Mariko
  • Hayama, Tomonari
  • Ryo, Akihide
  • Horiuchi, Yayoi
  • Kobori, Hiroki
  • Ohtake, Norihisa

Abstract

An object of the present invention is to provide a biomarker that enables selection of an embryo having a high rate of implantation and pregnancy, that is, an embryo having high fertility, from embryos obtained through embryo culture after in vitro fertilization in infertility treatment, and a criterion therefor. Provided is a criterion that enables identification of an ovum suitable for implantation and pregnancy based on measurement of the concentration of soluble CD163 which is present in follicular fluid collected at the same time as an ovum in ovum pick up in infertility treatment, or which is present in serum immediately before the ovum pick up.

IPC Classes  ?

  • G01N 33/68 - Chemical analysis of biological material, e.g. blood, urineTesting involving biospecific ligand binding methodsImmunological testing involving proteins, peptides or amino acids
  • C07K 16/28 - Immunoglobulins, e.g. monoclonal or polyclonal antibodies against material from animals or humans against receptors, cell surface antigens or cell surface determinants

92.

CERAMIC MATRIX COMPOSITE AND METHOD FOR PRODUCING THE SAME

      
Application Number 18269278
Status Pending
Filing Date 2021-12-21
First Publication Date 2024-02-15
Owner TOSOH CORPORATION (Japan)
Inventor
  • Ohta, Ikuya
  • Nawata, Yushi
  • Hirataka, Yo
  • Yamashita, Isao

Abstract

An object is to provide a ceramic matrix composite (CMC) having a tensile strength of 150 MPa or more and high heat resistance such that the ratio at which the tensile strength of the CMC retains after the CMC has been exposed to a high-temperature environment for a long period of time, that is, at 1200° C. for 100 hours, is 80% or more. A ceramic matrix composite comprising a ceramic matrix and a continuous ceramic fiber, the ceramic matrix including a sintering inhibitor having an average particle size of 0.28 μm or less.

IPC Classes  ?

  • C04B 35/80 - Fibres, filaments, whiskers, platelets, or the like
  • C04B 35/63 - Preparing or treating the powders individually or as batches using additives specially adapted for forming the products
  • C04B 35/628 - Coating the powders
  • C04B 35/64 - Burning or sintering processes

93.

SPINEL-TYPE LITHIUM MANGANESE OXIDE, METHOD FOR PRODUCING THE SAME AND APPLICATIONS THEREOF

      
Application Number 18259075
Status Pending
Filing Date 2021-12-22
First Publication Date 2024-02-08
Owner TOSOH CORPORATION (Japan)
Inventor
  • Suzuki, Naoto
  • Taniguchi, Jun

Abstract

Provided are a spinel-type lithium manganese oxide excellent in terms of charge-discharge performance at high temperatures and a lithium secondary battery excellent in terms of charge-discharge performance at high temperatures. A spinel-type lithium manganese oxide comprising a phosphate, the spinel-type lithium manganese oxide being represented by chemical formula: Li1+xMn2−X−YMYO4 (where 0.02≤X≤0.20, 0.05≤Y≤0.30, and M represents Al or Mg), wherein the phosphate has an average particle size of 0.1 μm or more and 2.0 μm or less, and primary particles of the spinel-type lithium manganese oxide have an average size of 1.5 μm or more and 5.0 μm or less, a method for producing the spinel-type lithium manganese oxide, and applications of the spinel-type lithium manganese oxide.

IPC Classes  ?

  • C01G 45/12 - Complex oxides containing manganese and at least one other metal element
  • H01M 10/052 - Li-accumulators

94.

COATING MATERIAL COMPOSITION, KIT, COATING FILM, AND COATING FILM FORMING METHOD

      
Application Number 18372927
Status Pending
Filing Date 2023-09-26
First Publication Date 2024-01-11
Owner TOSOH CORPORATION (Japan)
Inventor
  • Noguchi, Shuto
  • Horiguchi, Kenji

Abstract

A coating material composition includes an organic polyisocyanate (A) and an acrylic polyol (B), wherein the organic polyisocyanate (A) contains a modified polyisocyanate (a), the modified polyisocyanate (a) is a reaction product of a polyisocyanate component (al) and a polyol component (a2) or its modified product, the polyisocyanate component (al) contains an organic diisocyanate or its modified product, the polyol component (a2) contains at least one selected from the group consisting of polytetramethylene glycol and polycarbonate polyols which have a number average molecular weight of 200 to 750, and the acrylic polyol (B) contains an acrylic polyol (b) having a glass transition temperature of 5 to 30° C. and a hydroxyl value of more than 100 mg KOH/g and 150 mg KOH/g or less.

IPC Classes  ?

  • C09D 183/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
  • C08L 83/08 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen

95.

ACTIVE HYDROGEN-CONTAINING ORGANIC COMPOUND SCAVENGER, COMPOSITION, AND APPLICATIONS THEREOF

      
Application Number 18039543
Status Pending
Filing Date 2021-12-02
First Publication Date 2024-01-04
Owner TOSOH CORPORATION (Japan)
Inventor
  • Miyazaki, Takanori
  • Arita, Tomohiro
  • Okada, Takeshi
  • Kanbara, Takeshi

Abstract

The present application provides a material for efficiently removing active hydrogen-containing compounds such as alcohol compounds. The present application uses an active hydrogen-containing organic compound scavenger having a bromine content of from 38 to 78 wt % represented by the formula (1) (wherein R1 and R2 each independently represent a hydrogen atom or a C1-4 alkyl group, each R3 independently represents a hydrogen atom, a C1-4 alkyl group or a bromine atom, m represents at least one selected from the group consisting of 0, 1, 2 and 3, and n represents a real number of 0 or more) (wherein the isocyanate compound may be a single species or a mixture of two or more species, and in the case of a mixture, n represents an average n of the mixture).

IPC Classes  ?

  • B01J 20/22 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising organic material
  • C07C 265/12 - Derivatives of isocyanic acid having isocyanate groups bound to carbon atoms of six-membered aromatic rings
  • B01D 53/72 - Organic compounds not provided for in groups , e.g. hydrocarbons
  • B01D 53/82 - Solid phase processes with stationary reactants
  • B01J 20/30 - Processes for preparing, regenerating or reactivating
  • B01J 20/20 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising free carbonSolid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising carbon obtained by carbonising processes
  • B01J 20/10 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
  • B01J 20/32 - Impregnating or coating

96.

METHOD FOR MANUFACTURING CELL MASS

      
Application Number 18037879
Status Pending
Filing Date 2021-11-25
First Publication Date 2023-12-28
Owner TOSOH CORPORATION (Japan)
Inventor Kuno, Goshi

Abstract

A method for manufacturing a cell mass adherently cultured on a cell culture substrate, in which the cell culture substrate comprises two regions (A) and (B), and the method comprising steps (1) to (3): (A) an island-shaped region having a cell proliferation property and an area of 0.001 to 1 mm2; and (B) a region adjacent to the region (A) and having no cell proliferation properties, (1) a step of preparing a cell suspension comprising a mesenchymal cell and an ectoderm-derived cell; (2) a step of bringing the cell suspension into contact with the cell culture substrate, and randomly adhering the two types of cells to the region (A), and in which, on the contact surface between the cell suspension and the cell culture substrate, a total number of cells of the two types of cells is 100 to 100,000 cells/cm2; and (3) a step of culturing the cell adhered to the region (A) and forming a cell mass comprising the two types of cells.

IPC Classes  ?

  • C12N 5/071 - Vertebrate cells or tissues, e.g. human cells or tissues
  • C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus

97.

COVER-LAYER-INCLUDING CERAMIC CONTINUOUS FIBER, METHOD FOR PRODUCING THE SAME, CERAMIC MATRIX COMPOSITE MATERIAL AND METHOD FOR PRODUCING THE SAME

      
Application Number 18027606
Status Pending
Filing Date 2021-09-16
First Publication Date 2023-12-21
Owner TOSOH CORPORATION (Japan)
Inventor
  • Hirataka, Yo
  • Nawata, Yushi
  • Ohta, Ikuya
  • Yamashita, Isao

Abstract

Provided are a cover-layer-including ceramic continuous fiber suitable for producing a ceramic matrix composite material that can have improved damage tolerance and a ceramic matrix composite material formed from the cover-layer-including ceramic continuous fiber. The cover-layer-including ceramic continuous fiber includes a ceramic continuous fiber and a cover layer formed of an inorganic acid salt and disposed on the surface of the ceramic continuous fiber, wherein the thickness variation coefficient of the cover layer is 80% or less.

IPC Classes  ?

  • C04B 35/622 - Forming processesProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B 41/45 - Coating or impregnating
  • C04B 41/50 - Coating or impregnating with inorganic materials
  • C04B 35/80 - Fibres, filaments, whiskers, platelets, or the like

98.

COLORED SINTERED BODY AND METHOD FOR PRODUCING THE SAME

      
Application Number 18202393
Status Pending
Filing Date 2023-05-26
First Publication Date 2023-12-07
Owner TOSOH CORPORATION (Japan)
Inventor
  • Nagayama, Hitoshi
  • Funakoshi, Hajime
  • Tsuchiya, Satoshi

Abstract

A sintered body comprises zirconia including a stabilizer element dissolved therein and a lanthanoid element dissolved therein, the lanthanoid element having an ionic radius larger than the atomic radius of zirconium. The content of monoclinic zirconia after a hydrothermal treatment at 140° C. for 24 hours is less than 25%. The sintered body includes a spinel compound including aluminum and a coloring element.

IPC Classes  ?

99.

CERAMIC CONTINUOUS FIBERS HAVING METAL ELEMENT AND CERAMIC MATRIX COMPOSITE MATERIAL USING SAME

      
Application Number 18028492
Status Pending
Filing Date 2021-09-27
First Publication Date 2023-11-09
Owner TOSOH CORPORATION (Japan)
Inventor
  • Nawata, Yushi
  • Yamashita, Isao
  • Hirataka, Yo
  • Ohta, Ikuya

Abstract

An object is to provide metal element-having ceramic continuous fibers suitable for use in the production of highly heat-resistant CMCs, and a CMC made therewith. The ceramic continuous fibers comprise ceramic continuous fibers and at least one metal element therein, with the concentration by mass of the metal element being 10 ppm or more and 1000 ppm or less.

IPC Classes  ?

  • C04B 35/622 - Forming processesProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B 35/80 - Fibres, filaments, whiskers, platelets, or the like
  • C04B 41/51 - Metallising
  • C04B 41/00 - After-treatment of mortars, concrete, artificial stone or ceramicsTreatment of natural stone

100.

COMPOSITION FOR CARBON DIOXIDE SEPARATION AND METHOD FOR SEPARATING CARBON DIOXIDE

      
Application Number 17795411
Status Pending
Filing Date 2021-01-28
First Publication Date 2023-11-09
Owner TOSOH CORPORATION (Japan)
Inventor
  • Fujii, Ryotaro
  • Sakoda, Kotaro
  • Yanase, Manabu
  • Kiso, Hiroyuki

Abstract

To provide a carbon dioxide separation composition which is excellent in carbon dioxide desorption efficiency (desorption amount/absorption amount) and durability to nitrogen oxides, and a method for separating carbon dioxide. To provide a carbon dioxide separation composition which is excellent in carbon dioxide desorption efficiency (desorption amount/absorption amount) and durability to nitrogen oxides, and a method for separating carbon dioxide. A carbon dioxide separation composition, containing at least one amine compound selected from the group consisting of an amine compound represented by the following formula (1): To provide a carbon dioxide separation composition which is excellent in carbon dioxide desorption efficiency (desorption amount/absorption amount) and durability to nitrogen oxides, and a method for separating carbon dioxide. A carbon dioxide separation composition, containing at least one amine compound selected from the group consisting of an amine compound represented by the following formula (1): wherein R1 to R3 each independently represent a hydrogen atom or a C1-4 alkyl group, and an amine compound represented by the following formula (2): To provide a carbon dioxide separation composition which is excellent in carbon dioxide desorption efficiency (desorption amount/absorption amount) and durability to nitrogen oxides, and a method for separating carbon dioxide. A carbon dioxide separation composition, containing at least one amine compound selected from the group consisting of an amine compound represented by the following formula (1): wherein R1 to R3 each independently represent a hydrogen atom or a C1-4 alkyl group, and an amine compound represented by the following formula (2): wherein R10, R11, R12, R13 and R14 each independently represent a hydrogen atom, a C1-4 alkyl group, a hydroxy group, a hydroxymethyl group, a 2-hydroxyethyl group or a C1-4 alkoxy group, a and b are each independently 0 or 1 and satisfy the relation a+b=1, and R15 is a hydrogen atom, a C1-4 alkyl group, a methoxymethyl group, a methoxyethoxymethyl group or a 2-hydroxyethyl group.

IPC Classes  ?

  • B01J 20/22 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising organic material
  • B01D 53/14 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by absorption
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