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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 1/54 - Absorbers, e.g. opaque materials

Patent holdings for IPC class G03F 1/54

Total number of patents in this class: 414

10-year publication summary

29
21
38
35
64
41
46
33
29
14
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
Hoya Corporation
2745
87
Taiwan Semiconductor Manufacturing Company, Ltd.
42704
69
Applied Materials, Inc.
18621
35
Agc, Inc.
4839
28
Shin-Etsu Chemical Co., Ltd.
5658
26
Boe Technology Group Co., Ltd.
41139
14
Samsung Electronics Co., Ltd.
146092
12
Toppan Photomask Co., Ltd.
42
8
Tekscend Photomask Corp.
30
8
Shenzhen China Star Optoelectronics Technology Co., Ltd.
8478
6
Samsung Display Co., Ltd.
34696
5
LG Chem, Ltd.
17632
5
Beijing BOE Optoelectronics Technology Co., Ltd.
3884
5
Toppan Printing Co., Ltd.
2133
5
Hon Hai Precision Industry Co., Ltd.
4033
4
Tsinghua University
5922
4
HKC Corporation Limited
3269
4
Hoya Electronics Singapore Pte. Ltd.
10
4
International Business Machines Corporation
61228
3
Intel Corporation
46962
3
Other owners 79

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