There is provided a soluble polyimide resin comprising: (a) one or more tetracarboxylic acid component residues: (b) one or more diamine component residues; and (c) one or more endcapping compounds; wherein: the one or more endcapping compounds comprise one or more crosslinking groups. The soluble polyimide resin can be used in electronics applications.
H05K 3/18 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
There is provided a resin composition from a mixture including: (a) 30-80 weight % of at least one thermosetting resin; and (b) 20-70 weight % of at least one soluble polyimide resin. The resin composition can be used in electronics applications.
Photoresist underlayer compositions, comprising: a curable compound comprising a group of the following formula (1):
Photoresist underlayer compositions, comprising: a curable compound comprising a group of the following formula (1):
Photoresist underlayer compositions, comprising: a curable compound comprising a group of the following formula (1):
wherein: R1 is each independently H, C1-30 alkyl, or C3-30 cycloalkyl; Ar1 is an aromatic ring or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar1 is substituted or unsubstituted; Ar2 is an aromatic ring chosen from a 6-membered carbocyclic aromatic ring, a 5- or 6-membered heteroaromatic ring, or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar2 optionally comprises a fused cyclic imide moiety, a fused oxazole moiety, a fused imidazole moiety, or a fused thiazole moiety, and wherein Ar2 is substituted or unsubstituted; Y1 is a single covalent bond, or is selected from —O—, —C(O)—, —C(O)O—, —S—, —S(O)2—, —N(R2)—, —C(O)N(R2)—, —C(O)N(R2)C(O)—, —(CH2)y—, or a combination thereof, wherein R2 is H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(O)R3, or S(O)2R3, wherein R3 is chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl, and y is an integer from 1 to 6; x is an integer from 2 to 5; and * denotes a binding site to a part of the curable compound other than the group represented by formula (1), provided that no two
Photoresist underlayer compositions, comprising: a curable compound comprising a group of the following formula (1):
wherein: R1 is each independently H, C1-30 alkyl, or C3-30 cycloalkyl; Ar1 is an aromatic ring or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar1 is substituted or unsubstituted; Ar2 is an aromatic ring chosen from a 6-membered carbocyclic aromatic ring, a 5- or 6-membered heteroaromatic ring, or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar2 optionally comprises a fused cyclic imide moiety, a fused oxazole moiety, a fused imidazole moiety, or a fused thiazole moiety, and wherein Ar2 is substituted or unsubstituted; Y1 is a single covalent bond, or is selected from —O—, —C(O)—, —C(O)O—, —S—, —S(O)2—, —N(R2)—, —C(O)N(R2)—, —C(O)N(R2)C(O)—, —(CH2)y—, or a combination thereof, wherein R2 is H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(O)R3, or S(O)2R3, wherein R3 is chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl, and y is an integer from 1 to 6; x is an integer from 2 to 5; and * denotes a binding site to a part of the curable compound other than the group represented by formula (1), provided that no two
Photoresist underlayer compositions, comprising: a curable compound comprising a group of the following formula (1):
wherein: R1 is each independently H, C1-30 alkyl, or C3-30 cycloalkyl; Ar1 is an aromatic ring or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar1 is substituted or unsubstituted; Ar2 is an aromatic ring chosen from a 6-membered carbocyclic aromatic ring, a 5- or 6-membered heteroaromatic ring, or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar2 optionally comprises a fused cyclic imide moiety, a fused oxazole moiety, a fused imidazole moiety, or a fused thiazole moiety, and wherein Ar2 is substituted or unsubstituted; Y1 is a single covalent bond, or is selected from —O—, —C(O)—, —C(O)O—, —S—, —S(O)2—, —N(R2)—, —C(O)N(R2)—, —C(O)N(R2)C(O)—, —(CH2)y—, or a combination thereof, wherein R2 is H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(O)R3, or S(O)2R3, wherein R3 is chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl, and y is an integer from 1 to 6; x is an integer from 2 to 5; and * denotes a binding site to a part of the curable compound other than the group represented by formula (1), provided that no two
groups are in an ortho position to each other on Ar1, wherein ** denotes the point of attachment to an aromatic ring carbon of Ar1; and
a solvent.
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C07C 43/285 - Ethers having an ether-oxygen atom bound to carbon atoms both belonging to six-membered aromatic rings having unsaturation outside the six-membered aromatic rings
C07C 49/255 - Unsaturated compounds containing keto groups bound to acyclic carbon atoms containing ether groups, groups, groups, or groups
C07C 317/22 - SulfonesSulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
4.
POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS
A polymer, including a first repeating unit comprising a sulfone group, wherein the sulfone group is directly bonded to a group of formula —C(Ra)(Rb)—; and a second repeating unit comprising an acid labile group, a base-decomposable group, a polar group, or a combination thereof, wherein Ra and Rb are each independently hydrogen, halogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C3-30 cycloalkenyl, substituted or unsubstituted C3-30 heterocycloalkenyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C2-30 heteroaryl, substituted or unsubstituted C3-30 heteroarylalkyl, or substituted or unsubstituted C3-30 alkylheteroaryl, provided that at least one of Ra and Rb is hydrogen.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
5.
POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS
A polymer including a first repeating unit comprising an acid labile group; an anionic endgroup selected from a carboxylate group or a sulfamate group; and an organic cation.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/028 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
6.
COATED CONTAINERS AND METHODS OF FORMING SUCH CONTAINERS
Disclosed herein is a container comprising an enclosure having an outer surface and an inner surface; and a polydopamine coating that is optionally derivatized disposed on an inner surface of the enclosure. Disclosed herein too is a method of coating a container, comprising (a) providing a container comprising an enclosure having an outer surface and an inner surface; and (b) disposing a solution comprising dopamine hydrochloride, a buffer and a solvent in the container.
A polymer including a first repeating unit derived from a first monomer represented by formula (1); and a second repeating unit comprising an acid labile group, a hydroxyaryl group, a sulfonamide group, a fluoroalcohol group, or a combination thereof,
A polymer including a first repeating unit derived from a first monomer represented by formula (1); and a second repeating unit comprising an acid labile group, a hydroxyaryl group, a sulfonamide group, a fluoroalcohol group, or a combination thereof,
A polymer including a first repeating unit derived from a first monomer represented by formula (1); and a second repeating unit comprising an acid labile group, a hydroxyaryl group, a sulfonamide group, a fluoroalcohol group, or a combination thereof,
wherein, in formula (1), P is a polymerizable group comprising an ethylenically unsaturated carbon-carbon double bond; L1 is a single bond or a linking group; Ar is a substituted or unsubstituted C6-30 aromatic group or a substituted or unsubstituted C4-30 heteroaromatic group; X is O or S; A is a group selected from —O—, —S—, —S(O)—, —S(O)2—, —C(O)—, —C(S)—, or —N(Ra)—; Ra is hydrogen or a non-hydrogen substituent; and R1 and R2 are each as defined herein, wherein the first repeating unit and the second repeating unit are structurally different.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
Disclosed is a formulation comprising a copolymer comprising one or more bifunctional high refractive index first monomers comprising a high refractive index aromatic core and further comprising one or more UV- or thermally-reactive groups (A) and one or more second monomers comprising a high refractive index core and further comprising one or more groups capable of reacting to increase the solubility of the copolymer in aqueous media (B), and one or more solvents. The formulation may optionally contain additional components. Further disclosed are methods for forming optical thin films from the formulation and optical devices containing the optical thin films.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A method of forming a pattern, the method comprising: providing a photoresist underlayer over a substrate; forming a photoresist layer over the photoresist underlayer; patterning the photoresist layer; and transferring a pattern from the patterned photoresist layer to the photoresist underlayer;
wherein the photoresist underlayer is formed from a composition comprising a solvent and a compound represented by Formula 1
A method of forming a pattern, the method comprising: providing a photoresist underlayer over a substrate; forming a photoresist layer over the photoresist underlayer; patterning the photoresist layer; and transferring a pattern from the patterned photoresist layer to the photoresist underlayer;
wherein the photoresist underlayer is formed from a composition comprising a solvent and a compound represented by Formula 1
or
a polymer having a repeating unit represented by Formula 2
A method of forming a pattern, the method comprising: providing a photoresist underlayer over a substrate; forming a photoresist layer over the photoresist underlayer; patterning the photoresist layer; and transferring a pattern from the patterned photoresist layer to the photoresist underlayer;
wherein the photoresist underlayer is formed from a composition comprising a solvent and a compound represented by Formula 1
or
a polymer having a repeating unit represented by Formula 2
wherein in Formulae 1 and 2:
Ar1 and Ar2 independently represent an aromatic group; and
Y1, Y2, X1, X2, X3, T1, T2, Z1, and Z2 are as defined.
Nickel electroplating compositions containing thiourethanes deposit rough nickel on substrates. The rough nickel can be electroplated over wide current density ranges. The rough nickel deposits enable improved adhesion to other metal layers in contrast to many conventional nickel deposits.
The present disclosure relates to decreasing migration of materials from thermal management and/or electromagnetic interference (EMI) mitigation materials (e.g., thermal interface materials (TIMs), EMI absorbers, thermally-conductive EMI absorbers, electrically-conductive elastomers (ECEs), electrically-conductive composites, combinations thereof, etc.) and other polymer-inorganic composites used for other purposes. In exemplary embodiments, a method includes adding halloysite and/or hollow nanotubular inorganic structures and/or tubular inorganic nanomaterials to a composite in an amount sufficient for decreasing migration of materials from the composite. Also disclosed are exemplary embodiments of composites that include halloysite and/or hollow nanotubular inorganic structures and/or tubular inorganic nanomaterials in an amount sufficient for decreasing migration of materials from the composite.
Nickel electroplating compositions containing mercaptotetrazoles deposit rough nickel on substrates. The rough nickel can be electroplated over wide current density ranges. The rough nickel deposits enable improved adhesion to other metal layers in contrast to many conventional nickel deposits.
Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition
C07C 303/32 - Preparation of esters or amides of sulfuric acidsPreparation of sulfonic acids or of their esters, halides, anhydrides or amides of salts of sulfonic acids
C07C 309/06 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
C07C 309/07 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 309/17 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
C07C 309/20 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic unsaturated carbon skeleton
C07C 309/23 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing rings other than six-membered aromatic rings
C07C 309/42 - Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing singly-bound oxygen atoms bound to the carbon skeleton having the sulfo groups bound to carbon atoms of non-condensed six-membered aromatic rings
C08F 224/00 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
C08F 228/02 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a bond to sulfur
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
ROHM AND HAAS ELECTRONIC MATERIALS (SHANGHAI) LTD. (China)
ROHM AND HAAS ELECTRONIC MATERIALS LLC (USA)
Inventor
Qi, Xiaoman
Lyu, Jian
Shiang, Chen-Yang
Ma, Xiaogang
Abstract
Provided herein is an organic solvent to solve silicone polymer, to coat the silicone polymer on at least a portion of the surface of an article such as needles, syringes, stoppers and medicine bottles.
A photoresist composition comprising a polymer, a photoacid generator, an additive comprising a tertiary carbon atom as a ring-forming atom of a lactone ring, and a solvent.
A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I):
+ are the same as described in the specification.
C07C 255/24 - Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms containing cyano groups and singly-bound nitrogen atoms, not being further bound to other hetero atoms, bound to the same saturated acyclic carbon skeleton
C07C 255/31 - Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing rings other than six-membered aromatic rings
C07C 255/34 - Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring with cyano groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by unsaturated carbon chains
C07C 321/28 - Sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings
Glass articles having a thin glass layer and atop optically transparent polymeric hard-coat layer disposed on atop surface of the thin glass layer. The top optically transparent polymeric hard-coat layer may have a thickness in a range of 0.1 microns to 200 microns and a pencil hardness of 6H or more, when the pencil hardness is measured with the optically transparent polymeric hard-coat layer disposed on the top surface of the glass layer. The glass articles avoid ejection of glass shard particles from the glass article upon bending to a failure during a static two-point bend test.
C03C 17/32 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
18.
Photoacid generators, photoresist compositions, and pattern formation methods
Photoacid generators comprising a moiety of formula (1):
1 are optionally connected together by a single bond or a divalent linking group to form a ring; Y is a single bond or a divalent group; and * is the point of attachment of the moiety to another atom of the photoacid generator. The photoacid generator compounds find particular use in photoresist compositions that can be used to form lithographic patterns for the formation of electronic devices.
C07C 51/02 - Preparation of carboxylic acids or their salts, halides, or anhydrides from salts of carboxylic acids
C07C 303/32 - Preparation of esters or amides of sulfuric acidsPreparation of sulfonic acids or of their esters, halides, anhydrides or amides of salts of sulfonic acids
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
There is disclosed an optically clear shear thickening fluid and a protection assembly comprising the optically clear shear thickening fluid. It further relates to uses of the optically clear shear thickening fluid in electronic devices, particularly in optical display devices. The optically clear shear thickening fluid includes: (a) a solid nanoparticle having an average particle size equal to or less than 100 nm; (b) at least one polymer; and (c) a liquid medium. The at least one polymer is substantially soluble in the liquid medium.
C08L 33/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
B82Y 20/00 - Nanooptics, e.g. quantum optics or photonic crystals
C09D 7/62 - Additives non-macromolecular inorganic modified by treatment with other compounds
C09D 7/80 - Processes for incorporating ingredients
C09D 133/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
G02B 1/14 - Protective coatings, e.g. hard coatings
20.
THIN FLEXIBLE GLASS COVER WITH A FRAGMENT RETENTION HARD COATING
Glass articles having a thin glass layer and a top optically transparent polymeric hard-coat layer disposed on a top surface of the thin glass layer. The top optically transparent polymeric hard-coat layer may have a thickness in a range of 0.1 microns to 200 microns and a pencil hardness of 6H or more, when the pencil hardness is measured with the optically transparent polymeric hard-coat layer disposed on the top surface of the glass layer. The glass articles avoid ejection of glass shard particles from the glass article upon bending to a failure during a static two-point bend test.
C03C 17/32 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
Compositions for forming polymer layers useful in the manufacture of display devices, particularly flexible display, and methods of forming such devices are provided.
C08F 2/46 - Polymerisation initiated by wave energy or particle radiation
C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
C08G 61/04 - Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
The present disclosure is directed to a silicon-terminated telechelic polyolefin composition comprising a compound of formula (I). Embodiments related to a process for preparing the silicon-terminated telechelic polyolefin composition comprising a compound of formula (I), the process comprising combining starting materials comprising (A) a silicon-terminated organo-metal compound and (B) a silicon-based functionalization agent, thereby obtaining a product comprising the silicon-terminated telechelic polyolefin composition. In further embodiments, the starting materials of the process may further comprise (C) a nitrogen containing heterocycle. In further embodiments, the starting materials of the process may further comprise (D) a solvent.
13 is independently H, deuterium, or an organic group. Also provided is a method of making the composition, a method of making an organic light-emitting diode using the composition, and an organic light-emitting diode made by that method.
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
Disclosed herein is a method of forming vias in electrical laminates comprising laminating a sheet having a layer comprising a crosslinkable polymer composition to a substrate wherein the crosslinkable polymer composition has a viscosity at lamination temperatures in the range of 200 Pa-s to 100,000 Pa-s, forming at least one via in the crosslinkable polymer layer by laser ablation; and after the forming of the at least one via, thermally curing the crosslinkable polymer layer. According to certain embodiments the cross linkable polymer composition has a viscosity at lamination temperature of at least 5000 Pa-s. This method yields good lamination results, good via profiles, and good desmear results when such compositions are used and the via is laser ablated before cure.
Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
The present invention relates to method for producing LED by one step film lamination. The method comprises: laminating two or more LEDs with two or more colored phosphor films by one step film lamination; wherein each of the colored phosphor film comprises each other different colored phosphor composition which has a Maximum tan δ; and the difference of each Maximum tan δ varies within a range of 0-30%. In the present invention, the method for producing a LED may greatly improve production efficiency (i.e., dual and multi-color LEDs in one step) and lower cost of ownership. Further, it may improve uniformity of phosphor dispersion, thereby improve color quality of LEDs.
A novel two-layer phosphor film, comprising: (1) a phosphor layer comprising a KSF phosphor layer; and (2) a moisture barrier layer which is applied on the phosphor layer, wherein the moisture barrier layer comprises a silicone layer. A method of making the phosphor film is also provided. The two-layer phosphor film exhibits good dicing performance and stability as well as the method of making the phosphor film provides lower total cost and and high efficiency.
The present disclosure is directed to a silicon-terminated telechelic polyolefin composition comprising a compound of formula (I). Embodiments related to a process for preparing the silicon-terminated telechelic polyolefin composition comprising a compound of formula (I), the process comprising combining starting materials comprising (A) a silicon-terminated organo-metal compound and (B) a silicon-based functionalization agent, thereby obtaining a product comprising the silicon-terminated telechelic polyolefin composition. In further embodiments, the starting materials of the process may further comprise (C) a nitrogen containing heterocycle. In further embodiments, the starting materials of the process may further comprise (D) a solvent.
C08K 5/34 - Heterocyclic compounds having nitrogen in the ring
B01J 31/02 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
C08L 23/00 - Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bondCompositions of derivatives of such polymers
C08L 53/00 - Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bondsCompositions of derivatives of such polymers
C08F 2/38 - Polymerisation using regulators, e.g. chain terminating agents
C08F 4/64 - Titanium, zirconium, hafnium, or compounds thereof
C08F 210/16 - Copolymers of ethene with alpha-alkenes, e.g. EP rubbers
C08F 210/14 - Monomers containing five or more carbon atoms
C08F 297/08 - Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the coordination type polymerising mono-olefins
C08F 295/00 - Macromolecular compounds obtained by polymerisation using successively different catalyst types without deactivating the intermediate polymer
Display substrates having a hard coat layer on a colorless polyimide substrate are formed from hard coat compositions having certain organic solvents that do not substantially impact the optical and mechanical properties of the colorless polyimide substrate.
C09D 4/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
C09D 143/04 - Homopolymers or copolymers of monomers containing silicon
C08J 7/16 - Chemical modification with polymerisable compounds
C08L 33/12 - Homopolymers or copolymers of methyl methacrylate
C08L 75/16 - Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
The Board of Trustees of the University of Illinois (USA)
Rohm and Haas Electronic Materials LLC (USA)
Inventor
Trefonas, Iii, Peter
Deshpande, Kishori
Ewers, Trevor
Greer, Edward
Joo, Jaebum
Kim, Bong Hoon
Oh, Nuri
Park, Jong Keun
Shim, Moonsub
Zhang, Jieqian
Abstract
wherein the circuitry is configured to be capable of switching the optoelectronic element between a configuration in which the circuitry provides an effective forward bias voltage that causes the optoelectronic element to emit light and a configuration in which the circuitry provides an effective reverse bias voltage that causes the optoelectronic element to be capable of generating a photocurrent when light to which the optoelectronic element is sensitive strikes the optoelectronic element.
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
G06F 3/042 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means
H01L 51/42 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
G06F 3/041 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
31.
POLYMERIC CHARGE TRANSFER LAYER AND ORGANIC ELECTRONIC DEVICE COMPRISING THE SAME
G03G 5/06 - Photoconductive layersCharge-generation layers or charge-transporting layersAdditives thereforBinders therefor characterised by the photoconductive material being organic
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.
C08G 77/50 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
C09D 183/14 - Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon onlyCoating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
C09D 5/00 - Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects producedFilling pastes
C08G 77/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
The Board of Trustees of the University of Illinois (USA)
Rohm and Haas Electronic Materials LLC (USA)
Inventor
Trefonas, Iii, Peter
Cho, Seongyong
Deshpande, Kishori
Ewers, Trevor
Joo, Jaebum
Greer, Edward
Kim, Bong Hoon
Oh, Nuri
Park, Jong Keun
Shim, Moonsub
Zhang, Jieqian
Abstract
(c) providing circuitry that will detect the onset of photocurrent from an individual effective reverse biased optoelectronic element and that will respond to the photocurrent by changing the bias on the individual optoelectronic element to an effective forward bias.
G06F 3/041 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
G06F 3/042 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means
G06F 3/038 - Control and interface arrangements therefor, e.g. drivers or device-embedded control circuitry
G09G 3/3208 - Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED]
H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
H01L 27/15 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components with at least one potential-jump barrier or surface barrier, specially adapted for light emission
H01L 33/18 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous within the light emitting region
H01L 33/24 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
H01L 51/52 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED) - Details of devices
1/2; and (d) a third polymer comprising polymerized units of a second compound comprising at least two readily polymerizable vinyl groups and having a molecular weight from 72 to 2000; wherein the first polymer encapsulates the quantum dots; wherein a readily polymerizable vinyl group is part of a (meth)acrylate ester group or is attached directly to an aromatic ring.
C09D 4/06 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
C08F 220/20 - Esters of polyhydric alcohols or phenols
C09D 133/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
C08L 33/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from these compositions can be easily removed during processing without the need for a separate removal step.
C08G 77/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
38.
Process for making an organic charge transporting film
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
H01B 1/00 - Conductors or conductive bodies characterised by the conductive materialsSelection of materials as conductors
H01B 1/12 - Conductors or conductive bodies characterised by the conductive materialsSelection of materials as conductors mainly consisting of other non-metallic substances organic substances
C08L 65/00 - Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chainCompositions of derivatives of such polymers
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H01L 51/56 - Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
39.
SEALING COMPOSITIONS FOR WATER SOLUBLE FILMS AND METHODS OF USING SUCH COMPOSITIONS OR FILM
A sealing composition for use in unit dose packages is provided, including: 70 to 98 wt% water; 1 to 30 wt% of a hydrogen bonding component; and 1 to 30 wt% of a complex forming component.
A free standing film is provide, including: a partially hydrolyzed polyvinyl acetate; a poly(ethylene oxide); a polyalkylene glycol; a plasticizer; optionally, a poly(isobutylene-co-maleic anhydride) copolymer; and optionally an optional additive. Unit dose packages including the free standing film are also provided.
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (Republic of Korea)
Inventor
Li, Yang
Zhu, Minrong
Feng, Jichang
Feng, Shaoguang
Liu, Chun
Liu, Yuchen
Devore, David Dayton
Trefonas, Peter Iii
Na, Hong Yeop
Wright, Robert
Spencer, Liam Patrick
Kramer, John William
Sokolov, Anatoliy
Aqad, Emad
Abstract
Polymeric charge transfer layer compositions suitable for organic layers of electronic devices that show reduced driving voltage and increased luminous efficiency.
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
The present invention provides a quantum dot light emitting diode comprising i) an emitting layer of at least one semiconductor nanoparticle made from semiconductor materials selected from the group consisting of Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV-VI compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof; and ii) a polymer for hole injection or hole transport layer, comprising one or more triaryl aminium radical cations having the structure (S1).
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
Provided is a composition comprising a compound having structure (I) wherein each of A1, A2, A3, A4, A5, A6, A7, and A8 is independently CR12 or N; wherein one to four of A1, A2, A3, A4, A5, A6, A7, and A8 are N; wherein J1 is C or Si; wherein J2 is C(R13)n, O, (C(R13)n)2, S, NR13, or Se; wherein n is 1 or 2; wherein each of R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, and R13 is independently H, deuterium, or an organic group. Also provided is a method of making the composition, a method of making an organic light-emitting diode using the composition, and an organic light-emitting diode made by that method.
A polymer composite comprising: (a) quantum dots; (b) polymerized units of a compound of formula (I) wherein R1 is hydrogen or methyl and R2 is a C6-C20 aliphatic polycyclic substituent; and (c) a light stabilizer compound comprising two 1-a]kyloxy-2,2,6,6-tetramethyl-4-piperidinyl substituents.
A polymer which has Mn at least 4,000 and comprises polymerized units of a compound of formula NAr1Ar2Ar3, wherein Ar1, Ar2and Ar3 independently are C6-C40 aromatic substituents; Ar1, Ar2and Ar3 collectively contain no more than one nitrogen atom and at least one of Ar1, Ar2and Ar3 contains a vinyl group attached to an aromatic ring..
C08F 26/02 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a single or double bond to nitrogen
C08F 26/06 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
46.
PROCESS FOR MAKING AN ORGANIC CHARGE TRANSPORTING FILM
A single liquid phase formulation useful for producing an organic charge transporting film. The formulation contains: (a) a polymer resin having Mw at least 3,000 and having arylmethoxy linkages; (b) an acid catalyst which is an organic Bronsted acid with pKa≤4; a Lewis acid comprising a positive aromatic ion and an anion which is (i) a tetraaryl borate having the formula (I) wherein R represents zero to five non-hydrogen substituents selected from D, F and CF3, (ii) BF4-, (iii) PF6-, (iv) SbF6-, (v) AsF6- or (vi) ClO4-; or a thermal acid generator.
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
A method for producing an organic charge transporting film. The method comprises steps of: (a) applying to a substrate a first polymer resin which has substituents which are sulfonic acids, sulfonic acid salts or esters of sulfonic acids; and (b) applying over the first polymer resin a second polymer resin having Mw at least 3,000 and comprising arylmethoxy linkages.
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (Republic of Korea)
ROHM AND HAAS ELECTRONIC MATERIALS LLC (USA)
Inventor
Grigg, Robert David.
Spencer, Liam P.
Kramer, John W.
Liu, Chun
Devore, David D.
Feng, Shaoguang
Feng, Jichang
Zhu, Minrong
Li, Yang
Mukhopadhyay, Sukrit
Sokolov, Anatoliy N.
Remy, Matthew S.
Trefonas, Peter Iii
Neilson, Bethany
Abstract
A polymer which has M nat least 4,000 and comprises polymerized units of a compound of formula NAr 1Ar 2Ar 3,wherein Ar 1,Ar 2and Ar 3 independently are C 6-C 50 aromatic substituents;Ar 1,Ar 2 and Ar 3 collectively contain at least two nitrogen atoms and at least 9 aromatic rings; and at least one of Ar 1,Ar 2 and Ar 3 contains a vinyl group attached to an aromatic ring.
Phosphonate group modified metal oxide particles, a method for forming the phosphonate group modified metal oxide particles and a material containing the phosphonate group modified metal oxide particles are disclosed. The metal oxide particles have low crystallinity and provide materials with high refractive indices (RIs) and high transparency.
The present invention provides a quantum dot light emitting diode comprising i) an emitting layer of at least one semiconductor nanoparticle made from semiconductor materials selected from the group consisting of Group II- VI compounds, Group II-V compounds, Group III- VI compounds, Group III-V compounds, Group IV- VI compounds, Group I-III- VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof; and ii) a polymer for hole injection or hole transport layer; and the polymer comprises, as polymerized units, at least one or more monomers having a first monomer structure comprising a) a polymerizable group, b) an electroactive group with formula NAr1Ar2Ar3 wherein Ar1, Ar2 and Ar3 independently are C6-C50 aromatic substituents, and (c) a linker group connecting the polymerizable group and the electroactive group.
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (Republic of Korea)
ROHM AND HAAS ELECTRONIC MATERIALS LLC (USA)
Inventor
Devore, David D.
Doh, Yoo Jin
Feng, Shaoguang
Grigg, Robert David.
Li, Yang
Liu, Chun
Mukhopadhyay, Sukrit
Na, Hong-Yeop
Remy, Matthew S.
Spencer, Liam P.
Sokolov, Anatoliy N.
Trefonas, Peter Iii
Zhu, Minrong
Inman, Ashley
Kramer, John W.
Abstract
A single liquid phase formulation useful for producing an organic charge transporting film. The formulation contains: (a) a polymer having Mn at least 4,000 and comprising polymerized units of a compound of formula NAr1Ar2Ar3, wherein Ar1, Ar2and Ar3 independently are C6-C50 aromatic substituents and at least one of Ar1, Ar2and Ar3 contains a vinyl group attached to an aromatic ring; provided that said compound contains no arylmethoxy linkages; (b) an acid catalyst which is is an organic Bronsted acid with pKa≤4; a Lewis acid comprising a positive aromatic ion and an anion which is (i) a tetraaryl borate having the formula (I) wherein R represents zero to five non-hydrogen substituents selected from D, F and CF3, (ii) BF4-, (iii) PF6-, (iv) SbF6-, (v) AsF6- or (vi) ClO4-; or a thermal acid generator.
H05B 33/14 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material
H05B 33/12 - Light sources with substantially two-dimensional radiating surfaces
H05B 33/10 - Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
A curable resin composition comprising: (a) 27 to 60 wt% of a liquid siloxane oligomer comprising polymerized units of formula R1mR2nSi(OR3)4-m-n, wherein R1 is a C5-C20 aliphatic group comprising an oxirane ring fused to an alicyclic ring, R2 is a C1-C20 alkyl, C6-C30 aryl group, or a C5-C20 aliphatic group having one or more heteroatoms, R3 is a C1-C4 alkyl group or a C1-C4 acyl group, m is 0.1 to 2.0 and n is 0 to 2.0; (b) 35 to 66 wt% non-porous nanoparticles of silica, a metal oxide, or a mixture thereof, having an average particle diameter from 5 to 50 nm; and (c) 0.5 to 7 wt% of a cationic photoinitiator.
A polymer resin comprising: (a) quantum dots, (b) a compound of formula (I) (I) wherein R1 is hydrogen or methyl and R2 is a C6-C20 aliphatic polycyclic substituent, and (c) a block or graft copolymer having Mn from 50,000 to 400,000 and comprising from 10 to 100 wt% polymerized units of styrene and from 0 to 90 wt% of a non-styrene block; wherein the non-styrene block has a van Krevelen solubility parameter from 15.0 to 17.5 (J/cm3)1/2.
A composition comprising a particle having a center part and an outer part at least partially surrounding the center part, in which the center part comprises titanium oxide and the outer part comprises silsesquinoxane having a thiol group. Also provided a method of forming the composition, a reaction product, an organic film formed on an object, a radiation curable composition, and a material formed from the radiation curable composition.
C08K 9/06 - Ingredients treated with organic substances with silicon-containing compounds
C08L 83/00 - Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon onlyCompositions of derivatives of such polymers
C01G 23/053 - Producing by wet processes, e.g. hydrolysing titanium salts
A polymer composite comprising quantum dots. The polymer composite comprises: (a) quantum dots; (b) a first polymer having a molecular weight from 1,000 to 100,000 and a solubility parameter from 12 to 17 (J/cm3)1/2; (c) a second polymer comprising polymerized units of a first compound comprising at least one readily polymerizable vinyl group and having a molecular weight from 72 to 500, wherein the second polymer has a solubility parameter from 16.5 to 20 (J/cm3)1/2; and (d) a third polymer comprising polymerized units of a second compound comprising at least two readily polymerizable vinyl groups and having a molecular weight from 72 to 2000; wherein the first polymer encapsulates the quantum dots; wherein a readily polymerizable vinyl group is part of a (meth)acrylate ester group or is attached directly to an aromatic ring.
A method for encapsulating quantum dots. The method comprises steps of: (a) mixing quantum dots with a polymer having a molecular weight from 1,000 to 200,000 and a solubility parameter from 14 to 18.75 (J/cm3)1/2 and a solvent to form a mixture; and (b) spray drying the mixture to produce an encapsulated quantum dot powder.
A method of preparing a semiconductor nanocrystal-silicate composite without significantly reducing the quantum yield of the semiconductor nanocrystal, a composite prepared from the method, and a film and an electronic device comprising the composite.
In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
G03F 7/32 - Liquid compositions therefor, e.g. developers
G03F 7/40 - Treatment after imagewise removal, e.g. baking
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
G03F 7/09 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (USA)
ROHM AND HAAS COMPANY (USA)
ROHM AND HAAS ELECTRONIC MATERIALS LLC (USA)
Inventor
Trefonas, Peter, Iii
Cho, Seongyong
Deshpande, Kishori
Ewers, Trevor
Greer, Edward
Joo, Jaebum
Oh, Nuri
Park, Jong Keun
Shim, Moonsub
Zhang, Jieqian
Abstract
Provided is a device comprising a light-emitting optoelectronic element (405, 3405, 3305, 3205, 3105, 205) and a photocurrent- generating optoelectronic element (405, 3404, 3304, 3204, 3204, 3104, 204), wherein the device further comprises an opaque element (10) that prevents light emitted by the light-emitting optoelectronic element from reaching the photocurrent-generating optoelectronic element via a pathway within the device.
H01L 51/42 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
G06F 3/041 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
G06F 3/042 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (USA)
ROHM AND HAAS ELECTRONIC MATERIALS LLC (USA)
Inventor
Trefonas, Peter, Iii
Deshpande, Kishori
Ewers, Trevor
Greer, Edward
Joo, Jaebum
Kim, Bong Hoon
Oh, Nuri
Park, Jong Keun
Shim, Moonsub
Zhang, Jieqian
Abstract
Provided is an optoelectronic device comprising an optoelectronic element and circuitry connected to the optoelectronic element, wherein the optoelectronic element comprises plural quantum dots or plural nanorods, and wherein the circuitry is configured to be capable of switching the optoelectronic element between a configuration in which the circuitry provides an effective forward bias voltage that causes the optoelectronic element to emit light and a configuration in which the circuitry provides an effective reverse bias voltage that causes the optoelectronic element to be capable of generating a photocurrent when light to which the optoelectronic element is sensitive strikes the optoelectronic element.
H01L 51/44 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Details of devices
H01L 51/52 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED) - Details of devices
H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
G06F 3/041 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
G06F 3/042 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (USA)
ROHM AND HAAS ELECTRONIC MATERIALS LLC (USA)
Inventor
Trefonas, Peter, Iii
Deshpande, Kishori
Ewers, Trevor
Greer, Edward
Joo, Jaebum
Kim, Bong Hoon
Oh, Nuri
Rogers, John A.
Shim, Moonsub
Zhang, Jieqian
Abstract
Provided is a method of detecting the presence of an object in proximity to an optoelectronic device (105) comprising (a) providing an optoelectronic device 8105) comprising a light-emitting optoelectronic element (405, 3305, 205) and a photocurrent-generating optoelectronic element (404, 3304, 204), (b) imposing an effective forward bias voltage on the light-emitting optoelectronic element and an effective reverse bias voltage on the photocurrent-generating optoelectronic element, (c) bringing an object (21) capable of scattering or reflecting light or a combination thereof to a distance of 0.1 to 5 mm from a point on the surface of the optoelectronic device from which light emerges, causing light that is emitted by the light-emitting optoelectronic element to be reflected or scattered so that the light falls upon the photocurrent-generating optoelectronic element.
H01L 51/42 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness
G06F 3/041 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
G06F 3/042 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (USA)
ROHM AND HAAS ELECTRONIC MATERIALS LLC (USA)
Inventor
Trefonas, Peter, Iii
Cho, Seongyong
Deshpande, Kishori
Ewers, Trevor
Greer, Edward
Joo, Jaebum
Kim, Bong Hoon
Oh, Nuri
Park, Jong Keun
Shim, Moonsub
Zhang, Jieqian
Abstract
Provided is a method of creating an image on an array of optoelectronic elements comprising (a) providing a device comprising an array of optoelectronic elements and circuitry connected to each optoelectronic element, wherein the optoelectronic element comprises plural quantum dots or plural nanorods, and wherein the circuitry is configured to be capable of switching each optoelectronic element independently between an effective forward bias configuration and a reverse-bias configuration, (b) imposing an effective reverse bias on two or more of the optoelectronic elements, (c) providing circuitry that will detect the onset of photocurrent from an individual effective reverse biased optoelectronic element and that will respond to the photocurrent by changing the bias on the individual optoelectronic element to an effective forward bias.
G09G 3/3208 - Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED]
G06F 3/038 - Control and interface arrangements therefor, e.g. drivers or device-embedded control circuitry
A polymer composite comprising quantum dots; said polymer composite comprising: (a) quantum dots; (b) polymerized units of a first compound having at least one readily polymerizable vinyl group, a molecular weight from 300 to 20,000 and at least one continuous acyclic hydrocarbyl chain of at least five carbon atoms; and (c) polymerized units of a second compound having at least one readily polymerizable vinyl group and a molecular weight from 100 to 750; wherein a readily polymerizable vinyl group is part of a (meth)acrylate ester group or is attached directly to an aromatic ring, and the molecular weight of the first compound minus the molecular weight of the second compound is at least 100.
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (USA)
Inventor
Deshpande, Kishori
Trefonas, Peter, Iii
Zhang, Jieqian
Kumar, Vivek
Oh, Nuri
Zhai, Andy, You
Kenis, Paul
Shim, Moonsub
Abstract
Methods and systems for producing nanostructure materials are provided. In one aspect, a process is provided that comprises a) heating one or more nanostructure material reagents by 100°C or more within 5 seconds or less; and b) reacting the nanostructure material reagents to form a nanostructure material reaction product. In a further aspect, a process is provided comprising a) flowing a fluid composition comprising one or more nanostructure material reagents through a reactor system; and b) reacting the nanostructure material reagents to form a nanostructure material reaction product comprising Cd, In or Zn. In a yet further aspect, methods are provided that include flowing one or more nanostructure material reagents through a first reaction unit; cooling the one or more nanostructure material reagents or reaction product thereof that have flowed through the first reaction unit; and flowing the cooled one or more nanostructure material reagents or reaction product thereof through a second reaction unit.
B82B 3/00 - Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
B82B 1/00 - Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
66.
POLYMERIC LAYER AND ORGANIC ELECTRONIC DEVICE COMPRISING SAME.
Provided is a cyanide-free non-electrolytic gold plating solution including a specific nitrile compound. The plating solution is sustainable and showed good bath stability and plating performance.
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (Republic of Korea)
ROHM AND HAAS ELECTRONIC MATERIALS LLC (USA)
Inventor
Woelfle-Gupta, Caroline
Rao, Yuanqiao
Han, Seok
Haga, Mitsuru
Woodward, William H. H.
Abstract
A formulation for preparing a photo-imageable film; said formulation comprising: (a) a negative photoresist comprising: (i) an acrylic binder having epoxy groups and (ii) a photo-active species; and (b) functionalized zirconium oxide nanoparticles.
Nanoparticles have a core covalently bonded with a luminophore and a hybrid shell at least partially encapsulating the core. The nanoparticles provide improved photostability, thermal stability and emission properties than light emitting materials that the luminophore derives from.
Provided are a modified epoxy resin, a process of preparing the modified epoxy resin, and a curable resin composition comprising the modified resin. The curable resin composition is capable of providing improved barrier properties.
A single phase liquid formulation useful for producing an organic charge transporting film; said formulation comprising: (a) a first polymer resin having Mw less than 5,000; (b) a second polymer resin having Mw at least 7,000; (c) a first solvent having a boiling point from 50 to 165°C; and (d) a second solvent having a boiling point from 180 to 300°C.
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
72.
COPPER ELECTROPLATING BATHS CONTAINING COMPOUNDS OF REACTION PRODUCTS OF AMINES AND POLYACRYLAMIDES
Copper electroplating baths include reaction products of amines and polyacrylamides. The reaction products function as levelers and enable copper electroplating baths which have high throwing power and provide copper deposits with reduced nodules.
A polymer composed of a reaction product of an amine and a quinone. The quinone is a Michael addition receptor. The polymer may be an additive for a copper electroplating bath. The polymer may function as a leveler and enable the copper electroplating bath to have high throwing power and provide copper deposits with reduced nodules.
Copper electroplating baths include reaction products of amines, polyacrylamides and bisepoxides. The reaction products function as levelers and enable copper electroplating baths which have high throwing power and provide copper deposits with reduced nodules.
Copper electroplating baths include reaction products of amines, polyacrylamides and sultones. The reaction products function as levelers and enable copper electroplating baths which have high throwing power and provide copper deposits with reduced nodules.
A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier, a polycyclic aromatic additive and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing the multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure.
H01L 21/033 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or comprising inorganic layers
G03F 1/00 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticlesMask blanks or pellicles thereforContainers specially adapted thereforPreparation thereof
A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing the multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure.
A method of making a graphitic carbon sheet is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite； annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing a multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure; exposing the multilayer structure to an acid; and, recovering the graphitic carbon layer as the freestanding graphitic carbon sheet.
The present invention is directed to a process for preparing a hole transport layer in which a hole transport composition comprising a blend of a hole transport material and transition metal oxide or metal sulfide nanoparticles is deposited as a solution onto a substrate, such as an anode, and then is annealed in a subsequent step. It has been discovered that annealing the hole transport layer comprising the blend of an hole transport material and transition metal nanoparticles improves hole mobility of the hole transport layer in comparison to an identical hole transport layer that has not been subjected to an annealing step.
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
80.
COMPOSITIONS AND METHODS FOR FORMING A PIXEL-DEFINING LAYER
A photoimageable composition for preparing a polymeric binder having of one or more of monomer unit copolymers, a photoactive compound, and one or more organometallic compounds is provided. The copolymers include one or more hydroxyl or carboxyl functional groups that react with the organometallic compound to form a crosslinked network upon curing. The photoimageable compositions may be particularly useful in forming a pixel-defining layer of an electronic device, such as an organic light emitting diode. In particular, photoimageable compositions in accordance with embodiments of the present invention are insoluble in the developer prior to exposure to radiation, soluble in the developer following radiation exposure, and have relatively high glass transition temperatures (Tg) making them useful in forming a pixel-defining layer.
A compound having a tricyclic nucleus and having formula (I) (I) wherein Ar is C3-C25 aryl in which at least one aromatic ring atom is nitrogen; X is O, S or CR9R10; R1, R2, R3, R4, R5 and R6 independently are hydrogen, deuterium, C1-C12 alkyl, C4-C12 aryl or C2-C12 alkenyl; R7 and R8 independently are hydrogen, deuterium, C1-C12 alkyl, C4-C12 aryl or C2-C12 alkenyl or R7 and R8 groups attached to a nitrogen atom are joined by a single bond, O, S or CR11R12 to form a single nitrogen-containing substituent; R9 and R10 independently are hydrogen, deuterium, C1-C12 alkyl, C4-C12 aryl or C2-C12 alkenyl; and R11 and R12 independently are hydrogen, deuterium, C1-C12 alkyl, C4-C12 aryl or C2-C12 alkenyl; provided that Ar does not contain an aromatic ring attached to the tricyclic nucleus which contains more than two aromatic ring nitrogen atoms.
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
Provided is a photosensitive resin composition having satisfactory development properties and no irregularities while ion migration is prevented. A photosensitive resin composition containing a reactive polymer having a carboxyl group and an ethylenically unsaturated double-bond group, a free-radical-based stabilizer, and a photo-acid generator, wherein the photosensitive resin composition is characterized in that the acid value of the reactive polymer is 40 to 100 mg KOH/g, the chlorine content of the reactive polymer is 150 ppm or less, and the free-radical-based stabilizer is selected from hindered amines or hindered amine-based derivatives; and a cured material using said photosensitive resin composition.
Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.
C08L 33/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
C08L 35/00 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereofCompositions of derivatives of such polymers
C08L 67/00 - Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chainCompositions of derivatives of such polymers
C09D 133/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
C09D 133/12 - Homopolymers or copolymers of methyl methacrylate
C09D 135/00 - Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereofCoating compositions based on derivatives of such polymers
C09D 145/00 - Coating compositions based on homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring systemCoating compositions based on derivatives of such polymers
C09D 167/02 - Polyesters derived from dicarboxylic acids and dihydroxy compounds
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (Republic of Korea)
Inventor
Clark, Thomas P.
Laitar, David S.
Mukhopadhyay, Sukrit
Rachford, Aaron A.
Froese, Robert Dj
Devore, David D.
Neilson, Bethany
Jeon, Jeong-Hwan
Na, Hong-Yeop
Abstract
A compound having a four-coordinate boron atom to which is connected a first C3-C25 substituent, a second C3-C25 substituent and a bridging substituent comprising from eight to forty non-hydrogen atoms and having two bonds to the boron atom; wherein: (i) each of the first and second C3-C25 substituents is bonded to the boron atom through a carbon, nitrogen or oxygen atom, and, optionally the first and second C3-C25 substituents are connected to form a single substituent having two bonds to the boron atom; (ii) at least one of the first and second C3-C25 substituents is a C6-C25 aromatic substituent; (iii) said aromatic substituent comprises at least one nitrogen atom which is bonded only to carbon or boron atoms; and (iv) the bridging substituent has at least one oxygen, nitrogen, sulfur or phosphorus atom bonded to the boron atom and at least one aromatic ring.
H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H05B 33/14 - Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material
85.
REACTION PRODUCTS OF BISANHYDRIDS AND DIAMINES AS ADDITIVES FOR ELECTROPLATING BATHS
Reaction products of primary and secondary diamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
Reaction products of amines and polymers containing saturated heterocyclic moieties may be used as levelers in metal electroplating baths. The reaction products may plate metal with good surface properties and good physical reliability.
C08G 73/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen or carbon, not provided for in groups
C25D 3/38 - ElectroplatingBaths therefor from solutions of copper
C25D 3/30 - ElectroplatingBaths therefor from solutions of tin
87.
REACTION PRODUCTS OF DIAMINES WITH REACTION PRODUCTS OF MONOAMINES AND BISANHYDRIDES AS ADDITIVES FOR ELECTROPLATING BATHS
Reaction products of diamines with the reaction products of monoamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
Aspects of the invention provide a composition having a blend of an electron transport material and an organo alkali-metal salt wherein the salt has a glass transition greater than 115°C. The organo-alkali metal salt may be selected from the group consisting of lithium 2-(2-pyridyl)phenolate (LiPP), lithium 2-(2', 2''-bipyridine-6'-yl)phenolate (LiBPP), 2-(isoquinoline-10-yl)phenolate (LiIQP), and lithium 2-(2-phenylquinazolin-4-yl)phenolate and lithium 2-(4-phenylquinazolin-2-yl)phenolate. In a preferred embodiment, the organo-alkali metal salt is lithium 2-(2', 2''-bipyridine-6'-yl)phenolate (LiBPP). Aspects of the invention also provide films and devices having a film layer prepared from the composition.
Arylcyclobutene polymers having improved toughness are provided. Compositions and methods for coating arylcyclobutene polymers having improved toughness are also provided.
C08L 65/00 - Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chainCompositions of derivatives of such polymers
C09D 143/04 - Homopolymers or copolymers of monomers containing silicon
C08L 51/08 - Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bondsCompositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
C08L 63/00 - Compositions of epoxy resinsCompositions of derivatives of epoxy resins
C08L 27/06 - Homopolymers or copolymers of vinyl chloride
B05D 3/10 - Pretreatment of surfaces to which liquids or other fluent materials are to be appliedAfter-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
C08G 61/02 - Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
C08G 61/12 - Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
B05D 3/00 - Pretreatment of surfaces to which liquids or other fluent materials are to be appliedAfter-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
C09D 5/00 - Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects producedFilling pastes
C08L 25/16 - Homopolymers or copolymers of alkyl-substituted styrenes
C08L 25/10 - Copolymers of styrene with conjugated dienes
C08L 51/04 - Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bondsCompositions of derivatives of such polymers grafted on to rubbers
C08L 51/06 - Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bondsCompositions of derivatives of such polymers grafted on to homopolymers or copolymers of aliphatic hydrocarbons containing only one carbon-to-carbon double bond
90.
A TRANSPARENT PRESSURE SENSING FILM WITH HYBRID PARTICLES
A transparent pressure sensing film is provided having a matrix polymer; and, a plurality of hybrid particles; wherein the plurality of hybrid particles are disposed in the matrix polymer; wherein each hybrid particle in the plurality of hybrid particles, comprises a plurality of primary particles bonded together with an inorganic binder; wherein an electrical resistivity of the transparent pressure sensing film is variable in response to an applied pressure having a z-component directed along the thickness of the transparent pressure sensing film such that the electrical resistivity is reduced in response to the z-component of the applied pressure.
A composite transparent pressure sensing film is provided having a matrix polymer wherein the matrix polymer is a combination of 25 to 75 wt％of an alkyl cellulose and 75 to 25 wt％of a polysiloxane; and, a plurality of hybrid particles, wherein each hybrid particle in the plurality of hybrid particles, comprises a plurality of primary particles bonded together with an inorganic binder; wherein the plurality of hybrid particles are disposed in the matrix polymer; wherein an electrical resistivity of the composite transparent pressure sensing film is variable in response to an applied pressure having a z-component directed along the thickness of the composite transparent pressure sensing film such that the electrical resistivity is reduced in response to the z-component of the applied pressure.
A transparent pressure sensing film composition is provided having a matrix polymer; and, a plurality of conductive particles; wherein the matrix polymer comprises 25 to 100 wt％ of an alkyl cellulose; and, wherein an electrical resistivity of the transparent pressure sensing film is variable in response to an applied pressure having a z-component directed along the thickness of the transparent pressure sensing film such that the electrical resistivity is reduced in response to the z-component of the applied pressure.
H01B 1/22 - Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
H01B 1/20 - Conductive material dispersed in non-conductive organic material
G06F 3/045 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (USA)
Inventor
Cunningham, Brian
See, Gloria, G.
Trefonas, Peter
Zhang, Jieqian
Park, Jong, Keun
Howard, Kevin
Deshpande, Kishori
Ewers, Trevor
Abstract
In one aspect, structures are provided that comprise (a) a one-dimensional periodic plurality of layers, wherein at least two of the layers have a refractive index differential sufficient to provide effective contrast; and (b) one or more light-emitting nanostructure materials effectively positioned with respect to the refractive index differential interface, wherein the structure provides a polarized output emission.
H01L 33/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof
H01L 33/18 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous within the light emitting region
A polymer comprising: (a) polymerized units of 2-vinylpyridine; and (b) polymerized units of methyl methacrylate; a compound of formula (I) wherein R1 is hydrogen or methyl and R2 is a C6-C20 aliphatic polycyclic substituent; or a combination thereof.
C08F 226/06 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
G03F 7/32 - Liquid compositions therefor, e.g. developers
G03F 7/40 - Treatment after imagewise removal, e.g. baking
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
G03F 7/09 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
96.
POLYMERIC CHARGE TRANSFER LAYER AND ORGANIC ELECTRONIC DEVICE CONTAINING SAME
Disclosed is a polymeric charge transfer layer comprising a polymer, which comprises as polymerized units, Monomer A, Monomer B, and Monomer C crosslinking agent. Also disclosed is an organic electronic device especially an organic light emitting device containing the polymeric charge transfer layer.
Disclosed herein is a method comprising disposing upon a substrate a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a reactive moiety that is operative to react with a substrate upon which it is disposed; and where the additive polymer comprises a homopolymer that is the chemically and structurally the same as one of the polymers in the block copolymer or where the additive polymer comprises a random copolymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition.
B05D 3/00 - Pretreatment of surfaces to which liquids or other fluent materials are to be appliedAfter-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
C09D 153/00 - Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bondsCoating compositions based on derivatives of such polymers
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
98.
POLYMERIC MATERIALS WITH NEGATIVE PHOTOELASTIC CONSTANTS
A polymeric material having a negative photoelastic constant. The polymeric material comprises: (a) a polymer comprising polymerized units of 2-vinylpyridine, 4-vinylpyridine, methyl methacrylate or a combination thereof; (b) a C9-C25 aliphatic polycyclic compound; and (c) an organic compound having a boiling point of at least 200C.
H01F 1/01 - Magnets or magnetic bodies characterised by the magnetic materials thereforSelection of materials for their magnetic properties of inorganic materials
C09D 133/12 - Homopolymers or copolymers of methyl methacrylate
C09D 139/08 - Homopolymers or copolymers of vinyl-pyridine
A coated glass substrate. The coated glass substrate comprises a glass sheet having a thickness from 0.1 to 0.7 mm and coated on a first side with a first optical layer having a positive photo-elastic constant and coated on a second side with a second optical layer having a negative photo-elastic constant.
C03C 17/00 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating
C03C 17/28 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with organic material
C03C 17/32 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
G02F 1/13363 - Birefringent elements, e.g. for optical compensation
patents
