- All sections
- C - Chemistrymetallurgy
- C07D - Heterocyclic compounds
- C07D 213/59 - Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals with at least one of the bonds being to sulfur
Patent holdings for IPC class C07D 213/59
Total number of patents in this class: 14
10-year publication summary
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1
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1
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3
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0
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3
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1
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0
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1
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1
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0
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| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Atnx Spv, LLC | 34 |
4 |
| BASF SE | 21320 |
2 |
| Givaudan SA | 1983 |
2 |
| Hoffmann-La Roche Inc. | 3825 |
1 |
| Tsinghua University | 6238 |
1 |
| Advanced Biodesign | 17 |
1 |
| Nanyang Polytechnic | 93 |
1 |
| The Research Foundation for The State University of New York | 1758 |
1 |
| BASF (China) Co., Ltd. | 890 |
1 |
| Other owners | 0 |