- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 9/00 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patent holdings for IPC class G03F 9/00
Total number of patents in this class: 2549
10-year publication summary
|
149
|
189
|
228
|
274
|
212
|
191
|
182
|
168
|
163
|
38
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7236 |
761 |
| Canon Inc. | 38689 |
235 |
| Nikon Corporation | 7121 |
175 |
| ASML Holding N.V. | 514 |
125 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 41238 |
101 |
| Applied Materials, Inc. | 18082 |
50 |
| Kioxia Corporation | 10231 |
48 |
| Shanghai Micro Electronics Equipment (Group) Co., Ltd. | 251 |
43 |
| Carl Zeiss SMT GmbH | 2863 |
32 |
| KLA-Tencor Corporation | 2548 |
32 |
| Changxin Memory Technologies, Inc. | 4927 |
27 |
| Boe Technology Group Co., Ltd. | 39745 |
26 |
| V Technology Co., Ltd. | 385 |
24 |
| Samsung Electronics Co., Ltd. | 140991 |
23 |
| KLA Corporation | 1447 |
20 |
| Micronic Mydata AB | 73 |
16 |
| Molecular Imprints, Inc. | 272 |
15 |
| Micron Technology, Inc. | 26016 |
13 |
| D2s, Inc. | 168 |
13 |
| FUJIFILM Corporation | 28960 |
12 |
| Other owners | 758 |