- All sections
- C - Chemistrymetallurgy
- C08F - Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C08F 222/24 - Esters containing sulfur
Patent holdings for IPC class C08F 222/24
Total number of patents in this class: 48
10-year publication summary
|
3
|
8
|
5
|
6
|
2
|
4
|
3
|
5
|
2
|
3
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 29273 |
10 |
| Shin-Etsu Chemical Co., Ltd. | 5615 |
4 |
| Zeon Corporation | 4076 |
4 |
| Sumitomo Chemical Company, Limited | 9027 |
3 |
| 3m Innovative Properties Company | 17853 |
2 |
| Canon Inc. | 39618 |
2 |
| Shijiazhuang Chengzhi Yonghua Display Material Co., Ltd. | 197 |
2 |
| Tokyo Ohka Kogyo Co., Ltd. | 1537 |
2 |
| Centre National de La Recherche Scientifique | 10395 |
1 |
| Eastman Kodak Company | 2915 |
1 |
| Samsung SDI Co., Ltd. | 8112 |
1 |
| The Johns Hopkins University | 5651 |
1 |
| PPG Industries Ohio, Inc. | 3458 |
1 |
| JSR Corporation | 2516 |
1 |
| BL Technologies, Inc. | 833 |
1 |
| e Ink Corporation | 1492 |
1 |
| Ecole Nationale Superieure de Chimie de Montpellier | 203 |
1 |
| Ivoclar Vivadent AG | 1048 |
1 |
| Jiangnan University | 1518 |
1 |
| Rohm and Haas Electronic Materials LLC | 153 |
1 |
| Other owners | 7 |